Updated on 2026/08/24

写真a

 
TOMIYA SHIGETAKA
 
Organization
Institute of Integrated Research Integrated Green-niX+ Research Unit Specially Appointed Professor
Title
Specially Appointed Professor
External link

Degree

  • Ph.D. in Engineering ( 2000.3   Keio University )

Research Interests

  • 半導体材料物性、半導体デバイス、材料解析技術、計測インフォマティクス

Research Areas

  • Nanotechnology/Materials / Crystal engineering

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties

  • Nanotechnology/Materials / Applied physical properties

  • Nanotechnology/Materials / Inorganic materials and properties

Professional Memberships

  • The Japan Society of Applied Physics

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  • The Japanese Society of Microscopy

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Committee Memberships

  • The Japan Society of Applied Physics   Director for General Affairs  

    2026.4   

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    Committee type:Academic society

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  • 日本学術振興会 R031ハイブリッド量子ナノ技術委員会   材料分科主査  

    2023.4   

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    Committee type:Government

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  • NEDO 国立研究開発法人 新エネルギー・産業技術総合開発機構   技術委員  

    2022.4   

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    Committee type:Government

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  • 応用物理学会 インフォマティクス応用研究会   副委員長  

    2022.4   

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    Committee type:Academic society

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  • 日本学術振興会 R026先端計測技術の将来設計委員会   幹事  

    2022.4 - 2025.3   

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    Committee type:Government

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  • 日本学術振興会 自律型・複合型AI先端計測の新しい価値創造 研究開発専門委員会   研究テーマリーダ  

    2018.4 - 2021.3   

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  • 日本学術振興会 マテリアル・インフォマティクスによるものづくりプラットフォームの戦略的構築に関する先導的研究開発委員会   副委員長  

    2016.4 - 2019.3   

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  • 電子材料シンポジウム   運営委員  

    2013.4   

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    Committee type:Academic society

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Papers

  • Polarity inversion in AlN induced by oxygen incorporation via surface oxidation treatments

    Tomohiro Tamano, Kanako Shojiki, Ryota Akaike, Hiroki Yasunaga, Zentaro Akase, Shigetaka Tomiya, Hideto Miyake

    Journal of Crystal Growth   694   128782 - 128782   2026.11

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    Publishing type:Research paper (scientific journal)   Publisher:Elsevier BV  

    DOI: 10.1016/j.jcrysgro.2026.128782

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  • Bayesian inference-based characterization of wavelength- and time-resolved photoluminescence data in an indium gallium nitride quantum well

    Kazunori Iwamitsu, Itsuki Shimbo, Zentaro Akase, Toshiya Yokogawa, Atsushi A. Yamaguchi, Shigetaka Tomiya

    Japanese Journal of Applied Physics   2026.7

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ae8109

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  • Spectral Imaging and Wavelength- and Angle-Resolved SEM-CL of Nitride Semiconductor Nanostructures

    Shota Usami, Zentaro Akase, Kazunori Iwamitsu, Toshiya Yokogawa, Shigetaka Tomiya

    Materia Japan   65 ( 1 )   22 - 22   2026.1

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    Publishing type:Research paper (scientific journal)   Publisher:Japan Institute of Metals  

    DOI: 10.2320/materia.65.22

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  • Multimodal Luminescence Spectral Imaging Analysis of the InGaN Single Quantum Well Using One‐Sided Orthogonal Nonnegative Matrix Factorization

    Kazunori Iwamitsu, Kenta Sakai, Zentaro Akase, Atsushi A. Yamaguchi, Shigetaka Tomiya

    physica status solidi (b)   2025.12

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/pssb.202500040

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  • Application of Informatics to Electron Microscopy

    Akase Zentaro, Iwamitsu Kazunori, Otake Yoshito, Tomiya Shigetaka

    KENBIKYO   60 ( 1 )   19 - 24   2025.4

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    Language:Japanese   Publisher:The Japanese Society of Microscopy  

    In recent years, the evolution of measurement and analysis techniques and the dramatic improvement of computational power have made it possible to obtain large amounts of complex data, and informatics methods are being actively used to extract new meaning and knowledge from these data. Our research group focuses on the integration of metrology and informatics, a field we term Metrology Informatics, with primary applications in the analysis of semiconductor materials and devices. In this paper, we present two examples from our work. The first involves applying one-sided orthogonal non-negative matrix factorization to three-dimensional scanning electron microscopy-cathodoluminescence (SEM-CL) spectral images, enabling the analysis of emission modes using statistical insights. The second example showcases a multimodal analysis approach, employing non-rigid registration methods to integrate 3D microscopy data from 3D atom probe tomography (3DAP) and electron tomography (ET), which have differing data structures.

    DOI: 10.11410/kenbikyo.60.1_19

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    CiNii Research

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    Other Link: https://ndlsearch.ndl.go.jp/books/R000000004-I034171706

  • Improvement of MoS2 Film Quality by Low Flux of Sputtered Particles Using a Molybdenum Grid

    Shinya Imai, Ryo Ono, Iriya Muneta, Kuniyuki Kakushima, Tetsuya Tatsumi, Shigetaka Tomiya, Kazuo Tsutsui, Hitoshi Wakabayashi

    IEEE Journal of the Electron Devices Society   2025

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    DOI: 10.1109/JEDS.2024.3502922

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  • Impact of crystallinity on thermal conductivity of RF magnetron sputtered MoS2 thin films

    Tatsuya Kitazawa, Yuta Inaba, Shunsuke Yamashita, Shinya Imai, Keita Kurohara, Tetsuya Tatsumi, Hitoshi Wakabayashi, Shigetaka Tomiya

    Japanese Journal of Applied Physics   2024.5

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    DOI: 10.35848/1347-4065/ad46ae

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  • Atomic-Scale Multimodal Characterization of Self-Assembled InAs/InGaAlAs Quantum Dots International journal

    Yudai Yamaguchi, Yuta Inaba, Ryoji Arai, Yuya Kanitani, Yoshihiro Kudo, Michinori Shiomi, Daiji Kasahara, Mikihiro Yokozeki, Noriyuki Fuutagawa, Jun Uzuhashi, Tadakatsu Ohkubo, Kazuhiro Hono, Kouichi Akahane, Naokatsu Yamamoto, Shigetaka Tomiya

    Journal of Physical Chemistry Letters   15 ( 14 )   3772 - 3778   2024.4

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    DOI: 10.1021/acs.jpclett.3c03507

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  • Absolute evaluation of internal and external quantum efficiencies and light extraction efficiency in InGaN single quantum wells by simultaneous photoacoustic and photoluminescence measurements combined with integrating-sphere method

    Keito Mori-Tamamura, Yuchi Takahashi, Shigeta Sakai, Yuya Morimoto, Junji Hirama, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    Science and Technology of Advanced Materials: Methods   4 ( 1 )   2024.2

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    Publishing type:Research paper (scientific journal)   Publisher:Informa UK Limited  

    DOI: 10.1080/27660400.2024.2315027

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  • Thermoelectric Grain Boundary in Monolayer MoS<inf>2</inf>

    Ayu Irie, Anikeya Aditya, Ken Ichi Nomura, Shogo Fukushima, Shinnosuke Hattori, Rajiv K. Kalia, Aiichiro Nakano, Vadim Rodin, Fuyuki Shimojo, Shigetaka Tomiya, Priya Vashishta

    Journal of Physical Chemistry C   2024

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acs.jpcc.4c04339

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  • Reduction of contact resistance to PVD-MoS film using aluminum-scandium alloy (AISc) edge contact

    Shinya Imai, Ryosuke Kajikawa, Takamasa Kawanago, Iriya Muneta, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Kuniyuki Kakushima, Hitoshi Wakabayashi

    IEEE Electron Devices Technology and Manufacturing Conference: Strengthening the Globalization in Semiconductors, EDTM 2024   2024

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    Publishing type:Research paper (international conference proceedings)  

    DOI: 10.1109/EDTM58488.2024.10511604

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  • Conductivity Enhancement of PVD-WS2 Films Using Cl2-Plasma Treatment Followed by Sulfur-Vapor Annealing

    Keita Kurohara, Shinya Imai, Takuya Hamada, Tetsuya Tatsumi, Shigetaka Tomiya, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi

    IEEE Journal of the Electron Devices Society   2024

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1109/JEDS.2024.3378745

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  • Evaluation of radiative and non-radiative recombination lifetimes in InGaN quantum wells with different ion-implantation damage

    Keito Mori-Tamamura, Yuya Morimoto, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    Japanese Journal of Applied Physics   63 ( 1 )   01SP19 - 01SP19   2023.12

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    Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    In this study, we have separately evaluated the radiative and non-radiative recombination lifetimes for InGaN quantum well (QW) samples with different amounts of ion-implantation damage, and have investigated their temperature dependence. The radiative and non-radiative recombination lifetimes were calculated from photoluminescence (PL) decay time measured by time-resolved PL measurements, combined with the absolute internal quantum efficiency values estimated by the simultaneous photoacoustic and PL measurements. As a result, the experimentally observed radiative recombination lifetimes are almost the same for all samples, while the non-radiative recombination lifetimes are shorter for samples with larger ion-implantation damage. These findings will lead to a comprehensive understanding of carrier dynamics in InGaN-QW optical devices.

    DOI: 10.35848/1347-4065/acfb18

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/acfb18/pdf

  • Evaluation of radiative and nonradiative recombination lifetimes in c-plane InGaN quantum wells with emission colors ranging from blue to red

    Keito Mori-Tamamura, Yuya Morimoto, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    Japanese Journal of Applied Physics   62 ( 10 )   105501 - 105501   2023.10

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    Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    In this study, we investigate In composition and the carrier density dependences of radiative and nonradiative recombination lifetimes for a series of c-plane InGaN quantum well (QW) samples with different emission wavelengths (450 nm to 620 nm). The two lifetimes can be separately evaluated using photoluminescence (PL) decay time, obtained by time-resolved PL measurement, combined with the value of internal quantum efficiency (IQE) obtained by simultaneous photoacoustic and PL measurements. It is found that the decrease in IQE with increasing In composition is caused by the reduction in radiative recombination lifetime, not by the enhancement of nonradiative lifetime, which shows little dependence on In composition. In addition, it is found that the carrier density dependence of IQE is also mainly determined by the change in radiative recombination lifetime. These findings will lead to a comprehensive understanding of carrier dynamics in InGaN-QW optical devices.

    DOI: 10.35848/1347-4065/acf79f

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/acf79f/pdf

  • Real-space observation of a two-dimensional electron gas at semiconductor heterointerfaces. International journal

    Satoko Toyama, Takehito Seki, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya, Yuichi Ikuhara, Naoya Shibata

    Nature nanotechnology   18 ( 5 )   521 - 528   2023.5

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    Mobile charge carriers are essential components in high-performance, nano-engineered semiconductor devices. Employing charge carriers confined to heterointerfaces, the so-called two-dimensional electron gas, is essential for improving device performance. The real-space visualization of a two-dimensional electron gas at the nanometre scale is desirable. However, it is challenging to accomplish by means of electron microscopy due to an unavoidable strong diffraction contrast formation at the heterointerfaces. We performed direct, nanoscale electric field imaging across a GaN-based semiconductor heterointerface using differential phase contrast scanning transmission electron microscopy by suppressing diffraction contrasts. For both nearly the lattice-matched GaN/Al0.81In0.19N interface and pseudomorphic GaN/Al0.88In0.12N interface, the extracted quantitative electric field profiles show excellent agreement with profiles predicted using Poisson simulation. Furthermore, we used the electric field profiles to quantify the density and distribution of the two-dimensional electron gas across the heterointerfaces with nanometre precision. This study is expected to guide the real-space characterization of local charge carrier density and distribution in semiconductor devices.

