Updated on 2026/04/01

写真a

 
IDE KEISUKE
 
Organization
Institute of Integrated Research MDX Research Center for Element Strategy Assistant Professor
Title
Assistant Professor
External link

News & Topics

Degree

  • 博士(工学) ( 2017.9   東京工業大学 )

Research Areas

  • Nanotechnology/Materials / Inorganic materials and properties

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electric and electronic materials

Education

  • Tokyo Institute of Technology

    - 2012.3

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    Notes: Graduated

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Research History

  • Institute of Science Tokyo   MDX Research Center for Element Strategy , Institute of Integrated Research   Assistant Professor

    2024.10

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  • Tokyo Institute of Technology   MDX Materials Research Center for Element Strategy   Assistant Professor

    2023.4 - 2024.9

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  • Osaka University   Joining and Welding Research Institute

    2018

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  • 物質・材料研究機構 (NIMS)   外来研究者

    2018 - 2021

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  • Tokyo Institute of Technology   Institute of Innovative Research   Assistant Professor

    2016.4 - 2023.3

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  • Tokyo Institute of Technology   Materials and Structures Laboratory   Assistant Professor

    2015.1 - 2016.3

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  • Sharp corporation   Department of display device development

    2012.4 - 2014.12

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    Country:Japan

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Committee Memberships

  • International Meeting on Information Display   Program Sub-Committee  

    2024   

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  • SSDM(国際固体素子カンファレンス)   2025年度 実行委員  

    2024 - 2025   

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  • International TFT conference   Program Committee  

    2024   

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  •   JJAP 特集号 Guest Editor  

    2023   

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  • 薄膜材料デバイス研究会   組織委員会  

    2022   

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    Committee type:Academic society

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  •   SSDM(国際固体素子カンファレンス) 論文委員  

    2020   

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    Committee type:Academic society

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  • 応用物理学会   学術講演会 プログラム編集委員  

    2018 - 2023   

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    Committee type:Academic society

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  •   独立行政法人日本学術振興会 166委員会 委員長補佐  

    2015.1 - 2017.3   

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  • 日本学術振興会   産学協力研究委員会 166委員会  

    2015 - 2022   

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Papers

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Books

  • 2020年版・薄膜作製応用ハンドブック

    井手 啓介, 片瀬 貴義, 雲見日 出也, 野村 研二, 細野 秀雄, 神谷 利夫( Role: Contributor4編2章7節1項 アモルファス酸化物半導体:In-Ga-Zn-O (pp. 1138-1144))

    エヌ・ティー・エス株式会社  2020 

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  • Amorphous Oxide Semiconductors

    Toshio Kamiya, Kenji Nomura, Keisuke Ide, Hideo Hosono( Role: ContributorChapter 4: Defects and Relevant Properties; Amorphous Oxide Semiconductors (pp. 93-103))

    John Wiley & Sons  2022 

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  • Amorphous Oxide Semiconductors

    Keisuke Ide, Junghwan Kim, Hideo Hosono, Toshio Kamiya( Role: ContributorChapter 27: Rare-earth and Transition-metal Doped Amorphous Oxide Semiconductor Phosphor for Novel Light-emitting Diode Display (pp. 577-584))

    John Wiley & Sons  2022 

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  • Chapter 6, Novel Structured Metallic and Inorganic Materials, ed. by Yuichi Setsuhara, Toshio Kamiya, and Shin-ichi Yamaura

    Toshio Kamiya, Hidenori Hiramatsu, Keisuke Ide, Takayoshi Katase, Hideo Hosono(Exotic Crystal Structures and Electronic Structures in Novel Structured Inorganic Materials)

    Springer Nature Singapore Pte Ltd  2019.7 

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    Responsible for pages:107 - 120   Language:English   Book type:Scholarly book

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  • 21世紀版薄膜作製応用ハンドブック 4編 2章 光部品 7節 透明導電膜

    井手啓介, 片瀬貴義, 野村研二, 雲見日出也, 細野秀雄, 神谷利夫(アモルファス酸化物半導体:In-Ga-Zn-O)

    2019.6 

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    Language:Japanese   Book type:Scholarly book

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  • Novel Structured Metallic and Inorganic Materials

    Toshio Kamiya, Hidenori Hiramatsu, Keisuke Ide, Takayoshi Katase, Hideo Hosono( Role: ContributorExotic Crystal Structures and Electronic Structures in Novel Structured Inorganic Materials (pp. 107-120))

    Springer Singapore  2019 

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  • Novel Structured Metallic and Inorganic Materials

    Toshio Kamiya, Kenji Nomura, Keisuke Ide, Junghwan Kim, Hidenori Hiramatsu, Hideya Kumomi, Hideo Hosono( Role: ContributorAmorphous oxide semiconductor thin-film transistors (pp. 573-587))

    2019 

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MISC

  • Plasma-Assisted Reactive Sputtering for Amorphous Gallium Oxide Thin Film Formation

    竹中弘祐, 小松響, 藤村知輝, 都甲将, 井手啓介, 江部明憲, 神谷利夫, 節原裕一

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   70th   2023

Presentations

  • (チュートリアル)アモルファス酸化物半導体の評価技術 Invited

    井手啓介

    一般財団法人 総合研究奨励会(東京大学 総合研究機構)  2022.10 

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  • (招待講演)Machine-learning Approaches for IGZO Research Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    24th International Meeting on Information Display  2024.8 

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    Event date: 2024.8

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  • (招待講演)Transport analysis of amorphous oxide semiconductor and related materials Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    18th International Thin-Film Transistor Conference  2024.3 

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    Event date: 2024.3

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  • Strain-Induced Modulation of Thermopower and Electrical Conductivity of LaTiO3 Epitaxial Films on LaAlO3 Substrate International conference

    Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics  2017.7 

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    Event date: 2017.7

    Language:English   Presentation type:Poster presentation  

    Venue:Tokyo  

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  • (パネルディスカッション)ディスプレイの次のキラーアプリをねらえ!酸化物半導体の最前線 Invited

    小林 正治, 浦岡 行治, 池田 圭司, 井手 啓介, 長坂 恵一, 生田目 俊秀, 國武 寛司, 徳光 永輔, 木村 睦, 西山 彰

    第70回応用物理学会 春季学術講演会 シンポジウム  2023.3 

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  • (受賞記念講演)Electronic Structures and Defects Analysis of Amorphous Oxide Semiconductor toward IGZO Display Application Invited

    Keisuke Ide

    International Display Workshops  2022.12 

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  • (招待講演)アモルファス酸化物半導体における機能開拓の最前線 Invited

