Updated on 2026/03/30

写真a

 
WATANABE MASAHIRO
 
Organization
School of Engineering Associate Professor
Title
Associate Professor
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Degree

  • Doctor of Engineering ( Tokyo Institute of Technology )

Research Interests

  • Semiconductor device, Photonics, Quantum electronics, Crystals engineering

Research Areas

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electric and electronic materials

Education

  • Tokyo Institute of Technology   Science of Engineering   Physical Electronics

    1988.4 - 1993.3

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    Country: Japan

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  • Tokyo Institute of Technology   Graduate School, Division of Science and Engineering

    - 1993

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  • Tokyo Institute of Technology   School of Engineering

    1984.4 - 1988.3

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    Country: Japan

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Research History

  • Institute of Science Tokyo   School of Engineering   Associate Professor

    2024.10

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    Country:Japan

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  • -:東京工業大学 助教授

    1995

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  • -:

    1995

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  • -:東京工業大学 助手

    1993

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  • -:

    1993

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Professional Memberships

Committee Memberships

  • 一般財団法人 電気技術者試験センター   第一種・第二種電気主任技術者試験員  

    2016.7   

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    Committee type:Other

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  • The Japan Society of Applied Physics   Editorial Committee Member of "OUYOUBUTSURI"  

    2005.4 - 2006.3   

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    Committee type:Academic society

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  • 電子情報通信学会   和文論文誌編集委員  

       

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    Committee type:Academic society

    電子情報通信学会

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Papers

  • Electroluminescence of 1.65 μm near-infrared wavelength quantum cascade lasers using Si/CaF2 heterostructures Reviewed

    Zhiyuan Fan, Haibo Wang, Hyuma Suzuki, Masahiro Watanabe

    Journal of Luminescence   293   121786 - 121786   2026.5

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    Authorship:Last author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier BV  

    DOI: 10.1016/j.jlumin.2026.121786

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  • Electroluminescence of 1.27 μm near-infrared quantum cascade lasers using Si/CaF 2 heterostructures on SOI substrate Reviewed

    Zhiyuan Fan, Hyuma Suzuki, Haibo Wang, Masahiro Watanabe

    Japanese Journal of Applied Physics   2026.3

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    We have proposed and analyzed a quantum cascade laser operating at λ = 1.27 μm based on a Si/CaF2 heterostructure, and successfully demonstrated room-temperature electroluminescence (EL). Threshold current density was calculated as a balance of optical gain and loss according to waveguide structure design; population inversion was confirmed by analyzing inter-subband relaxation time τ_21 and extraction time τ_1 (τ_21 ∶ τ_1=2:1). Two periods of active layer were epitaxially grown on an n-Si (111) layer of a silicon-on-insulator (SOI) substrate equipped with conduction layer for electron injection and waveguide by molecular beam epitaxy (MBE). Fourier-transform infrared spectroscopy confirmed a distinct three-peak EL emission, with intensity increasing nearly linearly with the injected current density; and centered around 1.25 μm because of thickness ±1 ML fluctuation of thin films, which is suspected to be caused in process of epitaxy. Furthermore, a systematic wavelength shift of the emission peaks under increasing applied voltages was clearly identified, which can be consistently explained by the Stark shift in the transition quantum well induced by the applied bias that tilts the barrier tops, effectively making the barriers thinner at higher bias, producing the same effect as reducing the barrier thickness and leading to a wavelength shift.

    DOI: 10.35848/1347-4065/ae5115

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ae5115/pdf

  • Design and analysis of Si/CaF 2 near-infrared ( λ  ∼ 1.05 μm) DFB quantum cascade laser with wide transition layer Reviewed

    Zhiyuan Fan, Haibo Wang, Masahiro Watanabe

    Japanese Journal of Applied Physics   65 ( 5 )   05SP19 - 05SP19   2026.3

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    In this paper, we have designed and analyzed a room temperature near-infrared quantum cascade laser with wavelength of μm from Si/CaF 2 heterojunction and distributed feedback conduction layer (CL). The designed device contains multi-Si/CaF 2 active layer on n-Si (111) layer of a silicon-on-insulator substrate, forming a single-mode propagation waveguide in transverse magnetic mode. We innovatively designed the active layer structure that consists of a 12-monolayer (ML) transition layer quantum well (QW), quad-injector-barrier and a 4-ML blocking layer, with transition from 4th state to 1st state in QW. The minimum threshold current density of 7.32 kA cm −2 was obtained at waveguide width of 0.25 μm, period number of 15, and CL thickness of 25 nm, which is lower than calculated injection current density of 31 kA cm −2 ; in addition, the inter-subband relaxation time from 4th state to 1st state and the lifetime of 1st state , are roughly estimated to be 1.5 ps and 0.7 ps, which ensures population inversion. The analysis above indicated the possibility of laser oscillation.

    DOI: 10.35848/1347-4065/ae4636

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ae4636/pdf

  • Near-infrared (λ ∼ 1.2 μm) intersubband electroluminescence in Si/CaF2 quantum cascade structures Reviewed

    Gensai Tei, Yohei Koyanagi, Long Liu, Masahiro Watanabe

    Japanese Journal of Applied Physics   62 ( 7 )   072004 - 072004   2023.7

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    Abstract

    A clear electroluminescence (EL) from a Si/CaF2 quantum cascade structure has been successfully observed. The structure was equipped with 15 periods of an active region comprising of Si/CaF2 multi-quantum wells and a waveguide grown on the silicon-on-insulator substrate by MBE-based technique. As a result of an optical spectrum measurement by Fourier transform IR spectroscopy, a clear EL spectrum with a peak at λ ∼ 1.2 μm was observed. The EL spectrum is reasonably explained by fitting it with a Lorentzian model that considers the thickness fluctuation of a single monoatomic layer of a Si quantum well, the intra- and inter-subband scattering times, and the carrier escape time. These results indicate that the EL was generated by intersubband transitions in the Si quantum well.

    DOI: 10.35848/1347-4065/ace2a1

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ace2a1/pdf

  • Design and Analysis of Si/CaF2 Near-Infrared (λ∼1.7µm) DFB Quantum Cascade Laser for Silicon Photonics Reviewed

    Gensai TEI, Long LIU, Masahiro WATANABE

    IEICE Transactions on Electronics   E106.C ( 5 )   157 - 164   2023.5

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    Authorship:Last author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Institute of Electronics, Information and Communications Engineers (IEICE)  

    DOI: 10.1587/transele.2022ecp5045

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  • Design, Fabrication, and Evaluation of Waveguide Structure Using Si/CaF2 Heterostructure for Near- and Mid- Infrared Silicon Photonics Reviewed

    Long LIU, Gensai TEI, Masahiro WATANABE

    IEICE Transactions on Electronics   E106.C ( 1 )   1 - 6   2023.1

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    Authorship:Last author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Institute of Electronics, Information and Communications Engineers (IEICE)  

    DOI: 10.1587/transele.2022ecp5007

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  • Room temperature near-infrared electroluminescence of Si/CaF2 quantum cascade laser structures grown on an SOI substrate Reviewed

    Gensai Tei, Long Liu, Yohei Koyanagi, Masahiro Watanabe

    Japanese Journal of Applied Physics   60 ( SB )   SBBE03 - SBBE03   2021.3

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    Authorship:Last author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    Room temperature near-infrared electroluminescence (EL) from Si/CaF2 quantum cascade laser structures has been demonstrated. The structure was equipped with 25 periods of the active region comprised of Si/CaF2 multi quantum-wells and single-mode waveguide grown by molecular beam epitaxy-based technique on the silicon-on-insulator (SOI) substrate. EL spectra with multiple peaks around the near-infrared region were obtained at room temperature and the EL intensity response with injection current clearly confirmed the EL emission was originated from the current injection. Moreover, it was found that EL peak shift by changing applied bias was reasonably explained by energy shift due to the electric field applied to the Si quantum-well of the active region.