    DOI: 10.1038/s41565-023-01349-8

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  • An interpretable and transferrable vision transformer model for rapid materials spectra classification

    Zhenru Chen, Yunchao Xie, Yuchao Wu, Yuyi Lin, Shigetaka Tomiya, Jian Lin

    Digital Discovery   2023

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1039/d3dd00198a

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  • Atomic Diffusion of Indium through Threading Dislocations in InGaN Quantum Wells. International journal

    Yudai Yamaguchi, Yuya Kanitani, Yoshihiro Kudo, Jun Uzuhashi, Tadakatsu Ohkubo, Kazuhiro Hono, Shigetaka Tomiya

    Nano letters   22 ( 17 )   6930 - 6935   2022.9

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    DOI: 10.1021/acs.nanolett.2c01479

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  • Quantitative electric field mapping in semiconductor heterostructures via tilt-scan averaged DPC STEM. International journal

    Satoko Toyama, Takehito Seki, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya, Yuichi Ikuhara, Naoya Shibata

    Ultramicroscopy   238   113538 - 113538   2022.8

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    Differential phase contrast (DPC) in scanning transmission electron microscopy can be used to visualize electric field distributions within specimens in real space. However, for electric field mapping in crystalline specimens, the concomitant diffraction contrast is seriously problematic. In particular, for heterostructures with large lattice distortions, such as GaN-based semiconductor devices, the diffraction contrast cannot be reduced using conventional methods such as DPC image acquisition under off-axis conditions. In the present study, the electric field imaging of heterostructures is shown to suppress the diffraction contrast by averaging multiple DPC signals, obtained under various beam-tilt conditions near the zone axis. The remaining diffraction contrast was quantitatively estimated through simulations. This technique was demonstrated to enable the quantitative evaluation of electric field distributions across GaN/AlGaN multi-heterostructures, with errors possibly attributed to the residual diffraction contrast.

    DOI: 10.1016/j.ultramic.2022.113538

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  • Positive Seebeck coefficient of niobium-doped MoS2 film deposited by sputtering and activated by sulfur vapor annealing

    Taiga Horiguchi, Takuya Hamada, Masaya Hamada, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi

    JAPANESE JOURNAL OF APPLIED PHYSICS   61 ( 7 )   2022.7

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    DOI: 10.35848/1347-4065/ac7621

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  • High Seebeck coefficient in PVD-WS2 film with grain size enlargement

    Takuya Hamada, Masaya Hamada, Taiga Horiguchi, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi

    JAPANESE JOURNAL OF APPLIED PHYSICS   61 ( SC )   2022.5

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    DOI: 10.35848/1347-4065/ac3a93

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  • Impact of graphene-molecular interaction on collective orientation barrier for organic film growth

    Sae Nagai, Yuta Inaba, Toshio Nishi, Shigetaka Tomiya

    APPLIED PHYSICS EXPRESS   15 ( 1 )   2022.1

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    DOI: 10.35848/1882-0786/ac435b

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  • Impact of potential fluctuation on temperature dependence of optical gain characteristics in InGaN quantum-well laser diodes

    Itsuki Oshima, Yuma Ikeda, Shigeta Sakai, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    JAPANESE JOURNAL OF APPLIED PHYSICS   60 ( 12 )   2021.11

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    DOI: 10.35848/1347-4065/ac2fef

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  • Dry Etching Damage and Alloy Composition Analysis of GaN-Based Semiconductors Using Electron Energy-Loss Spectroscopy

    Hiroto Yamamoto, Kenichi Tanaka, Shigetaka Tomiya, Shunsuke Yamashita, Masakazu Ukita, Hiroshi Nakano, Raku Shirasawa, Masaaki Kotera, Kimito Funatsu

    JOURNAL OF ELECTRONIC MATERIALS   50 ( 7 )   4230 - 4237   2021.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1007/s11664-021-08946-0

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  • Importance of crystallinity improvement in MoS2 film by compound sputtering even followed by post sulfurization

    Shinya Imai, Takuya Hamada, Masaya Hamada, Takanori Shirokura, Iriya Muneta, Kuniyuki Kakushima, Tetsuya Tatsumi, Shigetaka Tomiya, Kazuo Tsutsui, Hitoshi Wakabayashi

    JAPANESE JOURNAL OF APPLIED PHYSICS   60 ( SB )   2021.5

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    DOI: 10.35848/1347-4065/abdcae

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  • Impact of oxygen on band structure at the Ni/GaN interface revealed by hard X-ray photoelectron spectroscopy

    Hirotaka Mizushima, Ryoji Arai, Yuta Inaba, Shunsuke Yamashita, Yudai Yamaguchi, Yuya Kanitani, Yoshihiro Kudo, Tatsushi Hamaguchi, Rintaro Koda, Katsunori Yanashima, Tadakatsu Ohkubo, Kazuhiro Hono, Shigetaka Tomiya

    APPLIED PHYSICS LETTERS   118 ( 12 )   2021.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0033165

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  • Collective orientation barrier in growth of organic thin films revealed by pMAIRS

    Sae Nagai, Yuta Inaba, Toshio Nishi, Hajime Kobayashi, Shigetaka Tomiya

    PHYSICAL REVIEW MATERIALS   5 ( 1 )   2021.1

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    DOI: 10.1103/PhysRevMaterials.5.013801

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  • WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET With TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box

    Takuya Hamada, Masaya Hamada, Satoshi Igarashi, Taiga Horiguchi, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi

    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY   9   1117 - 1124   2021

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    DOI: 10.1109/JEDS.2021.3108882

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  • Sheet Resistance Reduction of MoS2 Film Using Sputtering and Chlorine Plasma Treatment Followed by Sulfur Vapor Annealing

    Takuya Hamada, Shigetaka Tomiya, Tetsuya Tatsumi, Masaya Hamada, Taiga Horiguchi, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi

    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY   9   278 - 285   2021

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    DOI: 10.1109/JEDS.2021.3050801

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  • WS2 pMISFETs by Sputtering and Sulfur-Vapor Annealing with TiN/HfO2-Top-Gate-Stack, TiN Contact and Ultra-Thin Body and Box

    Takuya Hamada, Masaya Hamada, Satoshi Igarashi, Taiga Horiguchi, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi

    2021 5TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE (EDTM)   2021

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    DOI: 10.1109/EDTM50988.2021.9420925

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  • Direct Measurement of Internal and External Quantum Efficiency in InGaN Quantum-Well Active Layers

    Keito Mori, Yuchi Takahashi, Shigeta Sakai, Yuya Morimoto, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    27TH INTERNATIONAL SEMICONDUCTOR LASER CONFERENCE (ISLC 2021)   2021

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    DOI: 10.1109/ISLC51662.2021.9615797

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  • Experimental studies and model analysis on potential fluctuation in InGaN quantum-well layers

    Takashi Fujita, Shigeta Sakai, Yuma Ikeda, Atsushi A. Yamaguchi, Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Shigetaka Tomiya

    JAPANESE JOURNAL OF APPLIED PHYSICS   59 ( 9 )   2020.9

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    DOI: 10.35848/1347-4065/abaebc

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  • Wannier-Like Delocalized Exciton Generation in C-60 Fullerene Clusters: A Density Functional Theory Study

    Hajime Kobayashi, Shinnosuke Hattori, Raku Shirasawa, Shigetaka Tomiya

    JOURNAL OF PHYSICAL CHEMISTRY C   124 ( 4 )   2379 - 2387   2020.1

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    DOI: 10.1021/acs.jpcc.9b10703

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  • Estimation and prediction of ellipsoidal molecular shapes in organic crystals based on ellipsoid packing. International journal

    Daiki Ito, Raku Shirasawa, Yoichiro Iino, Shigetaka Tomiya, Gouhei Tanaka

    PloS one   15 ( 9 )   e0239933   2020

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    Crystal structure prediction has been one of the fundamental and challenging problems in materials science. It is computationally exhaustive to identify molecular conformations and arrangements in organic molecular crystals due to complexity in intra- and inter-molecular interactions. From a geometrical viewpoint, specific types of organic crystal structures can be characterized by ellipsoid packing. In particular, we focus on aromatic systems which are important for organic semiconductor materials. In this study, we aim to estimate the ellipsoidal molecular shapes of such crystals and predict them from single molecular descriptors. First, we identify the molecular crystals with molecular centroid arrangements that correspond to affine transformations of four basic cubic lattices, through topological analysis of the dataset of crystalline polycyclic aromatic molecules. The novelty of our method is that the topological data analysis is applied to arrangements of molecular centroids intead of those of atoms. For each of the identified crystals, we estimate the intracrystalline molecular shape based on the ellipsoid packing assumption. Then, we show that the ellipsoidal shape can be predicted from single molecular descriptors using a machine learning method. The results suggest that topological characterization of molecular arrangements is useful for structure prediction of organic semiconductor materials.

    DOI: 10.1371/journal.pone.0239933

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  • Influence of photoexcited carriers on compositional measurements by APT: AlGaN alloy case study

    Yuya Kanitani, Shigetaka Tomiya, Tadakatsu Ohkubo, Kazuhiro Hono

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 ( 9 )   2019.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/1347-4065/ab3864

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  • Frontiers of Nitride Semiconductor Research FOREWORD

    Shigefusa F. Chichibu, Yoshinao Kumagai, Kazunobu Kojima, Momoko Deura, Toru Akiyama, Munetaka Arita, Hiroshi Fujioka, Yasufumi Fujiwara, Naoki Hara, Tamotsu Hashizume, Hideki Hirayama, Mark Holmes, Yoshio Honda, Masataka Imura, Ryota Ishii, Yoshihiro Ishitani, Motoaki Iwaya, Satoshi Kamiyama, Yoshihiro Kangawa, Ryuji Katayama, Yoichi Kawakami, Takahiro Kawamura, Atsushi Kobayashi, Masaaki Kuzuhara, Koh Matsumoto, Yusuke Mori, Takashi Mukai, Hisashi Murakami, Hideaki Murotani, Satoshi Nakazawa, Narihito Okada, Yoshiki Saito, Akira Sakai, Hiroto Sekiguchi, Koji Shiozaki, Kanako Shojiki, Jun Suda, Tetsuya Takeuchi, Tomoyuki Tanikawa, Jun Tatebayashi, Shigetaka Tomiya, Yoichi Yamada

    JAPANESE JOURNAL OF APPLIED PHYSICS   58   2019.6

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  • First-principles calculations of carrier localization in fluctuated InGaN quantum wells

    Toshiyuki Kunikiyo, Shinnosuke Hattori, Raku Shirasawa, Shigetaka Tomiya

    JAPANESE JOURNAL OF APPLIED PHYSICS   58   2019.6

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    DOI: 10.7567/1347-4065/ab0f18

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  • InGaN quantum wells with improved photoluminescence properties through strain-controlled modification of the InGaN underlayer

    Susumu Kusanagi, Yuya Kanitani, Yoshihiro Kudo, Kunihiko Tasai, Atsushi A. Yamaguchi, Shigetaka Tomiya

    JAPANESE JOURNAL OF APPLIED PHYSICS   58   2019.6

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    DOI: 10.7567/1347-4065/ab0f11

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  • Effects of gas cluster ion beam sputtering on the molecular orientation of organic semiconductor films: Ultraviolet photoelectron spectroscopy study of [6]phenacene

    Ryoji Arai, Toshio Nishi, Yoshihiro Kudo, Hiroyuki Yoshida, Shigetaka Tomiya

    APPLIED PHYSICS LETTERS   114 ( 23 )   2019.6

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    DOI: 10.1063/1.5094952

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  • Theoretical and Experimental Studies on Potential Fluctuation in InGaN Quantum-Well Layers

    T. Fujita, S. Sakai, Y. Ikeda, A. A. Yamaguchi, Y. Kanitani, S. Tomiya

    Conference Digest - IEEE International Semiconductor Laser Conference   2018-   131 - 132   2018.10

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    DOI: 10.1109/ISLC.2018.8516201

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  • A New Method to Evaluate the Degree of Potential Fluctuation in InGaN Quantum-Well Laser Diodes by Optical-Pump Stimulated-Emission Measurements

    I. Oshima, Y. Ikeda, S. Sakai, A. A. Yamaguchi, Y. Kanitani, S. Tomiya

    Conference Digest - IEEE International Semiconductor Laser Conference   2018-   209 - 210   2018.10

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    DOI: 10.1109/ISLC.2018.8516240

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  • Impact of molecular orientation on energy level alignment at C-60/pentacene interfaces

    Toshio Nishi, Masato Kanno, Miki Kuribayashi, Yasuyo Nishida, Shinnosuke Hattori, Hajime Kobayashi, Florian von Wrochem, Vadim Rodin, Gabriele Nelles, Shigetaka Tomiya

    APPLIED PHYSICS LETTERS   113 ( 16 )   2018.10

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    DOI: 10.1063/1.5051421

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  • Probing the Internal Atomic Charge Density Distributions in Real Space. International journal

    Gabriel Sánchez-Santolino, Nathan R Lugg, Takehito Seki, Ryo Ishikawa, Scott D Findlay, Yuji Kohno, Yuya Kanitani, Shinji Tanaka, Shigetaka Tomiya, Yuichi Ikuhara, Naoya Shibata

    ACS nano   12 ( 9 )   8875 - 8881   2018.9

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    Probing the charge density distributions in materials at atomic scale remains an extremely demanding task, particularly in real space. However, recent advances in differential phase contrast-scanning transmission electron microscopy (DPC-STEM) bring this possibility closer by directly visualizing the atomic electric field. DPC-STEM at atomic resolutions measures how a sub-angstrom electron probe passing through a material is affected by the atomic electric field, the field between the nucleus and the surrounding electrons. Here, we perform a fully quantitative analysis which allows us to probe the charge density distributions inside atoms, including both the positive nuclear and the screening electronic charges, with subatomic resolution and in real space. By combining state-of-the-art DPC-STEM experiments with advanced electron scattering simulations we are able to map the spatial distribution of the electron cloud within individual atomic columns. This work constitutes a crucial step toward the direct atomic scale determination of the local charge redistributions and modulations taking place in materials systems.