    井手啓介, 細野秀雄, 神谷利夫

    第70回応用物理学会 春季学術講演会 シンポジウム  2023.3 

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  • (招待講演)Rare-earth and transition metal doping for amorphous oxide semiconductor Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    Material Research Meeting 2021  2021.12 

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  • (招待講演)Electronic defects in AOS and recent development Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    The 27th International Workshop on Active-Matrix Flat panel Displays and Devices  2020.6 

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  • (招待講演)Present status of amorphous oxide semiconductor: Electronic defects and material development Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    ISPlasma/IC-PLANTS2021  2021.3 

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  • (招待講演)Development of new amorphous oxide semiconductors Invited

    Keisuke Ide, Hideo Hosono, Toshio Kamiya

    International Conference on Display Technology 2020  2020.3 

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  • (招待講演)Depth Analysis of Near VBM Defect in Amorphous Oxide Semiconductor Invited

    Keisuke Ide, Masato Ota, Takayoshi Katase, Hidenori Hiramatsu, Shigenori Ueda, Hideo Hosono, Toshio Kamiya

    Intl. Meeting on Electrochem. and Solid-State Science  2018.9 

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  • (招待講演)アモルファス酸化物半導体を用いた新規デバイスの開拓 Invited

    井手啓介, 金正煥, 片瀬貴義, 細野秀雄, 神谷利夫

    第16回薄膜材料デバイス研究会  2019.10 

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  • (招待講演)アモルファス酸化物半導体の欠陥・物性に関する理解とデバイス応用の現状 Invited

    井手啓介, 金正煥, 片瀬貴義, 平松秀典, 雲見日出也, 細野秀雄, 神谷利夫

    電子情報通信学会 2017年 ソサイエティ大会  2017.9 

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  • (受賞記念講演)全反射硬X線光電子分光法によるアモルファス酸化物半導体の価電子帯直上欠陥の深さ方向分布 Invited

    井手啓介, 太田雅人, 岸田陽介, 片瀬貴義, 平松秀典, 上田茂典, 雲見日出也, 細野秀雄, 神谷利夫

    第65回応用物理学会春季学術講演会  2018.3 

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  • (招待講演) Amorphous Oxide Semiconductors for Optoelectronic Applications Invited

    Keisuke Ide

    2025.5 

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  • (講師)IGZOのスパッタ成膜と新規物性 Invited

    井手啓介

    日本真空学会SP部会 第181回定例研究会  2025.3 

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  • (111)配向非平衡岩塩型(Sn,Ca)Seエピタキシャル薄膜のドメイン境界の電気特性

    片瀬貴義, ホ シンイ, チェン ジンシュアイ, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会第42回電子材料研究討論会  2022.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

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  • 非平衡(Sn1-xPbx)S固溶体の格子間Snによる高濃度電子ドーピング

    フゾンシュ, 平松茉莉, ホシンイ, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会第42回電子材料研究討論会  2022.11 

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  • 高移動度岩塩型(Sn,Ca)Se準安定相のエピタキシャル薄膜成長とキャリア輸送特性

    片瀬貴義, ホ シンイ, チェン ジンシュアイ, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    第83回応用物理学会秋季学術講演会  2022.9 

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  • 準安定(Pb1-xSnx)Se固溶体の2次元-3次元構造転移に伴う熱伝導率変調

    片瀬貴義, 西村優作, ホ シンイ, 只野央将, 井手啓介, 気谷卓, 半沢幸太, 平松秀典, 川路均, 細野秀雄, 神谷利夫

    第83回応用物理学会秋季学術講演会  2022.9 

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  • 準安定(Pb1-xSnx)Se固溶体の合成:2次元-3次元構造転移の誘起と電気・熱伝導率変調

    片瀬貴義, ホ シンイ, チェン ジンシュアイ, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会第42回電子材料研究討論会  2022.11 

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  • (Sn1-xPbx)S固溶体の非平衡合成と熱・電気特性制御

    フゾンシュ, 平松茉莉, ホシンイ, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    応用物理学会第6回フォノンエンジニアリング研究会  2022.7 

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  • Degenerated hole doping and enhanced thermoelectric figure-of-merit ZT in layered SnSe by isovalent Te ion substitution

    Xinyi He, Haoyun Zhang, Takumi Nose, Takayoshi Katase, Terumasa Tadano, Keisuke Ide, hidenori hiramatsu, HIDEO HOSONO, TOSHIO KAMIYA

    2022.9 

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  • (111)配向非平衡岩塩型(Sn,Ca)Seエピタキシャル薄膜のドメイン境界の電気特性

    ホシンイ, チェン ジンシュアイ, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第35回秋季シンポジウム  2022.9 

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  • 層状SnSe非平衡相のエピタキシャル膜による安定化と構造・電気特性

    樋口龍生, 片瀬貴義, 半沢幸太, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第35回秋季シンポジウム  2022.9 

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  • 非平衡(Sn,Pb)S固溶体の合成: 格子間Snによる電子ドーピングと強フォノン散乱

    フゾンシュ, 平松茉莉, ホシンイ, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第35回秋季シンポジウム  2022.9 

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  • 第一原理計算による環境調和型熱電変換材料の探索システム構築

    南島悠人, ホシンイ, 井手啓介, 片瀬貴義, 神谷利夫

    薄膜材料デバイス研究会第20回研究集会「薄膜材料デバイス研究会が見据える次世代技術・未来デバイス」  2023.11 

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  • Thermal conductivity modulation using morphotropic phase boundary of 2D-3D chalcogenide semiconductors International conference

    Takayoshi Katase, Xinyi He, Yusaku Nishimura, Keisuke Ide, Hidenori Hiramatsu, Toshio Kamiya

    The 3rd International Symposium on Design & Engineering by Joint Inverse Innovation for Materials Architecture  2023.10 

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  • Amorphous-oxide-semiconductor-based phosphors for inorganic light-emitting diodes International conference

    Keisuke Ide, Takayoshi Katase, Toshio Kamiya

    The 3rd International Symposium on Design & Engineering by Joint Inverse Innovation for Materials Architecture  2023.10 

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  • Search of optimal deposition conditions and regression model of a-In-Ga-Zn-O by machine learning International conference

    Atsushi Shimizu, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 23rd International Meeting on Information Display  2023.8 

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  • ZnO中の水素複合欠陥

    ホ シンイ, 片瀬貴義, 井手啓介, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第19回研究集会「新半導体材料・デバイス:SDGs実現へ向けて」  2022.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:京都  

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  • アモルファス 12CaO・7Al2O3 を用いた ReRAM

    門野太助, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第19回研究集会「新半導体材料・デバイス:SDGs実現へ向けて」  2022.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:京都  