    DOI: 10.35848/1347-4065/abe998

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/abe998/pdf

  • Bipolar Transistor Test Structures for Extracting Minority Carrier Lifetime in IGBTs Reviewed

    Kiyoshi Takeuchi, Munetoshi Fukui, Takuya Saraya, Kazuo Itou, Toshihiko Takakura, Shinichi Suzuki, Yohichiroh Numasawa, Naoyuki Shigyo, Kuniyuki Kakushima, Takuya Hoshii, Kazuyoshi Furukawa, Masahiro Watanabe, Hitoshi Wakabayashi, Kazuo Tsutsui, Hiroshi Iwai, Atsushi Ogura, Wataru Saito, Shin-Ichi Nishizawa, Masanori Tsukuda, Ichiro Omura, Hiromichi Ohashi, Toshiro Hiramoto

    IEEE Transactions on Semiconductor Manufacturing   33 ( 2 )   159 - 165   2020.5

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    Publishing type:Research paper (scientific journal)   Publisher:Institute of Electrical and Electronics Engineers (IEEE)  

    DOI: 10.1109/tsm.2020.2972369

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  • Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process Reviewed

    Yoshiro Kumagai, Satoshi Fukuyama, Hiroki Tonegawa, Kizashi Mikami, Kodai Hirose, Kanta Tomizawa, Kensuke Ichikawa, Masahiro Watanabe

    Japanese Journal of Applied Physics   59 ( SI )   SIIE03 - SIIE03   2020.4

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    DOI: 10.35848/1347-4065/ab82a8

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    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ab82a8/pdf

  • Vertical Bipolar Transistor Test Structure for Measuring Minority Carrier Lifetime in IGBTs

    K. Takeuchi, M. Fukui, T. Saraya, K. Itou, T. Takakura, S. Suzuki, Y. Numasawa, K. Kakushima, T. Hoshii, K. Furukawa, M. Watanabe, N. Shigyo, H. Wakabayashi, M. Tsukuda, A. Ogura, K. Tsutsui, H. Iwai, S. Nishizawa, I. Omura, H. Ohashi, T. Hiramoto

    2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS)   98 - 101   2019.3

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    Publishing type:Research paper (international conference proceedings)   Publisher:IEEE  

    DOI: 10.1109/icmts.2019.8730922

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  • Verification of the Injection Enhancement Effect in IGBTs by Measuring the Electron and Hole Currents Separately

    T. Hoshii, K. Furukawa, K. Kakushima, M. Watanabe, N. Shigvo, T. Saraya, T. Takakura, K. Ltou, M. Fukui, S. Suzuki, K. Takeuchi, I. Muneta, H. Wakabayashi, S. Nishizawa, K. Tsutsui, T. Hiramoto, H. Ohashi, H. Lwai

    2018 48th European Solid-State Device Research Conference (ESSDERC)   26 - 29   2018.9

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    Publishing type:Research paper (international conference proceedings)   Publisher:IEEE  

    DOI: 10.1109/essderc.2018.8486870

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  • New Methodology for Evaluating Minority Carrier Lifetime for Process Assessment

    K. Kakushima, T. Hoshii, M. Watanabe, N. Shizyo, K. Furukawa, T. Saraya, T. Takakura, K. Ltou, M. Fukui, S. Suzuki, K. Takeuchi, I. Muneta, H. Wakabayashi, Y. Numasawa, A. Ogura, S. Nishizawa, K. Tsutsui, T. Hiramoto, H. Ohashi, H. Iwai

    2018 IEEE Symposium on VLSI Circuits   105 - 106   2018.6

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    Publishing type:Research paper (international conference proceedings)   Publisher:IEEE  

    DOI: 10.1109/vlsic.2018.8502399

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  • Resistance switching memory characteristics of CaF2/Si/CaF2 resonant-tunneling quantum-well heterostructures sandwiched by nanocrystalline Si secondary barrier layers Reviewed

    Yuya Kuwata, Keita Suda, Masahiro Watanabe

    APPLIED PHYSICS EXPRESS   9 ( 7 )   2016.7

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    DOI: 10.7567/APEX.9.074001

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  • Analysis of single- and double-barrier tunneling diode structures using ultrathin CaF2/CdF2/Si multilayered heterostructures grown on Si Reviewed

    Keita Suda, Yuya Kuwata, Masahiro Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 4 )   2015.4

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    DOI: 10.7567/JJAP.54.04DJ05

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  • Resistance switching memory characteristics of Si/CaF2/CdF2/CaF2/Si resonant-tunneling quantum-well structures Reviewed

    Junya Denda, Kazuya Uryu, Keita Suda, Masahiro Watanabe

    APPLIED PHYSICS EXPRESS   7 ( 4 )   044103-1 - 044103-4   2014.4

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    DOI: 10.7567/APEX.7.044103

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  • Resistance Switching Memory Characteristics of Si/CaF2CdF2 Quantum-Well Structures Grown on Metal (CoSi2) Layer Reviewed

    Junya Denda, Kazuya Uryu, Masahiro Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 4 )   04CJ07-1 - 04CJ07-4   2013.4

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    DOI: 10.7567/JJAP.52.04CJ07

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  • Suppression of leakage current of CdF2/CaF2 resonant tunneling diode structures grown on Si(100) substrates by nanoarea local epitaxy Reviewed

    Tohru Kanazawa, Atsushi Morosawa, Ryo Fujii, Takafumi Wada, Yusuke Suzuki, Masahiro Watanabe, Masahiro Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   46 ( 6A )   3388 - 3390   2007.6

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    DOI: 10.1143/JJAP.46.3388

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  • Room temperature negative differential resistance of CdF2/CaF2 double-barrier resonant tunneling diode structures grown on Si(100) substrates Reviewed

    Tohru Kanazawa, Ryo Fujii, Takafumi Wada, Yusuke Suzuki, Masahiro Watanabe, Masahiro Asada

    APPLIED PHYSICS LETTERS   90 ( 9 )   092101   2007.2

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    DOI: 10.1063/1.2709508

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  • Improvement of electroluminescence from CdF2/CaF2 intersubband transition light-emitting structure by trench patterning and hydrogen annealing of Si substrate Reviewed

    Keisuke Jinen, Kaoru Uchida, Shinji Kodaira, Masahiro Watanabe, Masahiro Asada

    IEICE ELECTRONICS EXPRESS   3 ( 23 )   493 - 498   2006.12

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    DOI: 10.1587/elex.3.493

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  • Room-temperature electroluminescence from single-period (CdF2/CaF2) inter-subband quantum cascade structure on si substrate Reviewed

    K Jinen, T Kikuchi, M Watanabe, M Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   45 ( 4B )   3656 - 3658   2006.4

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    DOI: 10.1143/JJAP.45.3656

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  • Optically pumped ultraviolet lasing of BeMgZnSe based quantum well laser structures Reviewed

    Y Niiyama, T Murata, M Watanabe

    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 4   3 ( 4 )   878 - +   2006

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    DOI: 10.1002/pssc.200564684

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  • Near-infrared electroluminescence from multilayered CdF2/CaF2 quantum heterostructure grown on trench-patterned Si(111) substrate Reviewed

    Keisuke Jinen, Kaotu Uchida, Shinji Kodaira, Masahiro Watanabe, Masahiro Asada

    2006 3RD IEEE INTERNATIONAL CONFERENCE ON GROUP IV PHOTONICS   128 - +   2006

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  • BeMgZnSe-based ultraviolet lasers Reviewed