    DOI: 10.1021/acsnano.8b03712

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  • Prediction of emission and absorption spectra for Eu2+-doped inorganic phosphors based on stoichiometric information

    Hiroshi Nakano, Kenichi Tanaka, Tomoyuki Miyao, Kimito Funatsu, Raku Shirasawa, Shigetaka Tomiya

    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY   255   2018.3

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  • Prediction of Molecular Packing Motifs in Organic Crystals by Neural Graph Fingerprints.

    Daiki Ito, Raku Shirasawa, Shinnosuke Hattori, Shigetaka Tomiya, Gouhei Tanaka

    Neural Information Processing - 25th International Conference   26 - 34   2018

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    DOI: 10.1007/978-3-030-04221-9_3

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    Other Link: https://dblp.uni-trier.de/db/conf/iconip/iconip2018-5.html#ItoSHTT18

  • Practical Models for Predicting the Emission Peak Wavelengths of Inorganic Phosphors Based on Stoichiometric Information

    Hiroshi Nakano, Kenichi Tanaka, Tomoyuki Miyao, Kimito Funatsu, Raku Shirasawa, Shigetaka Tomiya

    CHEMISTRY LETTERS   46 ( 10 )   1482 - 1485   2017.10

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    DOI: 10.1246/cl.170611

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  • Numerical analysis for predicting the operability window of slot-die coating onto porous media

    Tomomi Goda, Yuichi Sasaki, Mamoru Mizuno, Kazuhiko Morizawa, Hitoshi Katakura, Shigetaka Tomiya

    JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH   14 ( 5 )   1053 - 1060   2017.9

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    DOI: 10.1007/s11998-017-9985-7

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  • Carrier mobility in mesoscale heterogeneous organic materials: Effects of crystallinity and anisotropy on efficient charge transport

    Hajime Kobayashi, Raku Shirasawa, Mitsunori Nakamoto, Shinnosuke Hattori, Shigetaka Tomiya

    APPLIED PHYSICS LETTERS   111 ( 3 )   2017.7

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    DOI: 10.1063/1.4995243

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  • Carrier dynamics studies of III-nitride materials using photo-acoustic and photoluminescence measurements

    Atsushi A. Yamaguchi, Takashi Nakano, Shigeta Sakai, Haruki Fukada, Yuya Kanitani, Shigetaka Tomiya

    GALLIUM NITRIDE MATERIALS AND DEVICES XII   10104   2017

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    DOI: 10.1117/12.2252468

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  • Atom probe tomography of compositional fluctuation in GaInN layers

    Yuya Kanitani, Shinji Tanaka, Shigetaka Tomiya, Tadakatsu Ohkubo, Kazuhiro Hono

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 5 )   2016.5

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    DOI: 10.7567/JJAP.55.05FM04

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  • Photoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well

    Shouichiro Izumi, Masaki Minami, Michiru Kamada, Tetsuya Tatsumi, Atsushi A. Yamaguchi, Kenji Ishikawa, Masaru Hori, Shigetaka Tomiya

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 8 )   2013.8

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    DOI: 10.7567/JJAP.52.08JL09

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  • Effect of Crystal Orientation on Mechanically Induced Sn Whiskers on Sn-Cu Plating

    Yukiko Mizuguchi, Yosuke Murakami, Shigetaka Tomiya, Tadashi Asai, Tomoya Kiga, Katsuaki Suganuma

    JOURNAL OF ELECTRONIC MATERIALS   41 ( 7 )   1859 - 1867   2012.7

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    DOI: 10.1007/s11664-012-1962-4

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  • Organic single-crystal arrays from solution-phase growth using micropattern with nucleation control region. International journal

    Osamu Goto, Shigetaka Tomiya, Yosuke Murakami, Akira Shinozaki, Akira Toda, Jiro Kasahara, Daisuke Hobara

    Advanced materials (Deerfield Beach, Fla.)   24 ( 8 )   1117 - 22   2012.2

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    A method for forming organic single-crystal arrays from solution is demonstrated using an organic semiconductor, 3,9-bis(4-ethylphenyl)-peri-xanthenoxanthene (C(2) Ph-PXX). Supersaturation of C(2) Ph-PXX/tetralin solution is spatially changed by making a large difference in solvent evaporation to generate nuclei at the designated location. The method is simple to implement since it employs only a micropattern and control of the solvent vapor pressure during growth.

    DOI: 10.1002/adma.201104373

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  • Solution-phase growth of organic single-crystal arrays

    Osamu Goto, Shigetaka Tomiya, Yosuke Murakami, Akira Shinozaki, Akira Toda, Jiro Kasahara, Daisuke Hobara

    ORGANIC FIELD-EFFECT TRANSISTORS XI   8478   2012

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    DOI: 10.1117/12.943223

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  • Effect of Crystal Orientation on Sn Whisker-Free Sn-Ag-Cu Plating

    Yukiko Mizuguchi, Yosuke Murakami, Shigetaka Tomiya, Tadashi Asai, Tomoya Kiga, Katsuaki Suganuma

    MATERIALS TRANSACTIONS   53 ( 12 )   2078 - 2084   2012

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    DOI: 10.2320/matertrans.MB201202

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  • Analysis of GaN Damage Induced by Cl-2/SiCl4/Ar Plasma

    Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, Tetsuya Tatsumi

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 8 )   2011.8

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    DOI: 10.1143/JJAP.50.08JE03

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  • Broadening the applications of the atom probe technique by ultraviolet femtosecond laser Reviewed

    K. Hono, T. Ohkubo, Y. M. Chen, M. Kodzuka, K. Oh-ishi, H. Sepehri-Amin, F. Li, T. Kinno, S. Tomiya, Y. Kanitani

    ULTRAMICROSCOPY   111 ( 6 )   576 - 583   2011.5

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    DOI: 10.1016/j.ultramic.2010.11.020

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  • Atomic scale characterization of GaInN/GaN multiple quantum wells in V-shaped pits

    Shigetaka Tomiya, Yuya Kanitani, Shinji Tanaka, Tadakatsu Ohkubo, Kazuhiro Hono

    APPLIED PHYSICS LETTERS   98 ( 18 )   2011.5

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    DOI: 10.1063/1.3585118

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  • Structural Defects and Degradation Phenomena in High-Power Pure-Blue InGaN-Based Laser Diodes.

    Shigetaka Tomiya, Osamu Goto, Masao Ikeda

    Proceedings of the IEEE   98 ( 7 )   1208 - 1213   2010

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    DOI: 10.1109/JPROC.2009.2032306

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  • Structural defects in GaN-based materials and their relation to GaN-based laser diodes Reviewed

    Tomiya S, Ikeda M, Tanaka S, Kanitani Y, Ohkubo T, Hono K

    RELIABILITY AND MATERIALS ISSUES OF SEMICONDUCTOR OPTICAL AND ELECTRICAL DEVICES AND MATERIALS   1195   2010

  • Microstructural study of the polymorphic transformation in pentacene thin films. International journal

    Yosuke Murakami, Shigetaka Tomiya, Naoki Koshitani, Yoshihiro Kudo, Kotaro Satori, Masao Itabashi, Norihito Kobayashi, Kazumasa Nomoto

    Physical review letters   103 ( 14 )   146102 - 146102   2009.10

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    We have observed, by high-resolution cross-sectional transmission electron microscopy, the first direct evidence of polymorphic transformation in pentacene thin films deposited on silicon oxide substrates. Polymorphic transformation from the thin-film phase to the bulk phase occurred preferentially near polycrystalline grain boundaries, which exhibit concave surfaces. This process is thought to be driven by compressive stress caused by the grain boundaries. In addition to this stress, lattice mismatch between the two phases also results in structural defect formation.

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  • Structural analysis of ELO-GaN grown on a sapphire substrate as the underlying layer of a GaN-based laser diode

    Takao Miyajima, Shingo Takeda, Yoshiyuki Tsusaka, Junji Matsui, Yoshihiro Kudo, Shigetaka Tomiya, Tomonori Hino, Shu Goto, Masao Ikeda, Hironobu Narui

    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE   204 ( 1 )   267 - 271   2007.1

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    DOI: 10.1002/pssa.200673568

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  • High power pure-blue semiconductor lasers

    Osamu Goto, Shigetaka Tomiya, Yukio Hoshina, Takayuki Tanaka, Makoto Ohta, Yoshitsugu Ohizumi, Yoshifumi Yabuki, Kenji Funato, Masao Ikeda

    NOVEL IN - PLANE SEMICONDUCTOR LASERS IV   6485   2007

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    DOI: 10.1117/12.725162

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  • Structural analysis of ELO-GaN grown on sapphire using the x-ray micro-beam of an 8-GeV storage ring

    Takao Miyajima, Shingo Takeda, Hideaki Kurihara, Kyoko Watanabe, Madomi Kato, Nobuhide Hara, Yoshiyuki Tsusaka, Junji Matsui, Yoshihiro Kudo, Shigetaka Tomiya, Shu Goto, Masao Ikeda, Hironobu Narui

    GAN, AIN, INN AND RELATED MATERIALS   892   519 - 530   2006

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  • Defects and degradation of nitride-based laser diodes

    Shigetaka Tomiya, Tomonori Hino, Takao Miyajima, Osamu Goto, Masao Ikeda

    NOVEL IN-PLANE SEMICONDUCTOR LASERS V   6133   2006

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    DOI: 10.1117/12.643288

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  • Structural defects related issues of GaN-based laser diodes

    Shigetaka Tomiya, Motonobu Takeya, Shu Goto, Masao Ikeda

    Materials Research Society Symposium Proceedings   831   3 - 13   2005

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  • Dislocation related issues in the degradation of GaN-based laser diodes

    Shigetaka Tomiya, Tomonori Hino, Shu Goto, Motonobu Takeya, Masao Ikeda

    IEEE Journal on Selected Topics in Quantum Electronics   10 ( 6 )   1277 - 1286   2004.11

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    DOI: 10.1109/JSTQE.2004.837735

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  • Structure analysis of ELO-GaN using a 2× 4μm2 micro-beam X-ray of an 8-GeV storage ring Reviewed

    T. Miyajima, M. Takeya, S. Goto, S. Tomiya, S. Takeda, H. Kurihara, K. Watanabe, M. Kato, N. Hara, Y. Tsusaka, J. Matsui

    physica status solidi (b)   240 ( 2 )   285 - 288   2003.11

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    DOI: 10.1002/pssb.200303323

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  • Defects in degraded GaN-based laser diodes

    Shigetaka Tomiya, Shu Goto, Motonobu Takeya, Masao Ikeda

    Physica Status Solidi (A) Applied Research   200 ( 1 )   139 - 142   2003.11

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    DOI: 10.1002/pssa.200303322