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  • Mobility analysis for polycrystalline and amorphous oxide semiconductors using Seto model combined with in-grain scattering factors International conference

    Keisuke Ide, Tasuke Kadono, Atsushi Shimizu, Koji Yamaguchi, Emi Kawashima, Yuki Tsuruma, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 23rd International Meeting on Information Display  2023.8 

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  • Suppressing Hydrogen Diffusion and Enhancing Reliability of Short-Channel InGaZnO Thin Film Transistors by Bottom-Gate Oxide Engineering

    K. Zhou, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, B. Huang, P. Yen, T. Chang, S. M. Sze

    薄膜材料デバイス研究会 第19回研究集会「新半導体材料・デバイス:SDGs実現へ向けて」  2022.11 

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    Venue:京都  

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  • 超高真空スパッタリング装置を用いた高移動度多結晶 Zn3N2 薄膜

    清水篤, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第19回研究集会「新半導体材料・デバイス:SDGs実現へ向けて」  2022.11 

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    Venue:京都  

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  • スパッタリング法によるアモルファス酸化ガリウム薄膜の作製とダイオー ド特性の評価

    嵯峨野太一, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第19回研究集会「新半導体材料・デバイス:SDGs実現へ向けて」  2022.11 

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    Venue:京都  

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  • Device characteristics of rare-earth doped amorphous oxide semiconductors International conference

    T. Kamiya, K. Ide, K. Takenaka, Y. Setsuhara, A. Hiraiwa, H. Kawarada, T. Katase, H. Hiramatsu, H. Hosono

    The 3rd International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-3)  2018.9 

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    Language:English   Presentation type:Poster presentation  

    Venue:Tokyo  

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  • Why Poly-OS IGO Exhibits Mobilities > 50cm2/Vs International conference

    Y. Tsuruma, K. Yamaguchi, D. Sasaki, E. Kawashima, T. Kadono, K. Ide, T. Katase, M. Kimura, T. Kamiya

    PRiME 2024  2024.10 

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    Language:English   Presentation type:Oral presentation (general)  

    Venue:Honolulu  

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  • Electric double layer transistor and electron-transport properties of (Tl,K)2Fe4Se5 thin films International conference

    T. Katase, K. Ide, H. Hiramatsu, H. Hosono, T. Kamiya

    The 3rd International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-3)  2018.9 

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    Venue:Tokyo  

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  • Tandem neural network for direct solution of multivalued inverse problem International conference

    Toshio Kamiya, Masatoshi Kimura, Keisuke Ide, Takayoshi Katase

    The 4th International Symposium on Design & Engineering by Joint Inverse Innovation for Materials Architecture (DEJI2MA2024)  2024.10 

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    Language:English   Presentation type:Poster presentation  

    Venue:Tokyo  

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  • Electrical characteristics of microfabricatd ferromagneticl material La0.67Sr0.33MnO3 International conference

    Yasuo Azuma, Yusaku Kobayashi, Keisuke Ide, Takayoshi Katase, Toshio Kamiya

    The 3rd International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development  2018.9 

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  • What determines electron effective mass and structural stability in crystalline semiconductors with InGaZnO4 isostructures International conference

    Tomoya Suzuki, Keisuke Ide, Takayoshi Katase, Hideo Hosono, Toshio Kamiya

    IMID 2024  2024.8 

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    Venue:Jeju  

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  • 遷移金属元素を発光中心としたアモルファス酸化物半導体蛍光体薄膜の探索

    二角勇毅, 渡邉脩人, 井手啓介, 金正煥, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    第56回 セラミックス基礎科学討論会  2018.1 

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  • InGaZnO4 型ホモロガス酸化物における高移動度半導体の設計

    鈴木朝也, 井手啓介, 片瀬貴義, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会第20回研究集会「薄膜材料デバイス研究会が見据える次世代技術・未来デバイス」  2023.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

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  • 機械学習を用いたアモルファス In-Ga-Zn-O トランジスタの高速特性予測および欠陥解析

    木村公俊, K. Zhou, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, T. Chang, 神谷利夫

    薄膜材料デバイス研究会第20回研究集会「薄膜材料デバイス研究会が見据える次世代技術・未来デバイス」  2023.11 

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  • 機械学習による多孔質アモルファス In-Ga-Zn-O 薄膜の成膜条件最適化

    清水篤, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会第20回研究集会「薄膜材料デバイス研究会が見据える次世代技術・未来デバイス」  2023.11 

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  • 機械学習による多値逆問題解析:アモルファス酸化物半導体トランジスタの欠陥分布・電子輸送を例に

    木村 公俊, Kuan-Ju Zhou, 井手 啓介, 片瀬 貴義, 平松 秀典, 細野 秀雄, Ting-Chang Chang, 神谷 利夫

    応用物理学会第71回春季学術講演会  2024.3 

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    Venue:東京  

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  • 元素置換InGaZnO4の構造安定性と電子構造の支配因子

    鈴木 朝也, 井手 啓介, 片瀬 貴義, 細野 秀雄, 神谷 利夫

    応用物理学会第71回春季学術講演会  2024.3 

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    Venue:東京  

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  • Strain-induced modulation of thermopower and electrical conductivity of LaTiO3 epitaxial films on LaAlO3 substrate International conference

    T. Katase, K. Ide, H. Hiramatsu, H. Hosono, T. Kamiya

    10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-10)  2017.7 

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  • Optimization of deposition parameters for porous a-IGZO thin films using machine learning regression International conference

    Atsushi Shimizu, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    STAC - D2MatE 2024  2024.2 

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    Venue:Tsukuba  

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  • Exploration of New Oxide Light-Emitting Semiconductor Thin Films Using Transition Metals International conference

    Y. Futakado, N. Watanabe, K. Ide, J. Kim, T. Katase, H. Hiramats, H. Hosono, T. Kamiya

    10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics  2017.7 

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    Venue:Tokyo  

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  • Reversible thermal conductivity modulation above room temperature by 2D-3D structural phase transition in non-equilibrium (Sn1-xPbx)S solid solution International conference

    Zhongxu Hu, Mari Hiramatsu, Xinyi He, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    STAC - D2MatE 2024  2024.2 

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    Venue:Tsukuba  

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  • Structural Relaxation, Crystallization, and Defect Passivation in Amorphous In-Ga-Zn-O International conference

    T. Kamiya, K. Ide, K. Nomura, H. Kumomi, H. Hosono

    Proc. IDW'13  2013.12 

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    Venue:Sapporo  

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  • FeSb2薄膜のヘテロエピタキシャル成長と熱電特性

