Updated on 2026/04/28

写真a

 
MATSUDA AKIFUMI
 
Organization
School of Materials and Chemical Technology Associate Professor
Title
Associate Professor
Profile
所属学会等:日本セラミックス協会、応用物理学会、Materials Research Society (米国材料学会)、電気学会、日本熱電学会
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Degree

  • 博士(工学) ( 東京工業大学 )

Research Interests

  • thermal nanoimprint

  • atomic-scale patterning

  • thin films

  • Functional ceramic materials

  • epitaxial growth

  • nanomaterials

  • green processing

Research Areas

  • Nanotechnology/Materials / Inorganic materials and properties  / Electronic ceramics

  • Nanotechnology/Materials / Material processing and microstructure control  / Nanoimprint

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties  / Epitaxial thin films

Education

  • Tokyo Institute of Technology   Interdisciplinary Graduate School of Science and Engineering   Doctoral Course, Department of Innovative and Engineered Materials

    2005.4 - 2008.3

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  • Tokyo Institute of Technology   Interdisciplinary Graduate School of Science and Engineering   Master's Course, Department of Innovative and Engineered Materials

    2003.4 - 2005.3

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  • Tokyo Institute of Technology   Faculty of Engineering   Department of Inorganic Materials

    2000.4 - 2003.3

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  • Tokyo Institute of Technology   Faculty of Engineering   Academic Group 2

    1999.4 - 2000.3

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Research History

  • Institute of Science Tokyo   School of Materials and Chemical Technology   Associate Professor

    2024.10

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    Country:Japan

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  • Tokyo Institute of Technology   School of Materials and Chemical Technology   Associate Professor

    2022.4 - 2024.9

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    Country:Japan

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  • Tokyo Institute of Technology   Department of Materials Science and Engineering, School of Materials and Chemical Technology   Associate Professor

    2016.4 - 2022.3

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  • Tokyo Institute of Technology   Department of Innovative and Engineered Materials   Associate Professor

    2015.3 - 2016.3

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  • Tokyo Institute of Technology   Department of Innovative and Engineered Materials   Assistant Professor

    2011.9 - 2015.2

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  • HItachi Ltd.   Hitachi Research Laboratory, Research and Development Group   Researcher

    2008.4 - 2011.8

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Professional Memberships

  • The Materials Research Society of Japan

    2016.12

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  • THE JAPAN SOCIETY OF APPLIED PHYSICS

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  • The Ceramic Society of Japan

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  • Materials Research Society

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  • THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN

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  • Thermoelectrics Society of Japan

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Committee Memberships

  • The Ceramic Society of Japan   Education Committee  

    2023.4   

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    Committee type:Academic society

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  • The Ceramic Society of Japan   Dissemination and enlightenment committee in Kanto branch  

    2020.4   

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    Committee type:Academic society

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  • The Ceramic Society of Japan   Board member of Kanto branch  

    2020.4   

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    Committee type:Academic society

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  • The Materials Research Society of Japan   News editorial board member  

    2019.6   

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    Committee type:Academic society

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Papers

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Books

  • ナノインプリント: -次世代微細加工技術の最前線- (エレクトロニクスシリーズ)

    平井義彦, 鈴木健太, 谷口 淳, 大井秀雄, 柳下 崇, 山岸里緒, 竹井 敏, 山内一美, 江本顕雄, 菅野智士, 松川晴香, 渡邉有希, 新井 翔, 岸本 章, 雨宮智宏, 森 莉紗子, 藤井 恭, 浅井隆宏, 塩田 大, 西山伸彦, 松田晃史, 大西有希, 浅田邦彦, 米川雅見, 幡野正之, 竹内史和, Thomas UHRMANN, 黒瀧宏和, 関口 淳, 魚津吉弘, 遠藤達郎, 青木元秀, 朱彦北, 沖野晃俊, 梅村知也( Role: Joint author)

    シーエムシー出版  2024.7  ( ISBN:478131810X

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    Total pages:216  

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MISC

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Presentations

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Awards

  • CerSJ Awards for advancements in ceramic science and technology

    2018.12   The Ceramic Society of Japan   Room-temperature epitaxial formation of wide-bandgap oxide semiconductor thin films

    Akifumi Matsuda

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    Country:Japan

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  • Award for Encouragement of Research in the 26th Annual Meeting of MRS-J

    2016.12   The Materials Research Society of Japan   Buffer-induced room-temperature epitaxy of β-Ga2O3 thin films by excimer laser annealing

    Akifumi Matsuda

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  • Ceramic Society of Japan Distinguished Poster Award

    2016.3   The Ceramic Society of Japan   Phase selective epitaxy of VOX thin films by annealing under uniaxial compression and their conduction property