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  • Dislocations in GaN-Based Laser Diodes on Epitaxial Lateral Overgrown GaN Layers Reviewed

    S. Tomiya, H. Nakajima, K. Funato, T. Miyajima, K. Kobayashi, T. Hino, S. Kijima, T. Asano, M. Ikeda

    physica status solidi (a)   188 ( 1 )   69 - 72   2001.11

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    DOI: 10.1002/1521-396x(200111)188:1<69::aid-pssa69>3.0.co;2-8

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  • Estimation of Device Properties in AlGaInN-Based Laser Diodes by Time-Resolved Photoluminescence Reviewed

    T. Hino, T. Asano, T. Tojyo, S. Kijima, S. Tomiya, T. Miyajima, S. Uchida, M. Ikeda

    physica status solidi (a)   188 ( 1 )   101 - 104   2001.11

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    DOI: 10.1002/1521-396x(200111)188:1<101::aid-pssa101>3.0.co;2-o

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  • Threading Dislocations and Optical Properties of GaN and GaInN Reviewed

    T. Miyajima, T. Hino, S. Tomiya, K. Yanashima, H. Nakajima, Y. Nanishi, A. Satake, Y. Masumoto, K. Akimoto, T. Kobayashi, M. Ikeda

    physica status solidi (b)   228 ( 2 )   395 - 402   2001.11

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    DOI: 10.1002/1521-3951(200111)228:2<395::aid-pssb395>3.0.co;2-2

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  • GaN-based blue laser diodes

    Takao Miyajima, Tsuyoshi Tojyo, Takeharu Asano, Katsunori Yanashima, Satoru Kijima, Tomonori Hino, Motonobu Takeya, Shiro Uchida, Shigetaka Tomiya, Kenji Funato, Tsunenori Asatsuma, Toshimasa Kobayashi, Masao Ikeda

    Journal of Physics Condensed Matter   13 ( 32 )   7099 - 7114   2001.8

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    DOI: 10.1088/0953-8984/13/32/315

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  • GaN-based high-power laser diodes

    Takao Miyajima, Hiroshi Yoshida, Katsunori Yanashima, Takashi Yamaguchi, Tsunenori Asatsuma, Kenji Funato, Shigeki Hashimoto, Hiroshi Nakajima, Masafumi Ozawa, Toshimasa Kobayashi, Shigetaka Tomiya, Takeharu Asano, Shiro Uchida, Satoru Kijima, Tsuyoshi Tojyo, Tomonori Hino, Masao Ikeda

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology   82 ( 1-3 )   248 - 252   2001.5

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    DOI: 10.1016/S0921-5107(00)00758-3

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  • GaN-based violet-blue laser diodes

    S. Hashimoto, H. Nakajima, K. Yanashima, T. Asatsuma, T. Yamaguchi, H. Yoshida, M. Ozawa, K. Funato, S. Tomiya, T. Miyajima, T. Kobayashi, S. Uchida, M. Ikeda

    Proceedings of SPIE - The International Society for Optical Engineering   4354   1 - 11   2001

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    DOI: 10.1117/12.418812

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  • Growth and characterization of GaN underlying layer used in blue-violet GaN-based laser diodes on sapphire

    Kenji Funato, Tomonori Hino, Shigetaka Tomiya, Takao Miyajima, Takeharu Asano, Tsyuyoshi Tojyo, Shigeki Hashimoto, Katsunori Yanashima, Shiro Uchida, Koshi Tmamura, Toshimasa Kobayashi, Masao Ikeda

    Materials Research Society Symposium - Proceedings   639   G9.1.9   2001

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  • Properties of GaN-based laser diodes with a buried-ridge structure Reviewed

    Tsunenori Asatsuma, Hiroshi Nakajima, Shigeki Hashimoto, Takashi Yamaguchi, Hiroshi Yoshida, Shigetaka Tomiya, Takeharu Asano, Tomonori Hino, Masafumi Ozawa, Takao Miyajima, Toshimasa Kobayashi, Masao Ikeda

    Journal of Crystal Growth   221 ( 1-4 )   640 - 645   2000.12

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    DOI: 10.1016/s0022-0248(00)00792-2

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  • Characterization of threading dislocations in GaN epitaxial layers

    T. Hino, S. Tomiya, T. Miyajima, K. Yanashima, S. Hashimoto, M. Ikeda

    Applied Physics Letters   76 ( 23 )   3421 - 3423   2000.6

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    DOI: 10.1063/1.126666

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  • Relation between interface morphology and recombination-enhanced defect reaction phenomena in II-VI light emitting devices Reviewed

    S Tomiya, H Okuyama, A Ishibashi

    APPLIED SURFACE SCIENCE   159   243 - 249   2000.6

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  • Non-radiative nature of threading dislocations in GaN grown by metal-organic chemical vapor deposition Reviewed

    T Miyajima, T Hino, S Tomiya, A Satake, E Tokunaga, Y Masumoto, T Maruyama, M Ikeya, S Morishima, K Akimoto, K Yanashima, S Hashimoto, T Kobayashi, M Ikeda

    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS   1   536 - 539   2000

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  • Defects in ZnSe/ZnTe multiple quantum well-based pseudo-ohmic contacts to p-ZnSe Reviewed

    S Tomiya, S Kijima, H Okuyama, H Tsukamoto, T Hino, S Taniguchi, H Noguchi, E Kato, A Ishibashi

    JOURNAL OF APPLIED PHYSICS   86 ( 7 )   3616 - 3623   1999.10

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  • Optimized ZnSe : N/ZnTe : N contact structure of ZnSe-based II-VI laser diodes Reviewed

    S Kijima, H Okuyama, Y Sanaka, T Kobayashi, S Tomiya, A Ishibashi

    APPLIED PHYSICS LETTERS   73 ( 2 )   235 - 237   1998.7

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  • Optimized contact structure for II-VI laser diode Reviewed

    S Kijima, H Okuyama, Y Sanaka, T Kobayashi, S Tomiya, A Ishibashi

    BLUE LASER AND LIGHT EMITTING DIODES II   429 - 432   1998

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  • Surface morphology changes in ZnSe-related II-VI epitaxial films grown by molecular beam epitaxy Reviewed

    S Tomiya, R Minatoya, H Tsukamoto, S Itoh, K Nakano, E Morita, A Ishibashi

    JOURNAL OF APPLIED PHYSICS   82 ( 6 )   2938 - 2943   1997.9

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  • Heterointerface control of ZnSe based II-VI laser diodes Reviewed

    S Itoh, S Tomiya, R Imoto, A Ishibashi

    APPLIED SURFACE SCIENCE   117   719 - 724   1997.6

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  • Structural study of degraded ZnMgSSe blue light emitters Reviewed

    K Nakano, S Tomiya, M Ukita, H Yoshida, S Itoh, E Morita, M Ikeda, A Ishibashi

    JOURNAL OF ELECTRONIC MATERIALS   25 ( 2 )   213 - 216   1996.2

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  • Defect studies in ZnSSe and ZnMgSSe by chemical etching and transmission electron microscopy Reviewed

    M Shiraishi, S Tomiya, S Taniguchi, K Nakano, A Ishibashi, M Ikeda

    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH   152 ( 2 )   377 - 383   1995.12

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    DOI: 10.1002/pssa.2211520206

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  • DEVICE STRUCTURES AND CHARACTERISTICS OF LASER-DIODES WITH ZNMGSSE CLADDING LAYERS Reviewed

    T OHATA, S ITOH, N NAKAYAMA, S MATSUMOTO, K NAKANO, M OZAWA, H OKUYAMA, S TOMIYA, M IKEDA, A ISHIBASHI

    PHYSICA STATUS SOLIDI B-BASIC RESEARCH   187 ( 2 )   279 - 283   1995.2

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  • Structural study of degraded II-VI blue-light emitters Reviewed

    S Tomiya, M Ukita, H Okuyama, K Nakano, S Itoh, A Ishibashi, E Morita, M Ikeda

    ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4   196-   1109 - 1116   1995

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  • ZNCDSE/ZNSSE/ZNMGSSE SCH LASER-DIODE WITH A GAAS BUFFER LAYER Reviewed

    S ITOH, N NAKAYAMA, S MATSUMOTO, M NAGAI, K NAKANO, M OZAWA, H OKUYAMA, S TOMIYA, T OHATA, M IKEDA, A ISHIBASHI, Y MORI

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   33 ( 7A )   L938 - L940   1994.7

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    DOI: 10.1143/jjap.33.L938

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MISC

  • Spatial Luminescence Characterization of InGaN Single Quantum Wells and Underlayer-Inserted Quantum Wells Using Cathodoluminescence Spectral Imaging

    辻井大地, 福隆之介, 赤瀬善太郎, 岩満一功, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Preliminary Application of Non-Rigid Registration to Three-Dimensional Atom Probe Data and STEM Tomography Data

    赤瀬善太郎, 別所泰成, 日野雄輝, GOTMARE Yugant, 大竹義人, 埋橋淳, 岩満一功, 中島宏, 山崎順, 大久保忠勝, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Evaluation of Recombination Dynamics Inhomogeneity in InGaN Quantum Wells by Time-Resolved Photoluminescence Lifetime Distribution Analysis

    岩満一功, 新保樹, 赤瀬善太郎, 横川俊哉, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Spectral Imaging and Wavelength- and Angle-Resolved SEM-CL of Nitride Semiconductor Nanostructures

    宇佐美翔太, 赤瀬善太郎, 岩満一功, 横川俊哉, 冨谷茂隆

    まてりあ(Web)   65 ( 1 )   2026

  • Temperature and wavelength dependence of photoluminescence lifetime in InGaN quantum wells with different alloy composition

    山形梨里花, 畑中颯真, 山岸颯矢, 新保樹, 山口敦史, 岩満一功, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • A Study on an Accuracy Validation Method for Non-Rigid Registration between APT Data and STEM Tomography Data Using Atomic-Scale Simulated Datasets

    彌榮陽斗, 別所泰成, 岩満一功, 大竹義人, 赤瀬善太郎, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Recombination Dynamics Analysis by Spectrally and Time-Resolved TRPL in GaN with Different Impurity Concentrations

    池辺啓太, 伊藤央祐, 秋山航太郎, 櫻井裕太, 金木奨太, 藤倉序章, 岩満一功, 赤瀬善太郎, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Quantum-well-resolved evaluation of recombination kinetics in InGaN multiple quantum wells: an insight into the role of luminescence enhancement in InGaN underlayer systems

    新保樹, 土佐宏樹, 森恵人, 森恵人, 山口敦史, 岩満一功, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   73rd   2026

  • Deep Learning-Based Automated Evaluation Pipeline for Semiconductor Etched Geometry

    野島聖耀, 岩満一功, 赤瀬善太郎, 菊池昭彦, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Progress and Outlook of Metrology Informatics

    冨谷茂隆, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Pioneering New Directions in Metrology Informatics-Focusing on Electron Microscopy-

    冨谷茂隆, 冨谷茂隆, 赤瀬善太郎, 赤瀬善太郎, 岩満一功, 岩満一功

    薄膜・表面物理基礎講座(Web)   54th   2025

  • The relationship between the crystallinity and thermal conductivity of MoS2 thin films produced by RF magnetron sputtering.