    山本千紘, 半沢幸太, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫:

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • エピタキシャル歪により増強されるLaNiO3極薄膜のフォノンドラッグ熱電特性

    樋口雄飛, 井手啓介, Christian A. Niedermeier, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • 層状半導体Sr2CuMO3S(M= Ga, In)の合成と光電子物性

    森大介, 渡邊脩人, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • ガラス上に成長させた層状セレン化スズ薄膜の電気特性と薄膜トランジスタ

    松尾健志, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • 超ワイドバンドギャップアモルファス酸化物半導体a-Ga-Oを用いたショットキーダイオードの作製

    笠井悠莉華, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:Tokyo  

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  • Depth Analysis of Near Valence Band Mximum Defect States in Amorphous Oxide Semiconductors: In-Ga-Zn-O International conference

    Keisuke Ide, Masato Ota, Takayoshi Katase, Hidenori Hiramatsu, Shigenori Ueda, Hideo Hosono, Toshio Kamiya

    Americas international Meeting on Electrochemistry and Solid state science (AiMES)  2018.9 

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    Venue:Cancun  

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  • 第一原理計算による層状 (AE = Ca, Sr, Ba)の電子構造と欠陥生成・キャリアドーピング機構の理論解析

    ホシンイ, シャオチーウェン, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • Cr添加アモルファス酸化ガリウム薄膜のフォトルミネッセンス特性

    井手啓介, 二角勇毅, 渡邉脩人, 金正煥, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • 希土類添加アモルファス酸化物半導体の電気物性とトランジスタ特性

    西間木祐紀, 井手啓介, 渡邊脩人, 金正煥, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • アモルファス酸化物半導体をホストとする蛍光体を用いた直流駆動型発光素子の室温形成

    渡邊脩人, 井手啓介, 片瀬貴義, 笹瀬雅人, 戸田喜丈, 金正煥, 上田茂典, 堀場弘司, 組頭広志, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第15回研究集会  2018.11 

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    Venue:kyoto  

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  • 熱起電力と導電率のトレードオフの関係を破る酸化物熱電材料LaNiO3の高出力特性

    樋口 雄飛, 片瀬 貴義, 只野 央将, 藤岡 淳, 井手 啓介, 平松 秀典, 細野 秀雄, 神谷 利夫

    第67回応用物理学会春季学術講演会  2020.3 

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  • 層状結晶半導体SrTiN2の高純度試料合成と光電子輸送特性

    渡邉 脩人, 白石 明浩, ホ シンイ, 片瀬 貴義, 井手 啓介, 松崎 功佑, 平松 秀典, 細野 秀雄, 神谷 利夫

    第67回応用物理学会春季学術講演会  2020.3 

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  • Sb添加SnSeのゼーベック・ホール係数の二重極性反転機構

    山本 千紘, ホ シンイ, 橋本 幸花, 片瀬 貴義, 井手 啓介, 平松 秀典, 上田 茂典, 細野 秀雄, 神谷 利夫

    第67回応用物理学会春季学術講演会  2020.3 

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  • モット絶縁体LaNiO3超薄膜に発現する巨大フォノンドラッグ熱電効果

    木村 公俊, 樋口 雄飛, 片瀬 貴義, 蓑原 誠人, 麻生 亮太郎, 吉田 秀人, 井手 啓介, 平松 秀典, 上田 茂典, 組頭 広志, 細野 秀雄, 神谷 利夫

    第67回応用物理学会春季学術講演会  2020.3 

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  • LaNiO3極薄膜の金属-絶縁体転移に伴う巨大フォノンドラッグ熱電効果の発現

    木村公俊, 樋口雄飛, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • LaNiO3超薄膜の表面終端処理によるフォノンドラッグ熱電能の増強効果

    木村公俊, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第17回研究会「薄膜デバイスの原点」  2020.11 

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  • 超ワイドギャップa-Ga-O薄膜トランジスタへの水素プラズマ処理効果

    加藤昭宏, 笠井悠莉華, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第17回研究会「薄膜デバイスの原点」  2020.11 

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  • 水素ドープアモルファス酸化ガリウムを用いた薄膜トランジスタ

    加藤昭宏, 笠井悠莉華, 井手啓介, 片瀬貴義, 平松 秀典, 細野 秀雄, 神谷 利夫

    第67回応用物理学会春季学術講演会  2020.3 

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  • Power-factor enhancement by breaking trade-off relation of electrical conductivity and thermopower in strain-controlled transition metal oxide

    Takayoshi Katase, Yuhi Higuchi, Terumasa Tadano, Jun Fujioka, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    日本セラミックス協会 第58回セラミックス基礎科学討論会  2020.1 

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  • 準安定(Pb1-xSnx)Se固溶体バルク試料の合成と2次元-3次元構造転移に伴う巨大電子物性変調

    西村優作, ホーシンイ, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • 準安定(Pb1-xSnx)Se薄膜の2次元-3次元構造転移と巨大電子物性変調

    高橋 雄大, 片瀬 貴義, ホ シンイ, 只野 央将, 井手 啓介, 吉田 秀人, 河智 史朗, 山浦 淳一, 笹瀬 雅人, 平松 秀典, 細野 秀雄, 神谷 利夫

    2021年第68回応用物理学会春季学術講演会  2021.3 

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  • 超ワイドギャップアモルファス酸化物半導体を用いたショットキーバリアダイオードの逆バイアス特性

    井手啓介, 笠井悠莉華, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    2021年第68回応用物理学会春季学術講演会  2021.3 

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  • 超ワイドギャップアルカリ土類酸化物への電子ドーピングの理論的検討

    橋本幸花, ホーシンイ, 片瀬貴義, 井手啓介, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • 2次元層状半導体AETMN2 (AE = Sr, Ba, TM = Ti, Zr, Hf)の高純度試料合成と電気・磁気特性

    白石明浩, ホー シンイ, 渡邉脩人, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • Phonon-drag driven giant anisotropic thermopower in epitaxially strained LaNiO3 (110) ultra-thin films International conference

    Masatoshi Kimura, Xinyi He, Takayoshi Katase, Terumasa Tadano, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Electronic structures and electro-optical properties of layered oxychalcogenide semiconductor, AE2CuInO3Ch (AE: Alkaline earth, Ch: Chalcogen) International conference

    Xinyi He, Tatsuya Cho, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • High electron conductivity and extremely low thermal conductivity of layered SnS semiconductor by geometrical Pb doping International conference

    Mari Hiramatsu, Xinyi He, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Degenerate hole conduction and ultra-low lattice thermal conductivity of SnSe by nonequilibrium isovalent Te substitution International conference