    Y Niiyama, M Watanabe

    SEMICONDUCTOR SCIENCE AND TECHNOLOGY   20 ( 12 )   1187 - 1197   2005.12

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    DOI: 10.1088/0268-1242/20/12/008

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  • Ultraviolet lasing from optically pumped BeMgZnSe quantum-well laser structures Reviewed

    Y Niiyama, T Murata, M Watanabe

    APPLIED PHYSICS LETTERS   87 ( 14 )   142106   2005.10

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    DOI: 10.1063/1.2081121

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  • Improvement of crystalline quality of BeZnSe using buffer layer by migration enhanced epitaxy on GaP(001) substrate Reviewed

    T Yokoyama, Y Niiyama, T Murata, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   44 ( 1-7 )   L75 - L77   2005

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    DOI: 10.1143/JJAP.44.L75

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  • Epitaxial growth and optical properties for ultraviolet region of BeMgZnSe on GaP(001) substrate Reviewed

    Y Niiyama, T Yokoyama, M Watanabe

    PHYSICA STATUS SOLIDI B-BASIC RESEARCH   241 ( 3 )   479 - 482   2004.3

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    DOI: 10.1016/pssb.200304158

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  • Effect of buffer layer on epitaxial growth of high-magnesium-content BeMgZnSe lattice matched to GaP(001) substrate Reviewed

    Y Niiyama, T Yokoyama, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   42 ( 6A )   L599 - L602   2003.6

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    DOI: 10.1143/JJAP.42.L599

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  • Crystal Growth of High-Mg-Content BeMgZnSe Lattice Matched to GaP(001) Substrate Using BeZnSe Buffer Layer

    Y. Niiyama, T. Yokoyama, M. Watanabe

    First Asia-Pacific Workshop on Widegap Semiconductors, P118   302 - 303   2003

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  • Epitaxial growth of BeZnSe on CaF2/Si(111) substrate Reviewed

    T Maruyama, N Nakamura, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   41 ( 8A )   L876 - L877   2002.8

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    DOI: 10.1143/JJAP.41.L876

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  • Room-temperature ultraviolet photoluminescence of BeZnSe on GaP(001) Reviewed

    Y Niiyama, T Maruyama, N Nakamura, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   41 ( 7A )   L751 - L753   2002.7

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    DOI: 10.1143/JJAP.41.L751

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode grown on Si(100) substrate using Nanoarea Local Epitaxy Reviewed

    Masahiro Watanabe, Tatsuya Ishikawa, Masaki Matsuda Tohru Kanazawa, Masahiro Asada

    44th 2002 Electronic Materials Conference, Z5   54 - 55   2002

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  • Theoretical analysis of the threshold current density in BeMgZnSe quantum-well ultraviolet lasers Reviewed

    T Maruyama, N Nakamura, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   40 ( 12 )   6872 - 6873   2001.12

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    DOI: 10.1143/JJAP.40.6872

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  • Epitaxial growth and electrical characteristics of CaF2/Si/CaF2 resonant tunneling diode structures grown on Si(111) 1 degrees-off substrate Reviewed

    M Watanabe, Y Iketani, M Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   39 ( 10A )   L964 - L967   2000.10

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    DOI: 10.1143/jjap.39.L964

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  • CaF2/CdF2 double-barrier resonant tunneling diode with high room-temperature peak-to-valley ratio Reviewed

    M Watanabe, T Funayama, T Teraji, N Sakamaki

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   39 ( 7B )   L716 - L719   2000.7

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    DOI: 10.1143/jjap.39.L716

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  • Epitaxial growth and ultraviolet photoluminescence of CaF2/ZnO/CaF2 heterostructures on Si(111) Reviewed

    M Watanabe, Y Maeda, S Okano

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   39 ( 6A )   L500 - L502   2000.6

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    DOI: 10.1143/jjap.39.L500

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  • Improvement of the visible electroluminescence from nanocrystalline silicon embedded in CaF2 on Si(111) substrate prepared by rapid thermal annealing Reviewed

    T Maruyama, N Nakamura, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   39 ( 4B )   1996 - 2000   2000.4

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    DOI: 10.1143/JJAP.39.1996

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  • Resonant tunneling diodes in Si/CaF2 heterostructures grown by molecular beam epitaxy Reviewed

    M Tsutsui, M Watanabe, M Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   38 ( 8B )   L920 - L922   1999.8

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    DOI: 10.1143/jjap.38.L920

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  • Visible electroluminescence from nanocrystalline silicon embedded in single-crystalline CaF2/Si(111) with rapid thermal anneal Reviewed

    T Maruyama, N Nakamura, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   38 ( 8B )   L904 - L906   1999.8

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    DOI: 10.1143/jjap.38.L904

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  • Shortening of detection time for observation of hot electron spatial distribution by scanning hot electron microscopy Reviewed

    N Kikegawa, BY Zhang, Y Ikeda, N Sakai, K Furuya, M Asada, M Watanabe, W Saito

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   38 ( 4A )   2108 - 2113   1999.4

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    DOI: 10.1143/JJAP.38.2108

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  • Negative differential resistance of CaF2/CdF2 triple-barrier resonant-tunneling diode on Si(111) grown by partially ionized beam epitaxy Reviewed

    M Watanabe, Y Aoki, W Saito, M Tsuganezawa

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   38 ( 2A )   L116 - L118   1999.2

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    DOI: 10.1143/jjap.38.L116

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  • Epitaxial growth of nanometer-thick CaF2/CdF2 heterostructures using partially ionized beam epitaxy Reviewed

    M Watanabe, W Saitoh, Y Aoki, J Nishiyama

    SOLID-STATE ELECTRONICS   42 ( 7-8 )   1627 - 1630   1998.7

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    DOI: 10.1016/S0038-1101(98)00083-5

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  • Electroluminescence of nanocrystal Si embedded in single-crystal CaF2/Si(111) Reviewed

    M Watanabe, T Matsunuma, T Maruyama, Y Maeda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   37 ( 5B )   L591 - L593   1998.5

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    DOI: 10.1143/jjap.37.L591

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  • Light emission from Si nanocrystals embedded in CaF2 epilayers on Si(111): Effect of rapid thermal annealing Reviewed

    Masahiro Watanabe, Takeo Maruyama, Soichiro Ikeda

    Journal of Luminescence   80 ( 1-4 )   253 - 256   1998

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    DOI: 10.1016/S0022-2313(98)00107-0

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  • Reduction of electrical resistance of nanometer-thick CoSi2 film on CaF2 by pseudomorphic growth of CaF2 on Si(111) Reviewed

    W Saitoh, K Mori, H Sugiura, T Maruyama, M Watanabe, M Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   36 ( 7A )   4470 - 4471   1997.7

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    DOI: 10.1143/JJAP.36.4470

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  • Seventy-nm-pitch patterning on CaF2 by e-beam exposure Reviewed

    H Hongo, T Hattori, Y Miyamoto, K Furuya, T Matsunuma, M Watanabe, M Asada

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   35 ( 12A )   6342 - 6343   1996.12

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    DOI: 10.1143/JJAP.35.6342

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  • Visible light emission from nanocrystalline silicon embedded in CaF2 layers on Si(111) Reviewed

    M Watanabe, F Iizuka, M Asada

    IEICE TRANSACTIONS ON ELECTRONICS   E79C ( 11 )   1562 - 1567   1996.11

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  • Detection of hot electron current with scanning hot electron microscopy Reviewed

    F Vazquez, D Kobayashi, Kobayashi, I, Y Miyamoto, K Furuya, T Maruyama, M Watanabe, M Asada

    APPLIED PHYSICS LETTERS   69 ( 15 )   2196 - 2198   1996.10

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    DOI: 10.1063/1.117163

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  • Proposal and analysis of very short channel field effect transistor using vertical tunneling with new heterostructures on silicon Reviewed