    北澤辰也, 稲葉雄大, 山下俊介, 今井慎也, 黒原啓太, 辰巳哲也, 若林整, 冨谷茂隆, 冨谷茂隆, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Low-particle-flux sputtering of thin MoS2 film at low temperature

    今井慎也, 宗田伊理也, 角嶋邦之, 辰巳哲也, 冨谷茂隆, 若林整

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Development of a Bimodal Correlative Microscopy Method Using Three-Dimensional Atom Probe and Transmission Electron Microscopy Analysis

    赤瀬善太郎, 別所泰成, 大竹義人, 埋橋淳, 岩満一功, 中島宏, 山崎順, 大久保忠勝, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Local luminescence characterization of gallium nitride semiconductors by wavelength angle-resolved cathodoluminescence method

    宇佐美翔太, 赤瀬善太郎, 岩満一功, 横川俊哉, 藤倉序章, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Non-rigid Registration of 3D Atom Probe and Transmission Electron Microscopy Data

    赤瀬善太郎, 大竹義人, 埋橋淳, 岩満一功, 山崎順, 大久保忠勝, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Spectral Imaging Analysis of InGaN QWs Using Nonnegative Matrix Factorization: II

    岩満一功, 坂井健太, 赤瀬善太郎, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Temperature and wavelength dependence of photoluminescence lifetime in InGaN quantum wells with different alloy composition

    山形梨里花, 畑中颯真, 山岸颯矢, 新保樹, 山口敦史, 岩満一功, 冨谷茂隆

    電子情報通信学会技術研究報告(Web)   125 ( 257(ED2025 23-40) )   2025

  • Bayesian Inference for Time-Resolved Photoluminescence in Nitride Semiconductors

    池辺啓太, 岩満一功, 金木奨太, 藤倉序章, 赤瀬善太郎, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2025

  • Tilt-scan DPC-STEM Analysis of Polarity-Inverted AlN Crystals

    冨谷茂隆, 赤瀬善太郎, 岩満一功, 安原聡, 玉野智大, 赤池良太, 三宅秀人

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Principal Component Analysis of Cathodoluminescence Emission Spatial Structures in InGaN Quantum Well

    福隆之介, 赤瀬善太郎, 岩満一功, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Bayesian Inference Analysis of Time-Resolved Photoluminescence Decay Behavior in an InGaN Quantum Well

    岩満一功, 新保樹, 赤瀬善太郎, 横川俊哉, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Spectral Imaging Analysis of InGaN QWs Using Nonnegative Matrix Factorization

    岩満一功, 坂井健太, 赤瀬善太郎, 山口敦史, 冨谷茂隆

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   85th   2024

  • A study on the carrier dynamics in InGaN quantum-well systems with different alloy compositions

    山形梨里花, 新保樹, 森恵人, 山口敦史, 岩満一功, 冨谷茂隆

    電子情報通信学会技術研究報告(Web)   124 ( 278(ED2024 20-38) )   2024

  • A study on the carrier dynamics in InGaN quantum-well systems with different well numbers

    新保樹, 土佐宏樹, 神野翔綺, 森恵人, 山口敦史, 岩満一功, 冨谷茂隆

    電子情報通信学会技術研究報告(Web)   124 ( 278(ED2024 20-38) )   2024

  • Detailed analysis of wavelength dependence of photoluminescence lifetime in an InGaN single quantum well

    新保樹, 土佐宏樹, 山口敦史, 岩満一功, 冨谷茂隆

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   85th   2024

  • Simultaneous microscopic PA/PL line-scan measurements in InGaN-quantum wells on a stripe-core GaN Substrate

    神野翔綺, 山口敦史, 森恵人, 草薙進, 蟹谷裕也, 冨谷茂隆, 工藤喜弘

    電子情報通信学会技術研究報告(Web)   123 ( 288(ED2023 14-37) )   2023

  • Current-Voltage Characteristics of Edge Metal Contact for MoS2 Film Formed by Sputtering

    今井慎也, 梶川亮介, 川那子高暢, 宗田伊理也, 角嶋邦之, 辰巳哲也, 冨谷茂隆, 筒井一生, 若林整

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   84th   2023

  • Effects of doping and influences of etching by Cl2 plasma treatment for PVD-WS2 films

    黒原啓太, 今井慎也, 冨谷茂隆, 辰巳哲也, 若林整

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   84th   2023

  • Plasma-driven science: Toward radical innovation on plasma processing

    石川健治, 浜口智志, 成田絵美, 白谷正治, 冨谷茂隆, 室賀駿, 佐藤孝紀, 野崎智洋, 吉田朋子

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   70th   2023

  • Sheet resistance reduction of sputtered WS2 film by Cl2 plasma treatment

    黒原啓太, 今井慎也, 冨谷茂隆, 辰巳哲也, 若林整

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   70th   2023

  • Metrology Informatics in Semiconductors

    冨谷茂隆, 冨谷茂隆, 冨谷茂隆

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   70th   2023

  • Advanced Measurement and Analysis Systems Using AI/ML for Next Generation Materials Development―Multifaceted View 2―

    Okamoto Kazuya, Sugiyama Masaaki, Muto Shunsuke, Aoyagi Satoka, Tomiya Shigetaka

    Materia Japan   61 ( 9 )   579 - 587   2022.9

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    DOI: 10.2320/materia.61.579

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  • Advanced Measurement and Analysis Systems Using AI/ML for Next Generation Materials Development ―Multifaceted View 1―

    Okamoto Kazuya, Sugiyama Masaaki, Muto Shunsuke, Aoyagi Satoka, Tomiya Shigetaka

    Materia Japan   61 ( 8 )   470 - 478   2022.8

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    DOI: 10.2320/materia.61.470

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  • The Observation of Local Electric Fields in GaN/AlGaN/InGaN Multi-heterostructures by Differential Phase Contrast STEM Reviewed

    Toyama Satoko, Seki Takehito, Kanitani Yuya, Tomiya Shigetaka, Ikuhara Yuichi, Shibata Naoya

    IEEJ Transactions on Electronics, Information and Systems   142 ( 3 )   367 - 372   2022.3

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    The local electric field distributions inside specimens can be directly observed by differential-phase-contrast scanning transmission electron microscopy (DPC STEM). In this study, we applied DPC STEM to GaN/AlGaN/InGaN multi-heterostructures. We successfully visualized the differences in electrostatic potentials of GaN/AlGaN/InGaN.

    DOI: 10.1541/ieejeiss.142.367

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  • 計測インフォマティクス : 計測は科学の源—特集 データ駆動型の化学 : 何ができて,何ができない?

    冨谷 茂隆

    現代化学 = Chemistry today   ( 612 )   25 - 28   2022.3

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  • Separated Evaluation of Radiative and Non-Radiative Recombination Lifetimes in Ion-implanted InGaN Quantum Wells

    森恵人, 森本悠也, 山肥田涼, 今城大渡, 柏木咲希, 高野泰雅, 石田悠, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   83rd   2022

  • Absolute Measurement of Emission Internal Quantum Efficiency in III-Nitride Semiconductors by Simultaneous Photo-Acoustic and Photoluminescence Spectroscopy

    Yamaguchi Atsushi A., Mori-Tamamura Keito, Kusanagi Susumu, Tomiya Shigetaka

    Journal of the Japanese Association for Crystal Growth   48 ( 4 )   n/a   2022

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    Emission internal quantum efficiency (IQE) is an important index evaluating the quality of active layers in optical devices. The IQE is usually estimated from temperature dependence of photoluminescence (PL) intensity by assuming that the IQE at cryogenic temperature is 100 %. III-nitride films, however, usually have high-density crystal defects, and it cannot be said that the assumption is valid. In 2016, we proposed a new method to estimate accurate IQE values by simultaneous PL and photo-acoustic (PA) measurements, and demonstratively evaluated the IQE values for various GaN samples. After that, we applied the method to InGaN quantum-well active layers and estimated the IQE values and their excitation carrier-density dependence in the layers. In this paper, we will introduce the principle of our simultaneous PA/PL measurement and will present some examples of absolute measurement of IQE values in III-nitride semiconductor samples.

    DOI: 10.19009/jjacg.48-4-01

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  • Experimental Studies on the Recombination Mechanism in III-Nitride Semiconductors by Simultaneous Measurements of Radiative and Non-Radiative Recombinations

    森恵人, 森本悠也, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    電子情報通信学会技術研究報告(Web)   122 ( 271(ED2022 24-48) )   2022

  • Absolute Measurement of Emission Internal Quantum Efficiency in III-Nitride Semiconductors by Simultaneous Photo-Acoustic and Photoluminescence Spectroscopy

    山口敦史, 森恵人, 草薙進, 冨谷茂隆

    日本結晶成長学会誌(CD-ROM)   48 ( 4 )   2022

  • Separate Evaluation of Radiative and Non-Radiative Recombination Lifetimes in InGaN Quantum Wells by Combination of Simultaneous Photoacoustic & Photoluminescence and Time-Resolved Photoluminescence Measurements

    森恵人, 森本悠也, 袴田舜也, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   69th   2022

  • Research on sputter deposition rate dependence of MoS2 film quality

    今井慎也, 小野凌, 宗田伊理也, 角嶋邦之, 辰巳哲也, 冨谷茂隆, 筒井一生, 若林整

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   83rd   2022

  • Opening

    Kutsukake Kentaro, Chikyow Toyohiro, Kotsugi Masato, Tomiya Shigetaka, Harada Shunta

    JSAP Annual Meetings Extended Abstracts   2021.1   227 - 227   2021.2

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    DOI: 10.11470/jsapmeeting.2021.1.0_227

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  • 光音響・発光同時計測法による窒化物半導体の発光内部量子効率の絶対測定—Absolute Measurement of Emission Internal Quantum Efficiency in Ⅲ-Nitride Semiconductors by Simultaneous Photo-Acoustic and Photoluminescence Spectroscopy—特集 ワイドギャップ半導体の光・フォノン物性の最先端評価解析技術

    山口 敦史, 森 恵人, 草薙 進, 冨谷 茂隆

    日本結晶成長学会誌 Journal of the Japanese Association for Crystal Growth   48 ( 4 )   1 - 9   2021

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  • Theoretical modeling of temperature-dependent PL spectra in InGaN quantum wells

    袴田舜也, 藤田貴志, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   82nd   2021

  • In Composition Dependence of Internal Quantum Efficiency in InGaN Quantum-Wells Measured by Simultaneous Microscopic Photoacoustic and Photoluminescence Spectroscopy

    森恵人, 高橋佑知, 森本悠也, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   82nd   2021

  • X Informatics for Semiconductor Device and Material R&D

    冨谷茂隆, 冨谷茂隆

    結晶成長国内会議予稿集(CD-ROM)   50th   2021

  • Internal and External Quantum Efficiency in InGaN Quantum Wells Estimated by Simultaneous Photoacoustic and Photoluminescence Method and Integrating-Sphere Method

    Mori Keito, Takahashi Yuchi, Sakai Shigeta, Morimoto Yuya, Yamaguchi Atsushi, Kusanagi Susumu, Kanitani Yuya, Kudo Yoshihiro, Tomiya Shigetaka

    JSAP Annual Meetings Extended Abstracts   2020.2 ( 254(ED2020 1-26) )   2066 - 2066   2020.8

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    DOI: 10.11470/jsapmeeting.2020.2.0_2066

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  • Quantitative electric field mapping in GaN/AlGaN heterostructures by DPC STEM

    遠山慧子, 関岳人, 蟹谷裕也, 工藤喜弘, 冨谷茂隆, 幾原雄一, 柴田直哉

    日本セラミックス協会秋季シンポジウム講演予稿集(CD-ROM)   33rd   2020

  • Estimation of Internal Quantum Efficiency in Various InGaN Single Quantum Wells with Different Qualities by Simultaneous Photoacoustic and Photoluminescence Measurements

    森恵人, 高橋佑知, 森本悠也, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    電子情報通信学会技術研究報告   119 ( 303 )   101 - 106   2019.11

  • InGaN量子井戸におけるMobility edgeの見積り方法に関する実験的・理論的検討—Theoretical and Experimental Studies on Estimation Methods of Mobility Edge in InGaN Quantum Wells—レーザ・量子エレクトロニクス

    藤田 貴志, 坂井 繁太, 池田 優真, 山口 敦史, 草薙 進, 蟹谷 裕也, 工藤 喜弘, 冨谷 茂隆

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   119 ( 304 )   97 - 100   2019.11

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    Other Link: http://id.ndl.go.jp/bib/030133504

  • Sheet resistance reduction of Sputtered MoS2 Film by Cl2 Plasma Treatment

    Hamada Takuya, Horiguchi Taiga, Tatsumi Tetsuya, Tomiya Shigetaka, Hamada Masaya, Hoshii Takuya, Kakushima Kuniyuki, Tsutsui Kazuo, Wakabayashi Hitoshi

    JSAP Annual Meetings Extended Abstracts   2019.2   3888 - 3888   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_3888

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  • Direct observation of electric field in GaN semiconductor hetero interface by DPC STEM

    Toyama Satoko, Seki Takehito, Kanitani Yuya, Kudo Yoshihiro, Tomiya Shigetaka, Ikuhara Yuichi, Shibata Naoya