    Akifumi Matsuda

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  • Award of the Outstanding Reviews Published in the JCerSJ in 2013

    2014.6   The Ceramic Society of Japan   Room-temperature synthesis of epitaxial oxide thin films for development of unequilibrium structure and novel electronic functionalization

    Akifumi Matsuda

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    Award type:Honored in official journal of a scientific society, scientific journal  Country:Japan

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  • Ceramic Society of Japan Distinguished Presentation Award

    2013.9   The Ceramic Society of Japan   Fabrication of magnetic resistance-type structure by hydrogen reduction of multi-layered epitaxial oxide thin films

    Akifumi Matsuda

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

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  • Ceramic Society of Japan Distinguished Poster Award

    2006.3   The Ceramic Society of Japan   Development and characterization of epitaxial [ferromagnetic metal/semiconductor] hybrid nano-materials by PLD and hydrogen reduction

    Akifumi Matsuda

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

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  • Doi Award

    2005.3   Tokyo Institute of Technology  

    Akifumi Matsuda

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Research Projects

  • エピタキシャル薄膜を用いた無限構造ニッケル酸塩における異原子価置換効果の解明

    Grant number:20H02435  2020.4 - 2023.3

    日本学術振興会  科学研究費助成事業 基盤研究(B)  基盤研究(B)

    松田 晃史

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    Grant amount:\17810000 ( Direct Cost: \13700000 、 Indirect Cost:\4110000 )

    本研究は,Ni-O無限構造をもつニッケル酸塩結晶について,カチオンの異原子価イオン置換が異方性の高い特異なNi-O無限構造と電子物性に及ぼす影響を追究するものである。
    平面正方配位NiO4型の無限層構造を含む結晶構造を示すエピタキシャル薄膜の創製,その構造・物性における異原子価イオンによるLa3+置換効果の解明を目的として,非平衡条件下の薄膜合成および固相反応による相(層数)選択的なエピタキシー,および構造・カチオン価数と物性制御について検討した。
    KrFパルスエキシマレーザ(波長248nm,5eV相当)を用いたパルスレーザ堆積(PLD)法によりRuddlesden-Popper(RP)相Lan+1NinO3n+1薄膜をペロブスカイト型NdGaO3およびLaAlO3単結晶基板上に合成し,O2雰囲気中でのアニーリングによる固相エピタキシャル薄膜合成を行った。ここでは成膜温度・O2圧をパラメータとした検討を行い,Ni2+からNi2.66+のカチオンからなる2層型La3Ni2O7および3層型La4Ni3O10のエピタキシャル薄膜を得た。アニーリング温度・O2圧を条件とした熱処理により,LaNiO3エピタキシャル薄膜も合成し,2層から無限層までの相選択的なRP層薄膜合成とNiカチオン価数制御を得た。
    La3+に対する異原子価Sn4+およびHf4+の共ドーピングを行い,ドーパントによる構造歪みの導入と導電性変化を見出した。
    また,単純NiOリファレンス薄膜を用い,エキシマ光照射によるNi2+→Ni3+の制御および構造制御,またH2を用いたトポタキシャル還元,すなわちNiカチオン価数制御のプロセスを見出した。一方,薄膜の高真空・高温H2アニーリングによるNiイオン価数の過大な還元となり,アニーリング条件のさらなる最適化の要求が示された。

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  • サブナノスケール形状転写を用いたフレキシブル基板上のエピタキ シャル状電子光学素子の創製

    2018.5 - 2019.4

    村田学術振興財団  研究助成 

    松田 晃史

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    Authorship:Principal investigator  Grant type:Competitive

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  • Fabrication of nano-patterned organic polymer substrates with atomic steps for creation of functional nanostructures

    Grant number:16K13636  2016.4 - 2019.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Challenging Exploratory Research  Grant-in-Aid for Challenging Exploratory Research

    Yoshimoto Mamoru, Kaneko Satoru, Matsuda Akifumi, Shimada Koudai, Goto Risa, Kinoshita Taichiro, Yamada Shiori, Iwasa Ken

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    Grant amount:\3640000 ( Direct Cost: \2800000 、 Indirect Cost:\840000 )

    In this study, the thermal nanoimprinting process, which is one of the most promising techniques for simple, low-cost, and high-throughput nanopatterning, was applied for fabrication of flexible atomically nano-patterned polymer substrates with ultra-smooth surface and also for creation of functional nanostructures on the polymer substrates. As a result, the ultra-smooth 0.3-nm-high atomic step-and-terrace surface was developed on the polyimides and poly(methyl methacrylate) (PMMA) sheets. We performed the nanoscale scratch on the atomically smooth polyimide surface and could write a letter “T” by AFM-probe scanning. Furthermore, large area Au nanoparticle arrays of dots or meshes were produced onto 0.3-nm-high stepped PMMA sheets by applying a nanocontact-printing technique using Au-film-coated pillar or mesh molds.