    W Saitoh, K Yamazaki, M Asada, M Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   35 ( 9A )   L1104 - L1106   1996.9

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    DOI: 10.1143/jjap.35.L1104

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  • Transfer efficiency of hot electrons in a metal(CoSi2)/insulator(CaF2) quantum interference transistor Reviewed

    T Suemasu, W Saitoh, Y Khono, K Mori, M Watanabe, M Asada

    SURFACE SCIENCE   361 ( 1-3 )   209 - 212   1996

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  • THEORETICAL AND MEASURED CHARACTERISTICS OF METAL(COSI2)-INSULATOR(CAF2) RESONANT-TUNNELING TRANSISTORS AND THE INFLUENCE OF PARASITIC ELEMENTS Reviewed

    T SUEMASU, Y KOHNO, W SAITOH, M WATANABE, M ASADA

    IEEE TRANSACTIONS ON ELECTRON DEVICES   42 ( 12 )   2203 - 2210   1995.12

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    DOI: 10.1109/16.477780

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  • METAL (COSI2)/INSULATOR (CAF2) HOT-ELECTRON TRANSISTOR FABRICATED BY ELECTRON-BEAM LITHOGRAPHY ON A SI SUBSTRATE Reviewed

    W SAITOH, T SUEMASU, Y KOHNO, M WATANABE, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   34 ( 10A )   L1254 - L1256   1995.10

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    DOI: 10.1143/jjap.34.L1254

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  • METAL (COSI2)/INSULATOR (CAF2) HOT-ELECTRON TRANSISTOR FABRICATED BY ELECTRON-BEAM LITHOGRAPHY ON A SI SUBSTRATE Reviewed

    W SAITOH, T SUEMASU, Y KOHNO, M WATANABE, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   34 ( 10A )   L1254 - L1256   1995.10

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  • FORMATION OF SILICON AND COBALT SILICIDE NANOPARTICLES IN CAF2 Reviewed

    M WATANABE, F IIZUKA, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   34 ( 8B )   4380 - 4383   1995.8

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    DOI: 10.1143/JJAP.34.4380

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  • MULTIPLE NEGATIVE DIFFERENTIAL RESISTANCE DUE TO QUANTUM INTERFERENCE OF HOT-ELECTRON WAVES IN METAL (COSI2) INSULATOR (CAF2) HETEROSTRUCTURES AND INFLUENCE OF PARASITIC CIRCUIT ELEMENTS Reviewed

    W SAITOH, T SUEMASU, Y KOHNO, M WATANABE, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   34 ( 8B )   4481 - 4484   1995.8

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    DOI: 10.1143/JJAP.34.4481

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  • FORMATION OF SILICON AND COBALT SILICIDE NANOPARTICLES IN CAF2 Reviewed

    M WATANABE, F IIZUKA, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   34 ( 8B )   4380 - 4383   1995.8

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    DOI: 10.1143/JJAP.34.4380

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  • Metal (CoSi2)/insulator (CaF2) hot elelectron transistor using electron-beam lithography on Si substrate

    W. Saitoh, T. Suemasu, Y. Kohno, M. Watanabe, M. Asada

    European Solid-State Device Research Conference   631 - 634   1995

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  • QUANTUM INTERFERENCE OF ELECTRON-WAVE IN METAL (COSI2) INSULATOR (CAF2) RESONANT-TUNNELING HOT-ELECTRON TRANSISTOR STRUCTURE Reviewed

    T SUEMASU, Y KOHNO, W SAITOH, N SUZUKI, M WATANABE, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   33 ( 12B )   L1762 - L1765   1994.12

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    DOI: 10.1143/jjap.33.L1762

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  • QUANTUM INTERFERENCE OF ELECTRON-WAVE IN METAL (COSI2) INSULATOR (CAF2) RESONANT-TUNNELING HOT-ELECTRON TRANSISTOR STRUCTURE Reviewed

    T SUEMASU, Y KOHNO, W SAITOH, N SUZUKI, M WATANABE, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   33 ( 12B )   L1762 - L1765   1994.12

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    DOI: 10.1143/jjap.33.L1762

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  • DIFFERENT CHARACTERISTICS OF METAL (COSI2) INSULATOR (CAF2) RESONANT-TUNNELING TRANSISTORS DEPENDING ON BASE QUANTUM-WELL LAYER Reviewed

    T SUEMASU, Y KOHNO, N SUZUKI, M WATANABE, M ASADA

    IEICE TRANSACTIONS ON ELECTRONICS   E77C ( 9 )   1450 - 1454   1994.9

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  • METAL(COSI2)/INSULATOR(CAF2) RESONANT-TUNNELING DIODE Reviewed

    T SUEMASU, M WATANABE, J SUZUKI, Y KOHNO, M ASADA, N SUZUKI

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   33 ( 1A )   57 - 65   1994.1

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    DOI: 10.1143/JJAP.33.57

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  • REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OSCILLATION DURING CAF2 GROWTH ON SI(111) BY PARTIALLY IONIZED BEAM EPITAXY Reviewed

    M WATANABE, N SUZUKI, M ASADA

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   32 ( 2 )   940 - 941   1993.2

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    DOI: 10.1143/JJAP.32.L940

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  • NEGATIVE DIFFERENTIAL RESISTANCE OF METAL (COSI2)/INSULATOR (CAF2) TRIPLE-BARRIER RESONANT TUNNELING DIODE Reviewed

    M WATANABE, T SUEMASU, S MURATAKE, M ASADA

    APPLIED PHYSICS LETTERS   62 ( 3 )   300 - 302   1993.1

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  • EPITAXIAL-GROWTH AND ELECTRICAL CONDUCTANCE OF METAL(COSI2) INSULATOR(CAF2) NANOMETER-THICK LAYERED STRUCTURES ON SI(111) Reviewed

    M WATANABE, S MURATAKE, T SUEMASU, H FUJIMOTO, S SAKAMORI, M ASADA, S ARAI

    JOURNAL OF ELECTRONIC MATERIALS   21 ( 8 )   783 - 789   1992.8

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    DOI: 10.1007/BF02665516

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  • EPITAXIAL-GROWTH AND ELECTRICAL CONDUCTANCE OF METAL(COSI2) INSULATOR(CAF2) NANOMETER-THICK LAYERED STRUCTURES ON SI(111) Reviewed

    M WATANABE, S MURATAKE, T SUEMASU, H FUJIMOTO, S SAKAMORI, M ASADA, S ARAI

    JOURNAL OF ELECTRONIC MATERIALS   21 ( 8 )   783 - 789   1992.8

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    DOI: 10.1143/JJAP.31.L116

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  • ROOM-TEMPERATURE NEGATIVE DIFFERENTIAL RESISTANCE OF METAL (COSI2) INSULATOR (CAF2) RESONANT TUNNELING DIODE Reviewed

    T SUEMASU, M WATANABE, M ASADA, N SUZUKI

    ELECTRONICS LETTERS   28 ( 15 )   1432 - 1434   1992.7

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  • TRANSISTOR ACTION OF METAL (COSI2) INSULATOR (CaF2) HOT-ELECTRON TRANSISTOR STRUCTURE Reviewed

    S MURATAKE, M WATANABE, T SUEMASU, M ASADA

    ELECTRONICS LETTERS   28 ( 11 )   1002 - 1004   1992.5

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  • Epitaxial Growth of Metal(CoSi2)/Insulator(CaF2) Nanometer-Thick Layered Structure on Si(111) Reviewed

    Watanabe Masahiro, Muratake Shigeki, Fujimoto Hiromasa, Sakamori Shigenori, Asada Masahiro, Arai Shigehisa

    Jpn J Appl Phys   31 ( 2 )   L116 - L118   1992.2

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    Epitaxial growth of a metal(CoSi2)/insulator(CaF2) nanometer-thick layered structure on Si(111) was demonstrated. An epitaxial CoSi2 layer on CaF2 was obtained by the two-step growth technique, i.e., solid phase epitaxy with the epitaxial Si layer grown in the first step and Co deposited in the second step. This technique was shown to be effective in avoiding the Co agglomeration on the CaF2 layer observed in the co-evaporation of Si and Co. An epitaxial CaF2 layer was formed on CoSi2/CaF2 at low substrate temperature (450°C) with a partially ionized and accelerated CaF2 beam, to avoid Co agglomeration in the CoSi2/CaF2 underlayer as well. Obtained results showed a single-crystalline nature in reflection high-energy electron diffraction (RHEED) and transmission electron microscopy (TEM) observations.