    JSAP Annual Meetings Extended Abstracts   2019.2   1737 - 1737   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_1737

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  • Measurements of Internal Quantum Efficiency in Various InGaN Single Quantum Wells with Different Qualities by Simultaneous Photoacoustic and Photoluminescence Spectroscopy

    Mori Keito, Takahashi Yuchi, Yamaguchi Atsushi, Kusanagi Susumu, Kanitani Yuya, Kudo Yoshihiro, Tomiya Shigetaka

    JSAP Annual Meetings Extended Abstracts   2019.2   3549 - 3549   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_3549

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  • Sheet-Resistance Reduction of Sputtered-MoS2 Film by SF6 Plasma Treatment

    Horiguchi Taiga, Hamada Takuya, Tatsumi Tetsuya, Tomiya Shigetaka, Hoshii Takuya, Kakushima Kuniyuki, Tsutsui Kazuo, Wakabayashi Hitoshi

    JSAP Annual Meetings Extended Abstracts   2019.2   3887 - 3887   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_3887

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  • Observation of gap states in thin films exposed to oxygen by high-sensitivity ultraviolet photoelectron spectroscopy

    Kimata Shunsuke, Shimizu Kouhei, Matuzaki Atsushi, Maruyama Taichi, Nishi Toshio, Tomiya Shigetaka, Tanaka Yuuya, Ishii Hisao

    JSAP Annual Meetings Extended Abstracts   2019.2   2477 - 2477   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_2477

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  • Evaluation of the Band Structure at Metal/GaN Interfaces Using Hard X-ray Photoelectron Spectroscopy

    Mizushima Hirotaka, Arai Ryoji, Inaba Yuta, Yamashita Shunsuke, Yamaguchi Yudai, Kanitani Yuya, Kudo Yoshihiro, Hamaguchi Tatsushi, Koda Rintaro, Yanashima Katsunori, Tomiya Shigetaka

    JSAP Annual Meetings Extended Abstracts   2019.2   3591 - 3591   2019.9

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    DOI: 10.11470/jsapmeeting.2019.2.0_3591

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  • Theoretical and Experimental Studies on Potential Fluctuation in InGaN Quantum-Well Structures

    Fujita Takashi, Sakai Shigeta, Ikeda Yuma, Yamaguchi Atsushi A., Kanitani Yuya, Tomiya Shigetaka

    JSAP Annual Meetings Extended Abstracts   2019.1 ( 330(ED2018 32-52) )   3130 - 3130   2019.2

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    DOI: 10.11470/jsapmeeting.2019.1.0_3130

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  • Theoretical and Experimental Studies on Estimation Methods of Mobility Edge in InGaN Quantum Wells

    藤田貴志, 坂井繁太, 池田優真, 山口敦史, 草薙進, 蟹谷裕也, 工藤喜弘, 冨谷茂隆

    電子情報通信学会技術研究報告   119 ( 304(LQE2019 76-101) )   2019

  • 電子エネルギー損失分光法スペクトルを対象とした結晶性および組成の解析手法の開発

    山本寛人, 田中健一, 山下俊介, 浮田昌一, 中野博史, 白沢楽, 冨谷茂隆, 小寺正明, 船津公人

    ケモインフォマティクス討論会予稿集(Web)   42nd   2019

  • 機械学習を用いた組成式からの無機化合物結晶系予測

    見内伸之, 田中健一, 中野博史, 浮田昌一, 白沢楽, 冨谷茂隆, 小寺正明, 船津公人

    ケモインフォマティクス討論会予稿集(Web)   42nd   2019

  • A new method to evaluate the degree of potential fluctuation in InGaN quantum-well laser diodes by optical-pump stimulated-emission measurements

    大島一輝, 池田優真, 坂井繁太, 山口敦史, 蟹谷裕也, 冨谷茂隆

    電子情報通信学会技術研究報告   118 ( 330 )   79 - 82   2018.11

  • InGaN量子井戸の組成揺らぎ評価に関する実験的・理論的検討—Theoretical and Experimental Studies on Potential Fluctuation in InGaN Quantum-Well Structures—電子部品・材料

    藤田 貴志, 坂井 繁太, 池田 優真, 山口 敦史, 蟹谷 裕也, 冨谷 茂隆

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   118 ( 331 )   75 - 78   2018.11

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  • Structural Defects and Composition Fluctuation of GaN-based Alloy Semiconductor

    Tomiya Shigetaka, Kanitani Yuya

    JSAP Annual Meetings Extended Abstracts   2018.1   342 - 342   2018.3

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    DOI: 10.11470/jsapmeeting.2018.1.0_342

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  • デバイス・材料開発におけるマテリアルインフォマティクスの課題と可能性—Possibilities and issues of materials informatics for materials and device R&D—マテリアルズインフォマティクスによる材料・デバイス開発の最前線

    冨谷 茂隆, 知京 豊裕

    応用電子物性分科会誌 = Bulletin of solid state physics and applications / 応用物理学会応用電子物性分科会 編   24 ( 2 )   45 - 52   2018

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  • アンサンブル学習を利用した吸収波長予測

    菅原悠樹, 小寺正明, 田中健一, 中野博史, 浮田昌一, 白沢楽, 冨谷茂隆, 船津公人

    ケモインフォマティクス討論会予稿集(Web)   41st   2018

  • Developing Novel Descriptors to Predict Physical Properties of Inorganic Compounds from Compositional Formula

    Sakata Fusako, Kotera Masaaki, Tanaka Kenichi, Nakano Hiroshi, Ukita Masakazu, Shirasawa Raku, Tomiya Shigetaka, Funatsu Kimito

    Journal of Computer Aided Chemistry   19   7 - 18   2018

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    In order to efficiently discover novel materials with desirable properties, it is necessary to develop a method to predict physical properties from only compositional formula. In this study, we constructed a regression model expressing relationship between compositional formula and the physical properties. The composition formula of the inorganic material were converted into descriptors, and were used as explanatory variables. We proposed a total of 387 diverse and general descriptors using the numbers of atomic elements and their parameters such as atomic weight, electronegativity, etc., enabling prediction of various physical properties. As a case study, we built predictive models by random forest regression using our proposed descriptors, and predicted three physical properties, i.e., crystal formation energy, density and refractive index. The obtained R2 values were 0.970, 0.977 and 0.766, respectively. In addition to the successful predictive performance, we were also able to statistically select the descriptors that contributed to the prediction models, and they were reasonable from the viewpoint of chemical knowledge.

    DOI: 10.2751/jcac.19.7

    DOI: 10.2320/matertrans.mt-y2022004_references_DOI_Cw5lN53QQtBNByiLvBohdcfjCGm

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  • A Novel Method to Measure Absolute Internal Quantum Efficiency in III-nitride Semiconductors by Simultaneous Photo-acoustic and Photoluminescence Spectroscopy

    Yamaguchi Atsushi A., Nakano Takashi, Sakai Shigeta, Kanitani Yuya, Tomiya Shigetaka

    JSAP Annual Meetings Extended Abstracts   2017.1   281 - 281   2017.3

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    DOI: 10.11470/jsapmeeting.2017.1.0_281

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  • 光音響・発光同時計測による窒化物半導体の内部量子効率の絶対測定

    山口敦史, 中納隆, 坂井繁太, 深田晴己, 蟹谷裕也, 冨谷茂隆

    電子情報通信学会大会講演論文集(CD-ROM)   2017   2017

  • A novel method to measure absolute internal quantum efficiency in InGaN quantum wells by simultaneous photo-acoustic and photoluminescence spectroscopy

    清水奈緒人, 高橋佑知, 小林玄季, 中納隆, 坂井繁太, 山口敦史, 蟹谷裕也, 冨谷茂隆

    電子情報通信学会技術研究報告   117 ( 332 )   1 - 6   2017

  • Detailed analysis of S-shaped temperature dependence of photoluminescence peak energy in InGaN quantum wells

    池田優真, 坂井繁太, 大島一輝, 山口敦史, 蟹谷裕也, 冨谷茂隆

    電子情報通信学会技術研究報告   117 ( 333 )   11 - 14   2017

  • 充電による結晶Si粒子の構造変化のその場SEM観察

    小川健一, 細井慎, 工藤喜弘, 草薙進, 田中伸史, 冨谷茂隆

    電池討論会講演要旨集   56th   2015

  • プラズマ光と表面の相互作用の解明

    ZHANG Yan, 石川健治, 関根誠, 深沢正永, 長畑和典, 冨谷茂隆, 辰巳哲也, 竹田圭吾, 近藤博基, 堀勝

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   61st   2014

  • 機械的応力により発生するSnウィスカにおける屈曲・湾曲部の形成と結晶方位の関係性—Effect of Crystal Orientation on Kink Formation on Mechanically Induced Sn Whiskers—高密度実装を牽引する材料技術とヘテロインテグレーション論文特集 Reviewed

    水口 由紀子, 村上 洋介, 冨谷 茂隆

    電子情報通信学会論文誌. C, エレクトロニクス = The IEICE transactions on electronics. C / 電子情報通信学会 編   95 ( 11 )   333 - 342   2012.11

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  • 機械的応力により発生するSnウィスカにおける屈曲・湾曲部の形成と結晶方位の関係性

    水口由紀子, 水口由紀子, 村上洋介, 冨谷茂隆, 浅井正, 気賀智也, 菅沼克昭

    電子情報通信学会論文誌 C   J95-C ( 11 )   2012

  • 温度可変時間分解PL法によるGaInNへのプラズマダメージ解析

    泉将一郎, 鎌田満, 南正樹, 辰巳哲也, 山口敦史, 冨谷茂隆

    応用物理学会学術講演会講演予稿集(CD-ROM)   72nd   2011

  • Structural Defects in GaN-based Laser Diodes(<Special Issue>Defects in Nitride Semiconductors)

    Tomiya Shigetaka, Ikeda Masao

    Journal of the Japanese Association for Crystal Growth   36 ( 3 )   222 - 228   2009

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    Reduction of structural defects in GaN- based laser diodes is of critical importance for high efficient and high reliable performance. Therefore, it is very important to understand their characteristics,. Since their crystal structure is different from that of conventional zinc-blende-based III-V materials such as GaAs, different kinds of structural defects are nucleated in the epitaxial films for GaN-based laser diodes. Here we review on transmission electron microscope analysis of various kinds of structural defects observed in these epitaxial films.

    DOI: 10.19009/jjacg.36.3_222

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  • Mechanism Analysis for Tin Whisker Growth by Mechanical Stress and Mitigation Technolgy

    KIGA Tomoya, ASAI Tadashi, MIZUGUCHI Yukiko, MURAKAMI Yosuke, TANAKA Shinji, TOMIYA Shigetaka

    Journal of The Japan Institute of Electronics Packaging   11 ( 5 )   356 - 362   2008

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    DOI: 10.5104/jiep.11.356

    DOI: 10.4139/sfj.68.84_references_DOI_Bxbp0abm3bCk43yp32PbpwTtfJJ

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  • Test Method and Mechanism Analysis for Tin Whisker Growth by Mechanical Stress

    KIGA Tomoya, ASAI Tadashi, MIZUGUCHI Yukiko, MURAKAMI Yosuke, TANAKA Shinji, TOMIYA Shigetaka

    Journal of The Surface Finishing Society of Japan   59 ( 4 )   223 - 227   2008

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    DOI: 10.4139/sfj.59.223

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  • 鉛フリーSnめっきにおける外部応力型ウィスカ/ノジュールの解析

    水口由紀子, 村上洋介, 田中伸史, 冨谷茂隆, 浅井正, 気賀智也

    信頼性・保全性シンポジウム発表報文集   38th   2008

  • Structural Defects and Degradation of High Power Pure-Blue GaN-based Laser Diodes

    TOMIYA Shigetaka, GOTO Osamu, IKEDA Masao, OHIZUMI Yoshitsugu, SHOUJI Miwako, TANAKA Takayuki, HOSHINA Yukio, OHTA Makoto, YABUKI Yoshifumi

    電気学会光・量子デバイス研究会資料   2007 ( 53 )   17 - 21   2007.12

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  • CS-4-6 High Power Pure-Blue Semiconductor Lasers for Display Applications