    Takumi Nose, Xinyi He, Haoyun Zhang, Takayoshi Katase, Terumasa Tadano, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Density functional study on electronic structure, defect formation and carrier doping control of AETMN2 (AE=Ca,Sr,Ba, TM=Ti,Zr,Hf)

    ホーシンイ, 片瀬貴義, 井手啓介, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • 層状半導体AE2CuInO3Ch (AE :アルカリ土類、Ch :カルコゲン)の光電子物性と両極性伝導制御の可能性

    長達也, ホーシンイ, 森大介, 片瀬貴義, 井手啓介, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第40回電子材料研究討論会  2020.11 

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  • Effect of hydrogen doping on transport property of ultrawide bandgap amorphous oxide semiconductor, amorphous Ga-O International conference

    Keisuke Ide, Yukari Kasai, Akihiro Kato, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Origin of high-density hole doping by isovalent Te substitution in SnSe International conference

    Xinyi He, Haoyun Zhang, Takumi Nose, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Fabrication of Zn3N2 electric double layer transistor by ionic liquid gating International conference

    Kaiwen Li, Kota Hanzawa, Keisuke Ide, Kosuke Matsuzaki, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Qun Zhang, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Effect of hydrogen doping on transport property of ultrawide bandgap amorphous oxide semiconductor, amorphous Ga-O International conference

    Keisuke Ide, Yukari Kasai, Akihiro Kato, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • 逆ペロブスカイト型酸化物Ba3(Si,Ge)Oの高純度バルク合成と電気特性評価

    木村茂, ホ シンイ, 片瀬 貴義, 井手 啓介, 平松 秀典, 細野 秀雄, 神谷 利夫

    薄膜材料デバイス研究会 第18回研究集会  2021.11 

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  • Room-temperature fabrication of ionic liquid gated Zn3N2 electric double layer transistors with non-degenerate channel electron density International conference

    Kaiwen Li, Kota Hanzawa, Keisuke Ide, Kosuke Matsuzaki, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Zhang Qun, Toshio Kamiya

    2021 International Conference on Solid State Devices and Materials (SSDM 2021)  2021.9 

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  • Room-temperature fabrication of ionic liquid gated Zn3N2 electric double layer transistors with non-degenerate channel electron density International conference

    Kaiwen Li, Kota Hanzawa, Keisuke Ide, Kosuke Matsuzaki, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Zhang Qun, Toshio Kamiya

    2021 International Conference on Solid State Devices and Materials (SSDM 2021)  2021.9 

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  • Strain-induced large power-factor enhancement by breaking thermoelectric trade-off relation in lanthanum nickel oxide International conference

    Masatoshi Kimura, Yuhi Higuchi, Xinyi He, Takayoshi Katase, Terumasa Tadano, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • 3D-2D structural phase transition and giant electronic conductivity modulation in non-equilibrium hetero-structural alloy, (Pb1-xSnx)Se International conference

    Takayoshi Katase, Xinyi He, Terumasa Tadano, Keisuke Ide, Hideto Yoshida, Shiro Kawachi, Junichi Yamaura, Masato Sasase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Thermoelectric properties of non-equilibrium SnSe thin films stabilized by epitaxial strain International conference

    Ryusei Higuchi, Takayoshi Katase, Kota Hanzawa, Shintaro Yasui, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The Twelfth International Conference on the Science and Technology for Advanced Ceramics (STAC12)  2021.7 

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  • Transport properties of Zn3N2 investigated by ionic liquid gated electric-double-layer transistors International conference

    Kaiwen Li, Kota Hanzawa, Keisuke Ide, Kosuke Matsuzaki, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Zhang Qun, Toshio Kamiya

    Materials Research Meeting 2021  2021.12 

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  • Appearance and large enhancement of phonon drag thermopower by epitaxial strain and phonon leaking from LaAlO3 in LaNiO3 International conference

    Masatoshi Kimura, Xinyi He, Takayoshi Katase, Terumasa Tadano, Jan M. Tomczak, Makoto Minohara, Ryotaro Aso, Hideto Yoshida, Keisuke Ide, Shigenori Ueda, Hidenori Hiramatsu, Hiroshi Kumigashira, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2021  2021.12 

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  • Enhanced thermoelectric figure-of-merit ZT in layered SnSe doped with isovalent Te and its origin clarified by density functional theory International conference

    Xinyi He, Haoyun Zhang, Takumi Nose, Takayoshi Katase, Terumasa Tadano, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2021  2021.12 

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  • Fabrication and characterization of resistive random-access memory device using amorphous 12CaO·7Al2O3 International conference

    Tasuke Kadono, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2021  2021.12 

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  • Local bonding structures in amorphous oxide semiconductors studied by DFT and machine-learning potential

    Liwei Li, Keisuke Ide, Takayoshi Katase, Hideo Hosono, Toshio Kamiya

    第60回日本セラミックス協会 セラミックス基礎科学討論会  2022.1 

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  • High-purity bulk synthesis and electronic properties of a two-dimensional layered semiconductor, alkaline earth transition metal nitrides International conference

    Shigeru Kimura, Akihiro Shiraishi, Xinyi He, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2021  2021.12 

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  • Double charge polarity conversion by Sb doping in layered SnSe with switchable substitution sites International conference

    Xinyi He, Chihiro Yamamoto, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    2021 Materials Research Society Fall Meeting & Exhibit  2021.11 

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  • Large phonon drag thermopower enhancement by epitaxial strain and phonon leaking in LaAlO3 / LaNiO3 / LaAlO3 heterostructure International conference

    Masatoshi Kimura, Xinyi He, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    2021 Materials Research Society Fall Meeting & Exhibit  2021.11 

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  • Two-dimensional layered semiconductors AETMN2 (AE = Sr, Ba; TM = Ti, Zr, Hf); high-purity bulk synthesis and electronic property characterization International conference

    Shigeru Kimura, Akihiro Shiraishi, Xinyi He, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    2021 Materials Research Society Fall Meeting & Exhibit  2021.11 

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  • 300cm2/Vs以上の粒内正孔移動度を示す非平衡岩塩型(Sn,Ca)Seエピタキシャル薄膜

    ホ シンイ, チェン ジンシュアイ, 片瀬 貴義, 井手 啓介, 平松 秀典, 細野 秀雄, 神谷 利夫

    薄膜材料デバイス研究会 第18回研究集会  2021.11 

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  • Epitaxial structure and thickness dependent phonon-drag thermoelectric properties of LaNiO3 thin film on LaAlO3 (001) substrate International conference

    Masatoshi Kimura, Yuhi Higuchi, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    11th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-11)  2019.10 