    DOI: 10.1143/JJAP.31.L116

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  • PROPOSAL AND ANALYSIS OF QUANTUM-INTERFERENCE HIGH-SPEED ELECTRON DEVICES USING METAL-INSULATOR HETEROSTRUCTURE Reviewed

    T SAKAGUCHI, M WATANABE, M ASADA

    IEICE TRANSACTIONS ON COMMUNICATIONS ELECTRONICS INFORMATION AND SYSTEMS   74 ( 10 )   3326 - 3333   1991.10

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  • LOW-TEMPERATURE (APPROXIMATELY 420-DEGREES-C) EPITAXIAL-GROWTH OF CAF2 SI(111) BY IONIZED-CLUSTER-BEAM TECHNIQUE Reviewed

    M WATANABE, H MUGURUMA, M ASADA, S ARAI

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   29 ( 9 )   1803 - 1804   1990.9

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    DOI: 10.1143/JJAP.29.1803

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MISC

  • 5Vゲート駆動による3300VスケーリングIGBTの動作実証—3300V Scaled IGBTs Driven by 5V Gate Voltage—電子デバイス 半導体電力変換合同研究会・パワーデバイス・パワーエレクトロニクスとその実装技術

    更屋 拓哉, 伊藤 一夫, 高倉 俊彦, 福井 宗利, 鈴木 慎一, 竹内 潔, 附田 正則, 沼沢 陽一郎, 佐藤 克己, 末代 知子, 齋藤 渉, 角嶋 邦之, 星井 拓也, 古川 和由, 渡辺 正裕, 執行 直之, 若林 整, 筒井 一生, 岩井 洋, 小椋 厚志, 西澤 伸一, 大村 一郎, 大橋 弘通, 平本 俊郎

    電気学会研究会資料. SPC = The papers of technical meeting on semiconductor power converter, IEE Japan / 半導体電力変換研究会 [編]   2019 ( 161-172 )   61 - 65   2019.11

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  • 招待講演 トレンチゲート型Si-IGBTの3次元精密TCADシミュレーション—Three-dimensional accurate TCAD simulation of trench-gate Si-IGBTs—シリコン材料・デバイス

    渡辺 正裕, 執行 直之, 星井 拓也, 古川 和由, 角嶋 邦之, 佐藤 克己, 末代 知子, 更屋 拓哉, 高倉 俊彦, 伊藤 一夫, 福井 宗利, 鈴木 慎一, 竹内 潔, 宗田 伊里也, 若林 整, 中島 昭, 西澤 伸一, 筒井 一生, 平本 俊郎, 大橋 弘通, 岩井 洋

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   119 ( 273 )   45 - 48   2019.11

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    Other Link: https://ndlsearch.ndl.go.jp/books/R000000004-I030128987

  • 依頼講演 5Vゲート駆動による3300VスケーリングIGBTのスイッチング動作—3300V Scaled IGBT Switched by 5V Gate Drive—シリコン材料・デバイス

    平本 俊郎, 更屋 拓哉, 伊藤 一夫, 高倉 俊彦, 福井 宗利, 鈴木 慎一, 竹内 潔, 附田 正則, 沼沢 陽一郎, 佐藤 克己, 末代 知子, 齋藤 渉, 角嶋 邦之, 星井 拓也, 古川 和由, 渡辺 正裕, 執行 直之, 若林 整, 筒井 一生, 岩井 洋, 小椋 厚志, 西澤 伸一, 大村 一郎, 大橋 弘通

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   119 ( 161 )   31 - 34   2019.8

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    Other Link: https://ndlsearch.ndl.go.jp/books/R000000004-I029947188

  • 招待講演 5Vゲート駆動1200V級スケーリングIGBTの動作実証とスイッチング損失の低減—シリコン材料・デバイス

    更屋 拓哉, 伊藤 一夫, 高倉 俊彦, 福井 宗利, 鈴木 慎一, 竹内 潔, 附田 正則, 沼沢 陽一郎, 佐藤 克己, 末代 知子, 齋藤 渉, 角嶋 邦之, 星井 拓也, 古川 和由, 渡辺 正裕, 執行 直之, 筒井 一生, 岩井 洋, 小椋 厚志, 西澤 伸一, 大村 一郎, 大橋 弘通, 平本 俊郎

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   118 ( 429 )   39 - 44   2019.1

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  • 3300V Scaled IGBTs Driven by 5V Gate Voltage International journal

    Saraya, Takuya, Itou, Kazuo, Takakura, Toshihiko, Fukui, Munetoshi, Suzuki, Shinichi, Takeuchi, Kiyoshi, Tsukuda, Masanori, Numasawa, Yohichiroh, Satoh, Katsumi, Matsudai, Tomoko, Saito, Wataru, Kakushima, Kuniyuki, Hoshii, Takuya, Furukawa, Kazuyoshi, Watanabe, Masahiro, Shigyo, Naoyuki, Wakabayashi, Hitoshi, Tsutsui, Kazuo, Iwai, Hiroshi, Ogura, Atsushi, Nishizawa, Shin-ichi, Omura, Ichiro, Ohashi, Hiromichi, Hiramoto, Toshiro

    2019 31ST INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD)   43 - 46   2019

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  • Impact of three-dimensional current flow on accurate TCAD simulation for trench-gate IGBTs

    Watanabe, Masahiro, Shigyo, Naoyuki, Hoshii, Takuya, Furukawa, Kazuyoshi, Kakushima, Kuniyuki, Satoh, Katsumi, Matsudai, Tomoko, Saraya, Takuya, Takakura, Toshihiro, Itou, Kazuo, Fukui, Munetoshi, Suzuki, Shinichi, Takeuchi, Kiyoshi, Muneta, Iriya, Wakabayashi, Hitoshi, Nakajima, Akira, Nishizawa, Shin-ichi, Tsutsui, Kazuo, Hiramoto, Toshiro, Ohashi, Hiromichi, Iwai, Hiroshi

    2019 31ST INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD)   119 ( 273(SDM2019 68-79) )   311 - 314   2019

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  • 少数キャリアライフタイムによる半導体プロセスの評価手法の提案

    角嶋邦之, 星井拓也, 渡辺正裕, 執行直之, 古川和由, 更屋拓哉, 高倉俊彦, 伊藤一夫, 福井宗利, 鈴木慎一, 竹内潔, 宗田伊理也, 若林整, 沼沢陽一郎, 小椋厚志, 西澤伸一, 筒井一生, 平本俊郎, 大橋弘通, 岩井洋

    電気学会電子・情報・システム部門大会講演論文集(CD-ROM)   2018   2018

  • Negative Differential Resistance of CoSi2/CaF2 Triple Barrier Resonant Tunneling Diode Grown by Local Epitaxy

    WATANABE Masahiro, TAMURA Shinpei, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    IEICE technical report. Electron devices   104 ( 622 )   7 - 10   2005.1

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    (Metal)CoSi_2/(Insulator)CaF_2 triple barrier resonant tunneling diode structures were grown on Si(111) substrate using Local Epitaxy technique. The heterostructures were grown in holes with diameter of 40nm fabricated by electron beam lithography. In the measurement of I-V characteristics, clear negative differential resistance characteristics were observed at room temperature with peak to valley current ratio (PVR) of 33, which was significantly larger than that of RTDs grown by conventional MEB.