    Goto Osamu, Ohizumi Yoshitsugu, Ohta Makoto, Hoshina Yukio, Tanaka Takayuki, Yabuki Yoshifumi, Funato Kenji, Tomiya Shigetaka, Ikeda Masao

    Proceedings of the IEICE General Conference   2007 ( 1 )   "S - 62"-"S-63"   2007.3

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  • Suppression of COD in pure-blue laser diodes with current injection-free region near the laser facet

    後藤修, 大泉善嗣, 庄司美和子, 田中隆之, 保科幸男, 太田誠, 矢吹義文, 冨谷茂隆, 池田昌夫

    電子情報通信学会技術研究報告   107 ( 253(LQE2007 57-79) )   2007

  • 端面電流非注入構造導入によるAlGaInN純青色レーザのCOD抑制

    田中隆之, 庄司美和子, 保科幸男, 大泉善嗣, 太田誠, 矢吹義文, 冨谷茂隆, 後藤修, 池田昌夫

    応用物理学会学術講演会講演予稿集   68th ( 3 )   2007

  • Pyramidal Defects in Mg Doped GaN Epitaxial Layers

    Tomiya Shigetaka

    Materia Japan   43 ( 12 )   1030 - 1030   2004

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    DOI: 10.2320/materia.43.1030

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  • Structural Defects in Degraded GaN-based Semiconductor Laser Diodes

    TOMIYA Shigetaka, GOTO Shu, TAKEYA Motonobu, IKEDA Masao

    電子情報通信学会技術研究報告   103 ( 343 )   73 - 76   2003.9

  • X線マイクロビームを用いたELO-GaNの結晶構造解析

    宮嶋孝夫, 竹谷元伸, 後藤修, 冨谷茂隆, 竹田晋吾, 栗原英明, 渡辺経子, 加藤まどみ, 松井純爾

    応用物理学会学術講演会講演予稿集   64th ( 1 )   2003

  • GaN系半導体レーザ中の結晶欠陥—小特集テーマ:進展する窒化物半導体光・電子デバイスの現状,及び一般

    冨谷 茂隆, 日野 智公, 宮嶋 孝夫

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   102 ( 119 )   71 - 74   2002.6

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  • Threading Dislocations in GaN and GaInN.

    宮嶋孝夫, 日野智公, 冨谷茂隆, やな嶋克典, 朝妻庸紀, 小林俊雅, 池田昌夫

    電子情報通信学会技術研究報告   102 ( 115 )   21 - 24   2002.6

  • TEM Analysis of Degraded ZnCdSe Quantum Well Strructures

    Tomiya Shigetaka

    Materia Japan   40 ( 12 )   1002 - 1002   2001

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    DOI: 10.2320/materia.40.1002

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  • HVPE法による低貫通転位密度GaN基板

    冨岡聡, 冨谷茂隆, 船戸健次, 宮嶋孝夫, 小林俊雅

    応用物理学会学術講演会講演予稿集   61st ( 1 )   2000

  • Fabrication of GaN Laser Diodes with Buried-Ridge Structure.

    山口恭司, 朝妻庸紀, 浅野竹春, 日野智公, やな嶋克典, 冨谷茂隆, 船戸健次, 小林俊雅, 池田昌夫

    Proceedings of the Sony Research Forum   9th   2000

  • 加圧MOCVD成長したGaInN多重量子井戸からの発光過程

    船戸健次, 橋本茂樹, 冨谷茂隆, 宮嶋孝夫, 小林俊雅

    応用物理学関係連合講演会講演予稿集   47th ( 1 )   2000

  • 2-6族半導体発光デバイスのCLおよびTEM評価—〔1999年〕日本電子顕微鏡学会第44回シンポジウム論文集 新しい顕微鏡技術が切り開く生命と物質の世界,学会賞(瀬藤賞)受賞講演〔含 著者索引〕 ; ワークショップ:ワイドギャップ半導体のカソードルミネッセンス評価

    冨谷 茂隆, 戸田 淳, 石橋 晃

    電子顕微鏡 / 「電子顕微鏡」編集委員会 編   34 ( Suppl.2 )   233 - 236   1999.11

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  • ELO GaN膜の構造解析 マスク材料依存性

    冨谷茂隆, 日野智公, 喜嶋悟, 船戸健次, 浅野竹春, 朝妻庸紀, 池田昌夫

    応用物理学関係連合講演会講演予稿集   46th ( 1 )   1999

  • GaN膜における貫通転位の振る舞い (1)

    日野智公, 冨谷茂隆, 宮嶋孝夫, やな嶋克典, 橋本茂樹, 池田昌夫

    応用物理学会学術講演会講演予稿集   60th ( 1 )   1999

  • GaN膜における貫通転位のふるまい (2) エッチピットとの対応

    冨谷茂隆, 日野智公, 冨岡聡, 朝妻庸紀, 宮嶋孝夫, 池田昌夫

    応用物理学会学術講演会講演予稿集   60th ( 1 )   1999

  • Defect structure of ZnSe/ZnTe MQW structures used in II-VI laser diodes.

    冨谷茂隆, 喜嶋悟, 奥山浩之, 日野智公, 谷口理, 塚本弘範, 野口祐泰, 加藤豪作, 石橋晃

    応用物理学会学術講演会講演予稿集   59th ( 1 )   1998

  • Hetero-Interfaces in II-VI Semiconductor Laser Diodes.

    冨谷茂隆, 石橋晃

    応用物理学会学術講演会講演予稿集   59th   1998

  • Micro-structural study of opticaly degraded ZnCdSe Quantum Well.

    冨谷茂隆, 野口祐泰, 左中由美, 日野智公, 谷口理, 石橋晃

    応用物理学会学術講演会講演予稿集   58th ( 1 )   1997

  • Surface Roughning and Composition Modulation on ZnSe related Films. (2).

    冨谷茂隆, 塚本弘範, 伊藤哲, 中野一志, 森田悦男, 石橋晃

    応用物理学会学術講演会講演予稿集   57th ( 1 )   1996

  • Defect studies in ZnSSe and ZnMgSSe by etching and TEM.

    白石誠司, 谷口理, 冨谷茂隆, 中野一志, 石橋晃, 池田昌夫

    応用物理学関係連合講演会講演予稿集   43rd ( 1 )   1996

  • Structure of defects induced current injection into II-VI blue light emitter.

    冨谷茂隆, 浮田昌一, 奥山浩之, 伊藤哲, 中野一志, 森田悦男, 石橋晃

    応用物理学関係連合講演会講演予稿集   42nd ( Pt 1 )   1995

  • Surface Roughness and Composition Modulation on ZnSe, ZnSSe, and ZnMgSSe.

    冨谷茂隆, 湊屋理佳子, 塚本弘範, 伊藤哲, 中野一志, 森田悦男, 石橋晃, 池田昌夫

    応用物理学会学術講演会講演予稿集   56th ( 1 )   1995

  • AlGaInP epitaxial growth on structured substrate.

    山本直, 冨谷茂隆, 森田悦男, 石橋晃, 森芳文

    応用物理学会学術講演会講演予稿集   53rd ( 1 )   1992

  • TEM observation of MBE-grown ZnSSe crystals on GaAs substrates.

    冨谷茂隆, 森田悦男, 奥山浩之, 秋本克洋

    応用物理学関係連合講演会講演予稿集   38th ( Pt 1 )   1991

  • 31p-M2-1 金属超微粒子の光吸収(表面・界面)

    富谷 茂隆, 川村 清

    年会講演予稿集   43.2   332   1988

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    DOI: 10.11316/jpsgaiyod.43.2.0_332_1

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  • 充放電制御装置、充放電制御方法、電池パック、電子機器、電動車両、電動工具および電力貯蔵システム

    田中 雅洋, 越谷 直樹, 堀内 優努, 守澤 和彦, 冨谷 茂隆

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    Applicant:株式会社村田製作所

    Application no:JP2017000956  Date applied:2017.1

    Publication no:WO2017-183238  Date published:2017.10

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  • 二次電池、その評価方法、製造方法、および充放電制御装置

    田中 雅洋, 清水 良史, 堀内 優努, 冨谷 茂隆

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    Applicant:株式会社村田製作所

    Application no:特願2017-534114  Date applied:2016.5

    Patent/Registration no:特許第6504253号  Date registered:2019.4 

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  • 二次電池、その評価方法、製造方法、および充放電制御装置

    田中 雅洋, 清水 良史, 堀内 優努, 冨谷 茂隆

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    Application no:JP2016063730  Date applied:2016.5

    Publication no:WO2017-026149  Date published:2017.2

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  • 発光素子

    田才 邦彦, 仲山 英次, 中山 雄介, 冨谷 茂隆

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    Application no:特願2010-258883  Date applied:2010.11

    Announcement no:特開2012-109499  Date announced:2012.6

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    Application no:特願2010-238739  Date applied:2010.10

    Announcement no:特開2011-054982  Date announced:2011.3

    Patent/Registration no:特許第5434882号  Date registered:2013.12 

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    Patent/Registration no:特許第5640553号  Date registered:2014.11 

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    Application no:特願2009-174008  Date applied:2009.7

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    Patent/Registration no:特許第5152121号  Date registered:2012.12 

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    Application no:特願2008-113136  Date applied:2008.4

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    Application no:特願2008-047184  Date applied:2008.2

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    Patent/Registration no:特許第4462249号  Date registered:2010.2 

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    Patent/Registration no:特許第4042775号  Date registered:2007.11 

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    Patent/Registration no:特許第4890755号  Date registered:2011.12 

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    Patent/Registration no:特許第3975971号  Date registered:2007.6 

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    Application no:特願2001-315703  Date applied:2001.10

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    Patent/Registration no:特許第4290358号  Date registered:2009.4 

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  • GaN系半導体レーザの製造方法

    日野 智公, 東條 剛, 池田 昌夫, 大藤 良夫, 内田 史朗, 冨谷 茂隆, 森田 悦男

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    Applicant:ソニー株式会社

    Application no:特願2001-191614  Date applied:2001.6

    Announcement no:特開2002-335053  Date announced:2002.11

    Patent/Registration no:特許第4977931号  Date registered:2012.4 

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  • 半導体レーザの製造方法、半導体レーザ、半導体装置の製造方法および半導体装置

    日野 智公, 東條 剛, 池田 昌夫, 大藤 良夫, 内田 史朗, 冨谷 茂隆, 森田 悦男

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    Application no:特願2001-191614  Date applied:2001.6

    Announcement no:特開2002-335053  Date announced:2002.11

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  • 窒化物半導体膜の製造方法

    冨谷 茂隆

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    Application no:特願2001-169442  Date applied:2001.6

    Announcement no:特開2002-367909  Date announced:2002.12

    Patent/Registration no:特許第4631214号  Date registered:2010.11 

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  • 窒化物半導体レーザ及びその製造方法

    冨谷 茂隆, 日野 智公

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    Applicant:ソニー株式会社

    Application no:特願2001-169440  Date applied:2001.6

    Announcement no:特開2002-368343  Date announced:2002.12

    Patent/Registration no:特許第3876649号  Date registered:2006.11 

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  • 窒化物半導体レーザ

    冨谷 茂隆, 日野 智公

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    Application no:特願2001-169440  Date applied:2001.6

    Announcement no:特開2002-368343  Date announced:2002.12

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  • 窒化物半導体膜およびその製造方法

    冨谷 茂隆

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    Application no:特願2001-169442  Date applied:2001.6

    Announcement no:特開2002-367909  Date announced:2002.12

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  • 化合物半導体基板の製造方法

    宮嶋 孝夫, 冨谷 茂隆, 碓井 彰

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    Applicant:ソニー株式会社, 日本電気株式会社

    Application no:特願2001-108017  Date applied:2001.4

    Announcement no:特開2002-305160  Date announced:2002.10

    Patent/Registration no:特許第3795765号  Date registered:2006.4 

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  • 化合物半導体基板の製造方法

    宮嶋 孝夫, 冨谷 茂隆, 碓井 彰

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    Applicant:ソニー株式会社, 日本電気株式会社