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  • Biaxial-strain induced power-factor enhancement in metallic strongly correlated transition metal oxide LaNiO3 International conference

    Yuhi Higuchi, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    11th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-11)  2019.10 

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    Venue:Nara  

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  • Synthesis and opto-electronic properties of layered oxychalcogenides, AE2CuInO3Ch (AE = Ca, Sr, Ba, and Ch = S, Se, Te) International conference

    Tatsuya Cho, Daisuke Mori, Xiyi He, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    11th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-11)  2019.10 

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  • アモルファス酸化ガリウムを用いたショットキーバリアダイオード特性と光応答

    笠井悠莉華, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第16回研究集会「新時代に向けた薄膜材料のデバイス技術」  2019.11 

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  • Low-temperature fabrication of phosphor thin-film and light emitting device using amorphous oxide semiconductor International conference

    Keisuke Ide, Naoto Watanabe, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    International Conference on Materials and Systems for Sustainability 2019 (ICMaSS2019)  2019.11 

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  • Single crystal growth of cubic SrGeO3 and estimation of intrinsic electron mobility International conference

    Christian A. Niedermeier, Yu Kumagai, Keisuke Ide, Takayoshi Katase, Fumiyasu Oba, Hideo Hosono, Toshio Kamiya

    11th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-11)  2019.10 

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    Venue:Nara  

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  • Optoelectrical properties and thin-film transistor operation of rare-earth-doped amorphous oxide semiconductors International conference

    Keisuke Ide, Yuki Nishimagi, Naoto Watanabe, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    11th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-11)  2019.10 

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  • アモルファス酸化ガリウム薄膜への電子ドーピングとショットキーダイオード

    笠井悠莉華, 井手啓介, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第39回電子材料研究討論会  2019.11 

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  • Silicon doping and N2 ambient annealing effects on Zn3N2 thin film transistors

    Kaiwen Li, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, Dong Lin, Jinhua Ren, Qun Zhang

    薄膜材料デバイス研究会 第16回研究集会「新時代に向けた薄膜材料のデバイス技術」  2019.11 

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  • アモルファス酸化物半導体を用いた新規デバイスの開拓

    井手啓介, 金正煥, 片瀬貴義, 細野秀雄, 神谷利夫

    薄膜材料デバイス研究会 第16回研究集会「新時代に向けた薄膜材料のデバイス技術」  2019.11 

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    Venue:京都  

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  • Structures and Electronic States of Hydrogen in Inorganic Semiconductors with Different Anions International conference

    Toshio Kamiya, Xinyi He, Zewen Xiao, Keisuke Ide, Takayoshi Katase, Hideo Hosono

    Materials Research Meeting 2019  2019.12 

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    Venue:Yokohama  

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  • Hydrogen doping in ultra-widegap amorphous oxide semiconductor, amorphous Ga-O International conference

    Keisuke Ide, Yurika Kasai, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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  • Expansion of Ba and Ca solubility limit into SrSi2 thin film and their thermoelectric properties International conference

    Kodai Aoyama, Takao Shimizu, Hideto Kuramochi, Masami Mesuda, Ryo Akiike, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, Yoshisato Kimura, Hiroshi Funakubo

    2019 MRS Fall Meeting & Exhibit  2019.12 

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    Venue:Boston  

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  • 希土類添加アモルファス酸化物蛍光体薄膜の作製と発光素子への応用

    井手啓介, 渡邉脩人, 片瀬貴義, 笹瀬雅人, 金正煥, 上田茂典, 堀場弘司, 組頭広志, 平松秀典, 細野秀雄, 神谷利夫

    日本セラミックス協会 第39回電子材料研究討論会  2019.11 

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  • Single crystal growth and intrinsic electron mobility of cubic SrGeO3 International conference

    Christian A. Niedermeier, Yu Kumagai, Keisuke Ide, Takayoshi Katase, Fumiyasu Oba, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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  • Enhanced thermoelectric power-factors by strain control in stongly correlated lanthunum titanate International conference

    Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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    Venue:Yokohama  

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  • Density Functional Study on Defects and Doping for Layered Ternary Nitride, SrTiN2 International conference

    Xinyi He, Zewen Xiao, Takayoshi Katase, Keisuke Ide, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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  • Structural phase transition and opto-electronic properties of oxide semiconductor solid solution, (Ba,Sr)(Sn,Ti)O3 International conference

    Yutaro Kobayashi, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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  • トレードオフの相関を破る酸化物熱電材料の高出力特性

    片瀬貴義, 樋口雄飛, 只野 央将, 藤岡 淳, 井手 啓介, 平松 秀典, 細野 秀雄, 神谷 利夫

    応用物理学会新領域、第10回強的秩序とその操作に関わる研究グループ研究会  2020.1 

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  • Light emitting diodes on glass using amorphous oxide semiconductor thin-film phosphors, rare-earth doped a-Ga-O International conference

    Naoto Watanabe, Keisuke Ide, Takayoshi Katase, Junghwan Kim, Shigenori Ueda, Koji Horiba, Hiroshi Kumigashira, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    Materials Research Meeting 2019  2019.12 

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  • Epitaxial structure and phonon-drag thermoelectric properties of FeSb2 thin film on SrTiO3 (001) substrate International conference

    Chihiro Yamamoto, Kota Hanzawa, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Structural phase transition and optoelectronic properties of Ba(Sn,Ce)O3 oxide semiconductor solid-solution system International conference

    Yutaro Kobayashi, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Density functional study on intrinsic and impurity defect formation in layered SrTiN2

    Xinyi He, Zewen Xiao, Takayoshi Katase, Keisuke Ide, Hideo Hosono, Toshio Kamiya

    第66回応用物理学会春季学術講演会  2019.3 

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  • 共スパッタ法で作製したBaxSr1-xSi2膜の熱電特性

    青山 航大, 清水 荘雄, 倉持 豪人, 召田 雅実, 秋池 良, 井手 啓介, 片瀬 貴義, 神谷 利夫, 木村 好里, 舟窪 浩

    第66回応用物理学会春季学術講演会  2019.3 

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  • アモルファス酸化物半導体薄膜トランジスタの希土類添加効果

    西間木祐紀, 井手啓介, 渡邉脩人, 金正煥, 片瀬貴義, 平松秀典, 細野秀雄, 神谷利夫

    第57回セラミックス基礎科学討論会  2019.1 

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  • 共スパッタ法で作製したBaxSr1-xSi2膜の作製と熱電特性評価