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode Grown on Si(100) Substrate

    WATANABE Masahiro, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    Technical report of IEICE. SDM   103 ( 631 )   25 - 28   2004.1

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    Room temperature negative differential resistance of CdF_2/CaF_2 double barrier resonant tunneling diode grown on Si(100) substrate has been demonstrated. Crystal growth was carried out using Si(100) substrate with miscut angle of 2°toward <-1,-1,2> in order to control atomic steps on the substrate. CdF_2 quantum well layer thickness dependence was also discussed.

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  • CdF2/CaF2 Resonant Tunneling Diode Grown on Si(111) and Si(100) Substrate using Nano-area Epitaxy

    WATANABE Masahiro, ISHIKAWA Tatsuya, MATSUDA Masaki, KANAZAWA Tohru, ASADA Masahiro

    IEICE technical report. Electron devices   101 ( 618 )   65 - 70   2002.1

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    CdF_2-CaF_2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity (〜2.9eV) at the heterointerface. We have studied crystal growth technique and current-voltage characteristics of CdF_2-CaF_2 double barrier resonant tunneling diode (DBRTD) structures grown by using nano-area (〜100nm) epitaxy with partially ionized beam and molecular beam epitaxy technique on Si(111) and Si(100) substrate. Room temperature negative differential resistance of submicron-size CdF_2/CaF_2DBRTD grown on Si(100) substrate has been demonstrated for the first time.

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  • Metal/insulator heterostructure electron devices.

    WATANABE Masahiro, SUEMASU Takashi, ASADA Masahiro

    63 ( 2 )   124 - 131   1994.2

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Presentations

  • Reduction of leakage current in Si/CaF2 double-barrier resonant tunnel diodes by acceleration voltage optimization in ionized beam epitaxy

    Ken Hattori, Keita Saito, Shu Igari, Takahiro Kobayashi, Yushi Ishikawa, Masahiro Watanabe

    The 73rd The Japan Society of Applied Physics Spring Meeting  2026.3 

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  • Control of the turn-on voltage in nonvolatile resistive switching memory using a Si/CaF2 quadruple-barrier resonant tunneling structure

    Keita Saito, Ken Hattori, Shu Igari, Takahiro Kobayashi, Reo Yamashita, Masahiro Watanabe

    The 73rd The Japan Society of Applied Physics Spring Meeting  2026.3 

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  • Electroluminescence of 1.27μm Near-Infrared Quantum Cascade Lasers using Si/CaF2 Heterostructures on SOI Substrate International conference

    Zhiyuan Fan, Hyuma Suzuki, Haibo Wang, Masahiro Watanabe

    The 2025 International Conference on Solid State Devices and Materials  2025.9  The Japan Society of Applied Physics

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    Event date: 2025.9

    Language:English   Presentation type:Oral presentation (general)  

    Venue:PACIFICO YOKOHAMA, Yokohama, Kanagawa   Country:Japan  

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  • Analysis of Near-Infrared Wavelength Quantum Cascade Lasers using Si/CaF2 Heterostructures

    Haibo Wang, Zhiyuan Fan, Qi Shutang, Masahiro Watanabe

    The 86th Autumn Meeting of The Japan Society of Applied Physics  2025.9  The Japan Society of Applied Physics

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    Event date: 2025.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Tempaku Campus, Meijo University, Nagoya, Aichi   Country:Japan  

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  • Room temperature negative differential resistance of Si/CaF2 n-type double-barrier resonant tunnel diodes grown in SiO2 holes formed using reactive ion etching

    Shu Igari, Takahiro Kobayashi, Ken Hattori, Masahiro Watanabe

    The 86th Autumn Meeting of The Japan Society of Applied Physics  2025.9  The Japan Society of Applied Physics

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    Event date: 2025.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Tempaku Campus, Meijo University, Nagoya, Aichi   Country:Japan  

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  • Room temperature negative differential resistance characteristics of n-type Si/CaF2 double-barrier Resonant Tunneling Diode with CaF2 embedded structure

    Takahiro Kobayashi, Ryoya Usami, Kanta Murakami, Ken Hattori, Masahiro Watanabe

    The 86th Autumn Meeting of The Japan Society of Applied Physics  2025.9  The Japan Society of Applied Physics

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    Event date: 2025.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Tempaku Campus, Meijo University, Nagoya, Aichi   Country:Japan  

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  • Analysis of 1.27μm Near-Infrared Quantum Cascade Lasers using Si/CaF2 Heterostructures on SOI Substrate

    Zhiyuan Fan, Hyuma Suzuki, Haibo Wang, Masahiro Watanabe

    The 72nd The Japan Society of Applied Physics Spring Meeting, 16a-P08-1  2025.3  The Japan Society of Applied Physics

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    Event date: 2025.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

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  • Analysis of 4.1μm Quantum Cascade Lasers using Si/CaF2 Heterostructures on SOI Substrate

    Zhiyuan Fan, Hyuma Suzuki, Haibo Wang, Masahiro Watanabe

    The 85th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 18a-P04-1  2024.9  The Japan Society of Applied Physics

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    Event date: 2024.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:TOKI MESSE, Niigata   Country:Japan  

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  • Proposal and analysis of p-type near-infrared wavelength quantum cascade lasers using Si/CaF2 heterostructures

    Hyuma Suzuki, Zhiyuan Fan, Haibo Wang, MasahiroWatanabe

    The 85th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 18a-P04-2  2024.9  The Japan Society of Applied Physics

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    Event date: 2024.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:TOKI MESSE, Niigata   Country:Japan  

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  • The charge retention characteristics of resistive switching memory using Si/CaF2 quadruple-barrier resonant tunneling structure

    Maiko Hoshino, Ryoya Usami, Kanta Murakami, Toya Shioji, Masahiro Watanabe

    The 71st The Japan Society of Applied Physics Spring Meeting, 25a-12K-9  2024.3  The Japan Society of Applied Physics

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Setagaya Campus, Tokyo City University   Country:Japan  

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  • Active layer desings for near-infrared wavelength quantum cascade lasers using CaF2/Si heterostructure for electric field reduction

    Yuta Sugiyama, Hyuma Suzuki, Zhiyuan Fan, Masahiro Watanabe

    The 84th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 21p-P20-3  2023.9  The Japan Society of Applied Physics

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Kumamoto-jo Hall and other surrounding facilities   Country:Japan  

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  • Room Temperature Pulse Response Characteristics of Resistance Switching Memory using Si/CaF2 Quadruple-Barrier Resonant Tunneling Structure

    Maiko Hoshino, Ryoya Usami, Kanta Murakami, Masahiro Watanabe

    The 84th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 20p-A301-15  2023.9  The Japan Society of Applied Physics

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Kumamoto-jo Hall and other surrounding facilities   Country:Japan  

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  • Improvement of current density of Si/CaF2 n-type triple-barrier resonant tunneling diode

    Kanta Murakami, Ryoya Usami, Maiko Hoshino, Masahiro Watanabe

    The 84th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 22p-P09-2  2023.9  The Japan Society of Applied Physics

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Kumamoto-jo Hall and other surrounding facilities   Country:Japan  

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  • Valley current reduction of p-type Si/CaF2 double-barrier resonant tunneling diode using embedded structure in CaF2

    Ryoya Usami, Maiko Hoshino, Kanta Murakami, Masahiro Watanabe

    The 84th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 22p-P09-3  2023.9  The Japan Society of Applied Physics