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  • Development of wide-bandgap oxide epitaxial thin films by multi-wavelength excimer laser processing and substrates modification

    Grant number:15K20988  2015.4 - 2019.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Young Scientists (B)  Grant-in-Aid for Young Scientists (B)

    Matsuda Akifumi

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    Grant amount:\4160000 ( Direct Cost: \3200000 、 Indirect Cost:\960000 )

    Epitaxial thin films of β-Ga2O3(-201) with optical bandgap of 4.9eV was obtained on a NiO(111)-buffered α-Al2O3(0001) substrate at room-temperature by following approaches; (1) modification of crystal nucleation sites and growth direction on atomically stepped surface of the substrates, (2) reduction of planar lattice mismatch by introduction of a buffer layer, and (3) non-equilibrium solid-phase crystallization by excimer laser processing. The characteristic nucleation at step-edges was experimentally observed, and (111)-planes of rock-salt type crystals were demonstrated as good buffer layers owing to their homogeneous distance of anion and cation planes as well as their planar symmetry and lattice parameter. The morphology of substrates, and the structure of buffer layers were revealed to have impact on epitaxial formation of wide-bandgap oxide semiconductor thin films by excimer laser processing at room-temperature.

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  • 非晶質−結晶性材料における極微細構造の自己組織化誘発と形態制御および形成機構の解明

    2012.5 - 2013.2

    日本科学協会  笹川科学研究助成 

    松田 晃史

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  • Solid-phase crystallization of oxide thin films on nanoscale-controlled substrates via post-annealing under uniaxial compression for exploring the novel functionalities

    Grant number:24360269  2012.4 - 2016.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)  Grant-in-Aid for Scientific Research (B)

    Yoshimoto Mamoru, YODO Tokuo, MATSUDA Akifumi

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    Grant amount:\14950000 ( Direct Cost: \11500000 、 Indirect Cost:\3450000 )

    In this study, the influence of thermal annealing under uniaxial compression on solid-state crystallization of electronic functional oxide thin films such as VOx or MoOx was investigated for exploring the novel functionalities. As a result, it was found that the epitaxial VO2 and epitaxial V2O3 thin films were obtained through annealing under uniaxial compression of 1 MPa and 10-30 MPa, respectively. Diffusion of oxygen atoms along the layered structure of VOx film under uniaxial compression was thought to have an important role for phase-selective solid state crystallization in this process.

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  • Atomic-scale transcription of natural nano-pattern onto glassy materials

    Grant number:24655188  2012.4 - 2015.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research Grant-in-Aid for Challenging Exploratory Research  Grant-in-Aid for Challenging Exploratory Research

    YOSHIMOTO Mamoru, MATSUDA Akifumi

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    Grant amount:\3640000 ( Direct Cost: \2800000 、 Indirect Cost:\840000 )

    In this study, we investigated atomic-scale transcription of natural nano-pattern such as sapphire atomic step array or cleaved mica surface onto the glassy material substrates of silicate glasses or polymers. As a result, about 0.3 nm-high stepped and an atomically ultrasmooth terraced surface could be formed on these oxide or organic glassy substrates with about 5cm in width.
    For the flexible polymer substrates, we performed atomic-scale surface patterning with a vertical resolution of approximately 0.3 nm on the glassy thermoplastic polymer sheets of poly(methyl methacrylate) (PMMA), cyclo olefin polymers (COP), polycarbonate, and polyimide by thermal nanoimprinting using an atomically stepped sapphire template (α-Al2O3 single crystal).

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  • 金属酸化物の還元反応を利用した酸化物半導体/強磁性金属ハイブリッドナノ構造の作製と新機能探索

    2006.4 - 2007.2

    日本科学協会  笹川科学研究助成 

    松田 晃史

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Teaching Experience

  • Basic Inorganic Chemistry

    2024 Institution:Tokyo Institute of Technology

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  • Advanced Course of Nanostructures and Thin Films

    2024 Institution:Institute of Science Tokyo

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  • Interdisciplinary Energy Materials Science 1

    2023 Institution:Tokyo Institute of Technology

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  • Introduction of Ceramics

    2018.4 Institution:Tokyo Institute of Technology

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  • Energy Conversion Ceramics Materials

    2017 Institution:Tokyo Institute of Technology

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  • Introduction of Advanced Materials

    2016 Institution:Tokyo Institute of Technology

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  • Interdisciplinary Energy Materials Science 1

    2016 - 2022 Institution:Tokyo Institute of Technology

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  • 材料科学セミナー

    2016 - 2018 Institution:東京工業大学

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  • Advanced Course of Material Development II

    2015 Institution:Tokyo Institute of Technology

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