    青山航大, 清水荘雄, 倉持豪人, 召田雅実, 秋池良, 井手啓介, 片瀬貴義, 神谷利夫, 木村好里, 舟窪 浩

    第57回セラミックス基礎科学討論会  2019.1 

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  • Intrinsic and Extrinsic Defects in Layered Nitride Semiconductor", SrTiN2 International conference

    Xinyi He, Zewen Xiao, Takayoshi Katase, Keisuke Ide, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Transition Metal-Doped Amorphous Oxide Semiconductor Thin-Film Phosphor, Chromium-Doped Amorphous Gallium Oxide International conference

    Keisuke Ide, Yuki Futakado, Naoto Watanabe, Junghwan Kim, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • アモルファス酸化ガリウムへの水素ドープ効果とキャリア輸送特性

    笠井悠莉華, 井手啓介, 片瀬貴義, 平松 秀典, 細野 秀雄, 神谷 利夫

    第66回応用物理学会春季学術講演会  2019.3 

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  • アモルファス酸化物半導体a-GaOxをホストとする蛍光体を用いた直流駆動型発光素子の低温作製

    渡邉脩人, 井手啓介, 片瀬貴義, 笹瀬雅人, 戸田喜丈, 金正煥, 上田茂典, 堀場弘司, 組頭広志, 平松秀典, 細野秀雄, 神谷利夫

    第66回応用物理学会春季学術講演会  2019.3 

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  • Power-factor enhancement by breaking trade-off relation of thermopower and electrical conductivity in epitaxially strained lanthanum nickelate International conference

    Yuhi Higuchi, Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Epitaxial structure and phonon-drag thermoelectric properties of strain controlled LaNiO3 thin films International conference

    Takayoshi Katase, Yuhi Higuchi, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4)  2019.10 

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    Venue:Sendai  

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  • Low-temperature fabrication of direct-current driven electroluminescent device using amorphous oxide semiconductor thin-film phosphor International conference

    Naoto Watanabe, Keisuke Ide, Takayoshi Katase, Junghwan Kim, Shigenori Ueda, Koji Horiba, Hiroshi Kumigashira, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • SrGeO3 single crystal growth and optical phonon spectrum analysis International conference

    Christian A. Niedermeier, Yu Kumagai, Keisuke Ide, Takayoshi Katase, Fumiyasu Oba, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Hydrogen doping and carrier transport properties of amorphous Ga-O International conference

    Yurika Kasai, Keisuke Ide, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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  • Epitaxial strain-induced enhancement of thermoelectric power-factors International conference

    Takayoshi Katase, Keisuke Ide, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11)  2019.7 

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    Venue:Tsukuba  

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  • Temperature dependence of thermoelectric properties of Ge1−xSnx layers grown by molecular beam epitaxy International conference

    Masashi Kurosawa, Masaya Nakata, Keisuke Ide, Takayoshi Katase, Toshio Kamiya

    The 4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4)  2019.10 

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  • Effect of hydrogen plasma treatment for ultra-wide bandgap amorphous oxide semiconductor, amorphous Ga-O International conference

    Keisuke Ide, Yurika Kasai, Kosuke Takenaka, Yuichi Setsuhara, Atsushi Hiraiwa, Hiroshi Kawarada, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya

    The 4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4)  2019.10 

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  • 二元同時スパッタ法で作製したAeSi2膜の作製

    青山 航大, 清水 荘雄, 倉持 豪人, 召田 雅実, 秋池 良, 井手 啓介, 片瀬 貴義, 神谷 利夫, 木村 好里, 舟窪 浩

    第80回応用物理学会秋季学術講演会  2019.9 

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  • Thermoelectric property of MxSr1-xSi2 (M = Ca, Ba) film prepared by co-sputtering method International conference

    Kodai Aoyama, Takao Shimizu, Hideto Kuramochi, Masami Mesuda, Ryo Akiike, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, Yoshisato Kimura, Hiroshi Funakubo

    The Fifth Asia-Pacific Conference on Semiconducting Silicates and Related Materials  2019.7 

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Industrial property rights

  • Semiconductor device

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    Application no:US16/293,892 “ 

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  • Semiconductor device and method of producing semiconductor device

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    Application no:US15/507,780 

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  • Semiconductor device and liquid crystal display device

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    Application no:US15/504,963 

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    Application no:US15/569,422 

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  • Liquid crystal display panel and method for producing same

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    Application no:US15/304,114 

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  • Semiconductor device including a silicon nitride dielectric layer and method for producing same

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    Application no:US15/117,524 

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  • Semiconductor device including a plurality of thin-film transistors with one thin-film transistor including two gate electrodes

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    Application no:US15/039,118 

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  • Semiconductor device

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    Application no:US15/529,044 

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  • Semiconductor apparatus, method of manufacturing same, and liquid crystal display apparatus

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Awards

  • 2022 Peter Brody Prize

    2022.5  

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    Award type:International academic award (Japan or overseas) 

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  • 2025年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2025.12  

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  • 2024年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2024.12  

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  • 第21回 船井研究奨励賞

    2022.5  

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  • 2021年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2021.12  

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  • 2020年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2021.1  

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  • 2019年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2019.11  

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  • 2018年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2019.3  

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  • 第15回研究集会 スチューデントアワード

    2018.11   薄膜材料デバイス研究会  

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  • 第43回 応用物理学会 講演奨励賞

    2018.3  

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  • 2017年度 フロンティア材料研究所 若手研究者発表会 優秀講演賞

    2017.12  

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  • ICMaSS 2017: Outstanding Presentation Awards

    2017.9  

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  • Best Presentation Award

    2017.9   2nd International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Develpment  

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  • 第78回応用物理学会学術講演会

    2017.9   応用物理学会学術講演会  

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  • Silver Poster Award

    2017.6   10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics  

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  • 若手研究者発表会優秀講演賞

    2017   平成29年度フロンティア材料研究所  

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  • ECS Japan Section| Young Researcher Award

    2016.7  

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  • Poster Paper Award

    2016.2   International Thin-Film Transistor Conference  

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  • 第12回研究集会 スチューデントアワード

    2015.10   薄膜材料デバイス研究会  

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Research Projects

  • 先端国際共同研究推進事業/次世代のためのASPIRE/相補型酸化物半導体の基盤構築:国際頭脳循環によるLSI×TFT技術の融合

    2025 - 2029

    JST-ASPIRE

    井手啓介, Toprasertpong Kasidi

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  • NEDO先導研究プログラム/未踏チャレンジ2050/アモルファス半導体を使った革新的環境ガスセンシング技術の開発

    2022 - 2027

    Sponsored Research Program (Governmental)  NEDO先導研究プログラム

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    Authorship:Principal investigator 

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  • アモルファス酸化物半導体を用いた低温作製可能な超高感度光センサの創出