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Kumamoto-jo Hall and other surrounding facilities   Country:Japan  

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  • Room Temperature Characteristics of Resistance Switching Memory using Si/CaF2 Quadruple-Barrier Resonant Tunneling Structure

    Maiko Hoshino, Akinori Ito, Yusuke Suzuki, Ryoya Usami, Kanta Murakami, Gensai Tei, Masahiro Watanabe

    The 70th The Japan Society of Applied Physics Spring Meeting, 15p-D411-4  2023.3  The Japan Society of Applied Physics

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Sophia University, Tokyo   Country:Japan  

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  • TCAD simulation of trench-gate IGBTs for prediction of carrier lifetime requirements for future scaled devices Invited International conference

    Masahiro Watanabe

    2021 IEEE 14th International Conference on ASIC (ASICON 2021)  2021.10 

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    Event date: 2021.10

    Language:English   Presentation type:Oral presentation (invited, special)  

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  • Proposal and Analysis of Si/CaF2 Distributed Feedback Waveguide for near- and mid- infrared applications International conference

    Gensai Tei, Kenta Kitamura, Long Liu, Yohei Koyanagi, Daiki Sugawara, Masahiro Watanabe

    26th MICROOPTICS CONFERENCE (MOC2021)  2021.9 

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    Event date: 2021.9

    Language:English   Presentation type:Poster presentation  

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  • Accurate TCAD simulation of trench-gate IGBTs and its application to prediction of carrier lifetime requirements for future scaled devices Invited International conference

    Masahiro Watanabe, Naoyuki Shigyo, Takuya Hoshii, Kazuyoshi Furukawa, Kuniyuki Kakushima, Katsumi Satoh, Tomoko Matsudai, Takuya Saraya, Toshihiko Takakura, Iriya Muneta, Hitoshi Wakabayashi, Akira Nakajima, Shin-ichi Nishizawa, Kazuo Tsutsui, Toshiro Hiramoto, Hiromichi Ohashi, Hiroshi Iwai

    The 5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM2021)  2021.4 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (invited, special)  

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  • Room Temperature Near Infrared Electroluminescence of Si/CaF2 Quantum Cascade Laser Structures grown on SOI Substrate International conference

    Gensai Tei, Liu Long, Yohei Koyanagi, Masahiro Watanabe

    The 2020 International Conference on Solid State Devices and Materials (SSDM2020)  2020.9  The Japan Society of Applied Physics

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    Event date: 2020.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

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  • Negative Differential Resistance in CaF2/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process International conference

    Yoshiro Kumagai, Satoshi Fukuyama, Hiroki Tonegawa, Kizashi Mikami, Kodai Hirose, Kanta Tomizawa, Keisuke Ichikawa, Masahiro Watanabe

    32nd International Microprocesses and Nanotechnology Conference (MNC2019)  2019.10 

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    Event date: 2019.10

    Language:English   Presentation type:Poster presentation  

    Venue:Hiroshima, Japan  

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  • Design, fabrication, and evaluation of waveguide structure for Si/CaF2 quantum-well intersubband transition lasers International conference

    Long Liu, Soichiro Ono, Gensai Tei, Masahiro Watanabe

    The 2019 International Conference on Solid State Devices and Materials (SSDM2019)  2019.9  The Japan Society of Applied Physics

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    Event date: 2019.9

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

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  • Impact of three-dimensional current flow on accurate TCAD simulation for trench-gate IGBTs International conference

    Masahiro Watanabe, Naoyuki Shigyo, Takuya Hoshii, Kazuyoshi Furukawa, Kuniyuki Kakushima, Katsumi Satoh, Tomoko Matsudai, Takuya Saraya, Toshihiko Takakura, Kazuo Itou, Munetoshi Fukui, Shin-ichi Suzuki, Kiyoshi Takeuchi, Iriya Muneta, Hitoshi Wakabayashi, Akira Nakajima, Shin-ichi Nishizawa, Kazuo Tsutsui, Toshiro Hiramoto, Hiromichi Ohashi, Hiroshi Iwai

    The 31st IEEE International Symposium on Power Semiconductor Devices and Ics  2019.3 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

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  • Transmission Electron Microscopy Analysis of CaF2/CdF2/CaF2 Resonant Tunneling Diode Structures grown on Si(100) Substrate International conference

    M. Watanabe, T. Kanazawa, M. Asada

    The 34th International Symposium on Compound Semiconductors (ISCS2007), TuD P8  2007.10 

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    Event date: 2007.10

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  • Resistance switching memory using Si/CaF2/CdF2 quantum-well structures International conference

    Masahiro Watanabe, Ryo Hirasawa, Yuukou Nakashouji

    The 2009 International Conference on Solid State Devices and Materials (SSDM2009), K-2-6  2009.10  The Japan Society of Applied Physics

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  • Enhancement of Multiexciton Generation using Epitaxial Silicon/Fluoride Quantum-dot Structures International conference

    Masahiro Watanabe, Hiroshi Oogi

    International Symposium on Innovative Solar Cells 2009, T-2  2009.3 

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  • Retention characteristics of resistance switching memory using Si/CaF2/CdF2 quantum-well structures International conference

    Masahiro Watanabe, Kazuya Uryu

    The 2011 International Conference on Solid State Devices and Materials (SSDM2011), P-9-14  2011.9  The Japan Society of Applied Physics

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  • Switching voltage reduction of resistance switching memory using Si/CaF2/CdF2 quantum-well structures International conference

    Masahiro Watanabe, Yuhkou Nakashouji, Kazuya Tsuchiya

    The 2010 International Conference on Solid State Devices and Materials (SSDM2010), F-5-2  2010.9  The Japan Society of Applied Physics

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  • Near Infrared (λ~1.5μm) Room Temperature Electroluminescence from Si/CaF2 Intersubband Transition Laser Structures Grown on Silicon-on-Insulator Substrate International conference

    Minato Segawa, Tatsuya Ohci, Yuya Koshita, Keita Suda, Masahiro Watanabe

    18th International Conference on Electron Dynamics in Semiconductors, Optoelectronics, and Nanostructures (EDISON18), TH3-5  2013.7 

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  • Resistance switching memory characteristics of Si/CaF2/CdF2 quantum-well structures grown on metal (CoSi2) Layer International conference

    Junya Denda, Kazuya Uryu, Masahiro Watanabe

    The 2012 International Conference on Solid State Devices and Materials (SSDM2012), PS-9-6  2012.9  The Japan Society of Applied Physics

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  • Pulsed operation of resistance switching memory of Si/CaF2/CdF2 resonant-tunneling quantum-well structures International conference

    Junya Denda, Keita Suda, Yuya Kuwata, Masahiro Watanabe

    The 2013 International Conference on Solid State Devices and Materials (SSDM2013), A-8-4  2013.9  The Japan Society of Applied Physics

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  • Near-infrared Electroluminescence from Multilayered CdF2/CaF2 Quantum Heterostructure Grown on Trench-Patterned Si(111) Substrate

    3rd IEEE International Conference of GroupIV Photonics, P29  2006 

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  • Electroluminescence from (CdF2/CaF2) Inter-subband Transition Laser Structures on Si substrate

    JINEN Keisuke, KIKUCHI Takeshi, UCHIDA Kaoru, KODAIRA Shinji, WATANABE Masahiro, ASADA Masahiro

    IEICE technical report. Electron devices  2006.1 

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    Room temperature electroluminescence from CdF2/CaF2 inter-subband transition laser structures on Si substrate is presented. CdF2/CaF2 heterostructure can be grown on silicon substrate epitaxially and has large conduction band offset at the heterointerface, which enable to short wavelength (near infrared) inter-subband optical transition in CdF2 quantum-wells on silicon substrate. In this report, room temperature electroluminescence from (CdF2/CaF2) active region is presented and discussed.