    Application no:特願2001-108017  Date applied:2001.4

    Announcement no:特開2002-305160  Date announced:2002.10

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  • 窒化物半導体素子の製造方法

    冨谷 茂隆, 日野 智公, 山口 恭司

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    Applicant:ソニー株式会社

    Application no:特願2001-031378  Date applied:2001.2

    Announcement no:特開2002-237656  Date announced:2002.8

    Patent/Registration no:特許第4639484号  Date registered:2010.12 

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  • 窒化物半導体層の成長方法及び窒化物半導体素子

    冨谷 茂隆, 日野 智公, 山口 恭司

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    Applicant:ソニー株式会社

    Application no:特願2001-031378  Date applied:2001.2

    Announcement no:特開2002-237656  Date announced:2002.8

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  • 窒化物半導体素子及びその製造方法

    冨谷 茂隆, 中島 博, 山口 恭司

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    Applicant:ソニー株式会社

    Application no:特願2001-031377  Date applied:2001.2

    Announcement no:特開2002-237655  Date announced:2002.8

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  • 半導体発光装置およびその製造方法

    玉村 好司, 簗嶋 克典, 中島 博, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願2000-383027  Date applied:2000.12

    Announcement no:特開2002-185084  Date announced:2002.6

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  • エッチング方法および結晶性評価方法並びに半導体装置の製造方法

    日野 智公, 冨岡 聡, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平11-264485  Date applied:1999.9

    Announcement no:特開2000-188285  Date announced:2000.7

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  • 半導体レーザおよびその製造方法ならびに半導体装置およびその製造方法

    浅野 竹春, 池田 昌夫, 東條 剛, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平11-116804  Date applied:1999.4

    Announcement no:特開2000-307193  Date announced:2000.11

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  • 半導体レ-ザおよびその製造方法ならびに半導体装置およびその製造方法

    浅野 竹春, 朝妻 庸紀, 日野 智公, 冨谷 茂隆, 山口 恭司, 小林 高志

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    Applicant:ソニー株式会社

    Application no:特願平11-116805  Date applied:1999.4

    Announcement no:特開2000-223781  Date announced:2000.8

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  • 半導体レーザ

    浅野 竹春, 朝妻 庸紀, 日野 智公, 冨谷 茂隆, 山口 恭司, 小林 高志

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    Applicant:ソニー株式会社

    Application no:特願平11-116805  Date applied:1999.4

    Announcement no:特開2000-223781  Date announced:2000.8

    Patent/Registration no:特許第3804335号  Date registered:2006.5 

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  • 半導体レーザの製造方法および半導体装置の製造方法

    浅野 竹春, 朝妻 庸紀, 日野 智公, 冨谷 茂隆, 山口 恭司, 小林 高志

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    Applicant:ソニー株式会社

    Application no:特願2003-158298  Date applied:1999.4

    Announcement no:特開2003-332693  Date announced:2003.11

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  • 半導体レーザおよびその製造方法

    浅野 竹春, 池田 昌夫, 東條 剛, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平11-116804  Date applied:1999.4

    Announcement no:特開2000-307193  Date announced:2000.11

    Patent/Registration no:特許第3735638号  Date registered:2005.11 

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  • 窒化物系III-V族化合物半導体の成長方法、半導体装置の製造方法および半導体装置

    日野 智公, 浅野 竹春, 朝妻 庸紀, 喜嶋 悟, 船戸 健次, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平10-335851  Date applied:1998.11

    Announcement no:特開2000-164988  Date announced:2000.6

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  • 半導体薄膜と半導体素子と半導体装置とこれらの製造方法

    冨谷 茂隆, 船戸 健次

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    Applicant:ソニー株式会社

    Application no:特願平10-336307  Date applied:1998.11

    Announcement no:特開2000-164929  Date announced:2000.6

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  • 半導体薄膜および半導体素子の製造方法

    冨谷 茂隆, 船戸 健次

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    Applicant:ソニー株式会社

    Application no:特願平10-336307  Date applied:1998.11

    Announcement no:特開2000-164929  Date announced:2000.6

    Patent/Registration no:特許第4032538号  Date registered:2007.11 

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  • 窒化物系III-V族化合物半導体の成長方法、半導体装置の製造方法および半導体装置

    日野 智公, 浅野 竹春, 朝妻 庸紀, 喜嶋 悟, 船戸 健次, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願2003-108074  Date applied:1998.11

    Announcement no:特開2003-289047  Date announced:2003.10

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  • 窒化物系III-V族化合物半導体の成長方法、半導体装置の製造方法および半導体装置

    日野 智公, 浅野 竹春, 朝妻 庸紀, 喜嶋 悟, 船戸 健次, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平10-335851  Date applied:1998.11

    Announcement no:特開2000-164988  Date announced:2000.6

    Patent/Registration no:特許第3470623号  Date registered:2003.9 

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  • 半導体素子および半導体発光素子ならびに半導体受光素子

    冨谷 茂隆, 喜嶋 悟, 奥山 浩之, 谷口 理, 塚本 弘範

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    Applicant:ソニー株式会社

    Application no:特願平10-182276  Date applied:1998.6

    Announcement no:特開2000-022276  Date announced:2000.1

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  • 半導体装置

    冨谷 茂隆, 谷口 理, 日野 智公

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    Applicant:ソニー株式会社

    Application no:特願平9-314105  Date applied:1997.11

    Announcement no:特開平11-150331  Date announced:1999.6

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  • II-VI族化合物半導体層の形成方法およびII-VI族化合物半導体装置

    冨谷 茂隆, 谷口 理, 日野 智公, 小林 高志

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    Applicant:ソニー株式会社

    Application no:特願平9-115712  Date applied:1997.5

    Announcement no:特開平10-308557  Date announced:1998.11

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  • 半導体発光素子

    冨谷 茂隆, 小沢 正文, 伊藤 哲, 池田 昌夫

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    Applicant:ソニー株式会社

    Application no:特願平7-298914  Date applied:1995.10

    Announcement no:特開平9-121073  Date announced:1997.5

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  • 半導体装置

    冨谷 茂隆, 池田 昌夫

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    Applicant:ソニー株式会社

    Application no:特願平7-293580  Date applied:1995.10

    Announcement no:特開平9-116234  Date announced:1997.5

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  • 半導体発光素子

    冨谷 茂隆, 池田 昌夫

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    Applicant:ソニー株式会社

    Application no:特願平7-293580  Date applied:1995.10

    Announcement no:特開平9-116234  Date announced:1997.5

    Patent/Registration no:特許第3785660号  Date registered:2006.3 

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  • 半導体エピタキシャル成長方法

    冨谷 茂隆, 中野 一志, 伊藤 哲, 湊屋 理佳子

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    Applicant:ソニー株式会社

    Application no:特願平6-250801  Date applied:1994.10

    Announcement no:特開平8-115877  Date announced:1996.5

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  • 光半導体装置

    松元 理, 冨谷 茂隆, 中野 一志, 長井 政春, 伊藤 哲, 石橋 晃, 森田 悦男

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    Applicant:ソニー株式会社

    Application no:特願平6-204245  Date applied:1994.8

    Announcement no:特開平8-051251  Date announced:1996.2

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  • 半導体レーザ

    中野 一志, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平6-061566  Date applied:1994.3

    Announcement no:特開平7-273397  Date announced:1995.10

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  • 周期構造部と周期構造部を有する半導体装置の製法

    冨谷 茂隆, 中野 一志

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    Applicant:ソニー株式会社

    Application no:特願平6-033819  Date applied:1994.3

    Announcement no:特開平7-245446  Date announced:1995.9

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  • 半導体発光素子とその製法

    塚本 弘範, 冨谷 茂隆

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    Applicant:ソニー株式会社

    Application no:特願平5-315525  Date applied:1993.12

    Announcement no:特開平7-170021  Date announced:1995.7

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  • 化合物半導体装置とその製造方法

    森田 悦男, 冨谷 茂隆, 山本 直, 石橋 晃

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    Applicant:ソニー株式会社

    Application no:特願平4-142842  Date applied:1992.6

    Announcement no:特開平5-335258  Date announced:1993.12

    Patent/Registration no:特許第3257034号  Date registered:2001.12 

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  • 化合物半導体装置とその製造方法

    森田 悦男, 冨谷 茂隆, 山本 直, 石橋 晃

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    Applicant:ソニー株式会社

    Application no:特願2001-256416  Date applied:1992.6

    Announcement no:特開2002-094183  Date announced:2002.3

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  • 化合物半導体装置とその製造方法

    森田 悦男, 冨谷 茂隆, 山本 直, 石橋 晃

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    Applicant:ソニー株式会社

    Application no:特願2001-256416  Date applied:1992.6

    Announcement no:特開2002-094183  Date announced:2002.3

    Patent/Registration no:特許第3465704号  Date registered:2003.8 

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  • 化合物半導体装置とその製造方法

    森田 悦男, 冨谷 茂隆, 山本 直, 石橋 晃

     More details

    Applicant:ソニー株式会社

    Application no:特願平4-142842  Date applied:1992.6

    Announcement no:特開平5-335258  Date announced:1993.12

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Awards

  • 第13回日本金属学会 まてりあ論文賞

    2023.9   日本金属学会   先端材料開発に向けた、AI先端計測技術の多角的視点からの考察(第1回)(第2回)

    岡本 和也, 杉山 昌章, 武藤 俊介, 青柳 里果, 冨谷 茂隆

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  • JSAP Fellow

    2021.9   The Japan Society of Applied Physics   Study on Defects and Degradation Mechanisms in Wide-bandgap Compound Semiconductor Optical Devices

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Research Projects

  • ワイドギャップ半導体デバイスシミュレーションのための物性物理モデル構築

    Grant number:23K03944  2023.4 - 2026.3

    日本学術振興会  科学研究費助成事業  基盤研究(C)

    山口 敦史, 冨谷 茂隆

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    Grant amount:\4810000 ( Direct Cost: \3700000 、 Indirect Cost:\1110000 )

    本研究課題では、窒化物半導体デバイスの正確なシミュレーションを実現するために、混晶窒化物半導体におけるキャリアダイナミクス、状態密度、価電子帯構造とその歪みによる変化などについて実験を重ね、そのすべての現象を説明する包括的な理論モデルの構築とそれに基づく物性パラメータの決定を行うことを目的としている。
    2023年度は、混晶組成や欠陥密度が系統的に異なるInGaN量子井戸の試料シリーズにおいて、光音響・発光同時計測や時間分解PL測定を様々な励起強度や温度で行い、そこから輻射再結合速度と非輻射再結合速度のキャリア密度依存性、温度依存性を明らかにし、理論モデル構築の材料を得た。この中で、Si基板上InGaN量子井戸のように励起光を吸収する基板に対しては、この手法がうまく適用できないことを明らかになり、その対応策として光音響測定を高周波で行えばよいことを発案し、その実用性をデモ実験で示すことができた。
    また、InGaN量子井戸内におけるキャリア拡散長の測定も行った。過去の報告では、このキャリア拡散長が文献によって大きくバラついている。この原因は発光の再吸収・再発光過程にあると考え、この効果が極力影響しない測定手法を考案し、実際に実験を行った。そして、InGaN量子井戸のキャリア拡散長がキャリア密度によって特異的に変化することを見出した。
    さらに、InGaN量子井戸に連続的に応力を印加し、c面内に異方性歪みを導入することにより価電子帯を変化させ、それにより偏光特性の変化を測定することに成功した。このデータの解析により、InGaNの変形ポテンシャルの値とそのIn組成依存性について知見を得た。

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  • Growth mechanism and thermoelectric conversion property of transition metal dichalcogenides thin films

    Grant number:22K04181  2022.4 - 2025.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (C)  Grant-in-Aid for Scientific Research (C)

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    Grant amount:\4160000 ( Direct Cost: \3200000 、 Indirect Cost:\960000 )

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Teaching Experience

  • Advanced Topics on Material Analysis and Basics of Plasma Processing for Nano Devices

    2019.9 Institution:Tokyo Institute of Technology

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  • Data Science (Materials Informatics for Inorganic Materials)

    2024.7 Institution:Nara Institute of Science and Technology

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  • Materials science and engineering (thermodynamics, statistical mechanics)

    2024.4 Institution:Nara Institute of Science and Technology

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  • Introduction to Material Science and Engineering

    2024.4 Institution:Nara Institute of Science and Technology

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