    Grant number:21K18814  2021.7 - 2023.3

    (科研費 )  挑戦的研究(萌芽)

    井手 啓介

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    Grant amount:\6370000 ( Direct Cost: \4900000 、 Indirect Cost:\1470000 )

    アモルファスIn-Ga-Zn-O(a-IGZO, イグゾー)に代表されるアモルファス酸化物半導体(AOS)は、室温プロセスで作製しても良好な半導体特性を得られることが知られている。応募者はこれまで、AOSのなかでもa-Ga-Oの元素を使うと、バンドギャップが4 eVを超える超ワイドギャップの半導体を室温で作れることを明らかにしてきた。また最近の研究では、超ワイドギャップAOSを使った新規発光ダイオードの作製に成功している。本研究ではそのAOSダイオードの応用先を発展させる次のような研究に取り組む。 1) 反応性スパッタリングにより耐圧の高いAOSダイオードを作製する。 2) デバイスシミュレータなどの数値解析を用いて、高耐圧ダイオードの欠陥特性などを理解する。 3) プラスチック基板上にAOSダイオードを作成し光応答を調査する。最終的には、アバランシェダイオードのような超高感度のAOSフォトダイオードをプラスチック上に作製することを目指す。
    2021年度には、スパッタリング法により作製した超ワイドギャップAOSの基礎物性を評価した。スパッタリングで作製しても、数cm2/Vsの薄膜を得ることに成功し、またデバイス作製においてもスパッタリングで初めて超ワイドギャップAOSトランジスタを得ることに成功した。独自のリソグラフィプロセスを確立し、白金との接合を形成することでダイオード特性も現時点ですでに得られている。

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  • 希土類添加アモルファス酸化物半導体の探索とガラス基板上への直流駆動発光素子の形成

    Grant number:20H02433  2020.4 - 2023.3

    (科研費 )  基盤研究(B)

    井手 啓介

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    Grant amount:\18330000 ( Direct Cost: \14100000 、 Indirect Cost:\4230000 )

    アモルファスIn-Ga-Zn-O(a-IGZO, イグゾー)に代表されるアモルファス酸化物半導体(AOS)は、室温で作製しても欠陥の少なく、良い半導体特性を示すことが知られている。応募者は過去に、このAOSの低いプロセス温度を無機蛍光体の作製に応用することを提案し実証してきた。さらに、予期しなかった結果として、得られたAOS蛍光体が優れた電気特性を示すことも明らかになった。そこで、蛍光体でありながら良好なキャリア輸送特性をもつ本材料の稀有な特性を利用して、次のような研究に発展させる取り組みを行う。 1) AOS蛍光体の最適な組成を見出す。 2) 添加した希土類が与える電気特性や欠陥形成への影響を明らかにする。 3) セラミックスのような無機酸化物でも低プロセス温度で直流駆動型発光ダイオードを作製出来ることを実証する。
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    昨年度までに、AOS蛍光体の最適化や、電気特性の調査を行ってきた。薄膜トランジスタ構造を使うことでデバイスシミュレータによる欠陥準位の調査も行った。本年度では、これまで見出してきた条件を駆使し、AOS蛍光体を発光層にもつ直流駆動型発光ダイオードの試作を行った。現時点ですでに明瞭なデバイス動画が確認されている。赤、緑、ピンクの発光が得られ、分光特性や電流電圧特性、発光効率などの評価を行った。発光メカニズムの議論をつめて、最終成果物としてジャー ナルへ投稿する準備をしている。

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  • Development of novel fabrication process of amorphous oxide semiconductor using field effect

    Grant number:18K13990  2018.4 - 2020.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Early-Career Scientists  Grant-in-Aid for Early-Career Scientists

    Keisuke Ide

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    Grant amount:\4160000 ( Direct Cost: \3200000 、 Indirect Cost:\960000 )

    Amorphous oxide semiconductor (AOS) represented by amorphous In-Ga-Zn-O has been widely applied for various practical displays. To develop further future display, high-mobility and large-band gap AOS is necessary. However, it is known that the controlling defect formation of high-performance AOS is difficult.
    In this study, we developed a novel process of AOS using hydrogen doping. Amorphous gallium oxide (a-GaO) has ultra wide-bandgap larger than 4 eV and is suitable for transparent devices. However, it is difficult to enhance the carrier density of a-GaO; the ever-reported carrier density was only 10^14 cm-3. We succeed to enhance the carrier density of a-GaO up to 5x10^15 cm-3 and improve the operation voltage of a-GaO transistors by using our process.

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  • New evolution of materials concept and application of electrides

    Grant number:17H06153  2017.5 - 2022.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (S)  Grant-in-Aid for Scientific Research (S)

    Hosono Hideo

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    Grant amount:\174980000 ( Direct Cost: \134600000 、 Indirect Cost:\40380000 )

    We have extended the material concept of electrides (electrides), explored new properties, and applied them to new applications. The concept of electrides, which had been limited to materials based on bulk electron-deficient ionic crystals, was successfully extended to surfaces, neutral and electron-rich types, and intermetallic compounds. In terms of new properties, we discovered that 1D electrides are Mott-type insulators, 2D electrides can be a platform for topological materials, ferromagnetism mediated by anion electrons in rare-earth carbide electrides, and electrides that are stable even in water. In the application, we found that amorphous electride thin films are excellent as electron injection layer materials for OLEDs due to their low work function and high transparency, and that cobalt-based intermetallic compound electrides and surface electrides, nickel-supported cerium nitrides, show high activity as ammonia synthesis catalysts without ruthenium.

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  • Bistability/instability of amorphous oxide semiconductor, and its application development

    Grant number:15H06207  2015.8 - 2017.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Research Activity start-up  Grant-in-Aid for Research Activity start-up

    KEISUKE IDE

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    Grant amount:\2990000 ( Direct Cost: \2300000 、 Indirect Cost:\690000 )

    Amorphous oxide semiconductor (AOS) is relatively new functional material compared with amorphous Si, crystalline ZnO etc. Since AOS has amorphous structure (i.e., non-order) and several components such as In, Ga, Zn and O, it seems hard to figure out the defect species and the mechanism of instability due to the complexity of structure.
    In this study, we carefully choose the effective method on AOS, like HAADF-STEM, thermal desorption spectroscopy, in-situ ellipsometory, Hard X-ray spectroscopy and so on. As a result, we succeeded to figure out the chemical states of excess oxygen in AOS and the effects of hydrogen on sugbap defect states. Finally, we obtain new functional AOS materials, e.g. AOS phosphor and ultra-wide bandgap AOS.

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