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  • Fluoride based Resonant Tunneling Diode on Si(100) substrate using Nanoarea Local Growth

    KANAZAWA Tohru, MOROSAWA Atsushi, FUJII Ryo, WADA Takafumi, WATANABE Masahiro, ASADA Masahiro

    IEICE technical report. Electron devices  2006.1 

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    A CdF2/CaF2 heterostructure is an attractive candidate for quantum applications on Si substrates, such as resonant tunneling diodes (RTDs) and quantum intersubband transition devices, because of the large conduction band discontinuity (ΔEc?2.9eV) at the heterointerface. We have observed clear NDR with high PVCR for fluoride-based DBRTDs on Si(100) substrates by nanoarea local epitaxy. Crystal growth areas were limited by 15-nm-thick SiO_2 insulator layer and holes with a diameter of 80nm were observed. And bottom CaF2 layer was post-growth annealed at 500℃. The PVCR obtained was more than 10^6, Which is the highest for fluoride-based RTDs on Si(100) substrates.

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  • Fluoride based Resonant Tunneling Diode on Si(100) substrate using Nanoarea Local Growth

    KANAZAWA Tohru, MOROSAWA Atsushi, FUJII Ryo, WADA Takafumi, WATANABE Masahiro, ASADA Masahiro

    Technical report of IEICE. SDM  2006.1 

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    A CdF2/CaF2 heterostructure is an attractive candidate for quantum applications on Si substrates, such as resonant tunneling diodes (RTDs) and quantum intersubband transition devices, because of the large conduction band discontinuity (ΔEc?2.9eV) at the heterointerface. We have observed clear NDR with high PVCR for fluoride-based DBRTDs on Si(100) substrates by nanoarea local epitaxy. Crystal growth areas were limited by 15-nm-thick SiO_2 insulator layer and holes with a diameter of 80nm were observed. And bottom CaF2 layer was post-growth annealed at 500℃. The PVCR obtained was more than 10^6, Which is the highest for fluoride-based RTDs on Si(100) substrates.

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  • Electroluminescence from (CdF2/CaF2) Inter-subband Transition Laser Structures on Si substrate

    JINEN Keisuke, KIKUCHI Takeshi, UCHIDA Kaoru, KODAIRA Shinji, WATANABE Masahiro, ASADA Masahiro

    Technical report of IEICE. SDM  2006.1 

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    Room temperature electroluminescence from CdF2/CaF2 inter-subband transition laser structures on Si substrate is presented. CdF2/CaF2 heterostructure can be grown on silicon substrate epitaxially and has large conduction band offset at the heterointerface, which enable to short wavelength (near infrared) inter-subband optical transition in CdF2 quantum-wells on silicon substrate. In this report, room temperature electroluminescence from (CdF2/CaF2) active region is presented and discussed.

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  • Mid-infrared (~4μm) Electroluminescence from CdF2/CaF2 Intersubband transition structures grown on Si(111) substrate International conference

    H. Sano, K. Jinen, S. Kodaira, K. Uchida, M. Kumei, Y. Fujihisa, M. Watanabe, M. Asada

    15th International Conference on Nonequilibrium carrier Dynamics in Semiconductors (HCIS15), MoP-31  2007 

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  • Theoretical Analysis of Fluoride-based Intersubband Transition Laser on Si substrate

    JINEN Keisuke, UCHIDA Kaoru, KODAIRA Shinji, WATANABE Masahiro, ASADA Masahiro

    2007.2 

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  • Theoretical Analysis of Fluoride-based Intersubband Transition Laser on Si substrate

    JINEN Keisuke, UCHIDA Kaoru, KODAIRA Shinji, WATANABE Masahiro, ASADA Masahiro

    Technical report of IEICE. SDM  2007.1 

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    CdF2/CaF2 heterostructure is a good candidate for quantum-effect optical devices utilizing conduction band subbands, because the heterostructure can be grown on Si substrate epitaxially and has a large conduction band offset at the heterointerface. In this report, fluoride-based intersubband transition (ISBT) laser is analyzed and threshold current density of the laser is evaluated.

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  • Fabrication and Characterization of CdF2/CaF2 Resonant Tunneling Floating Gate Metal-oxide-semiconductor Field Effect Transistor Structures International conference

    Masahiro Watanabe, Takafumi Wada

    The 2008 International Conference on Solid State Devices and Materials (SSDM2008), H-9-3  2008.9  The Japan Society of Applied Physics

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    Venue:Tsukuba, Japan  

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  • Feasibility study of CdF2/CaF2 intersubband transition lasers

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    The 4th Pacific Rim Conference on Lasers and Electro-Optics, WC1-5, Chiba Japan.  2001 

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  • Fine-Area Epitaxy of CdF2/CaF2 Resonant Tunneling Diode on Si

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    the First International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '01 (QNN '01), TuP-29, Tsukuba, Japan  2001 

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  • ED2000-56 / SDM2000-56 Room Temperature Negative Differential Resistance of CdF2-CaF2 Resonant Tunneling Diode on Si(111)

    Watanbe Masahiro, Funayama Toshiyuki, Teraji Taishi, Sakamaki Naoto

    Technical report of IEICE. SDM  2000.6 

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    CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity of 2.9eV at the heterointerface. We have demonstrated room temperature negative differential resistance of double barrier resonant tunneling diode (DBRTD) structures and peak to valley current ratio (PVR) of more than 10^5 has been achieved using CaF2 grown by molecular beam epitaxy combined with partially ionized beam technique on Si(111) 0.07° misscut substrate.

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  • CaF2/CdF2 Resonant Tunneling Devices with High Peak-to-Valley Ratio on Silicon Substrate (Invited)

    Masahiro Watanabe, Masahiro Asada

    Frontier Science Research Conference, Science and Technology of Silicon Materials, S-II, La Jolla/CA, U.S.A.  2001 

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  • Improvement of emission current stability and lowering of emission threshold voltage using tetrahedral amorphous carbon of MIS tunneling emmitter with epitaxial CaF2 insulator layer

    Oshima K, Miyamoto Y, Saito W, Maruyama T, Watanabe M

    IEICE technical report. Electron devices  1998.12 

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    We fabricated. To get high transfer efficiency at low applied voltage by using scheme of hot electron transistors, we studied n-Si/CaF2/PtSi/Pt/ta-C MIS tunneling emitter with epitaxial CaF2 insulator layer and the termination of surface by ta-C for low work function material. At first, n-Si/CaF2/PtSi/Pt MIS tunneling emitter was fabricated. By the improvement of adhesion between CaF2 and metal layer, formation of filaments was inhibited stable emission current before and after the exposure in the air was observed. Electron emission at lower applied voltage was observed at first measurement just after formation of ta-C film on the devices, although current-voltage characteristics was similar to these without ta-C at next measurement.

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  • Visible Electroluminescence from Silicon Nanocrystals Embedded in CaF2 Epilayers on Si(111) with Rapid Thermal Anneal

    MARUYAMA Takeo, NAKAMURA Naoto, WATANABE Masahiro

    1999.9 

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  • Field-Effect Quantum Devices with Si/CdF2 Quantum-Well Structure on Si Substrate

    Saitoh W, Tsutsui M, Aoki Y, Yamazaki K, Nishiyama J, Watanabe M, Asada M

    IEICE technical report. Electron devices  1997.4 

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    We proposed and analyzed field-effect quantum devices with ultra-fine structure using metal-insulator (CoSi2, CdF2, CaF2) heterostructures, which can be grown on Si. Tunneling field-effect transistor (TFET) as a fundamental structure of field-effect quantum device was analyzed and saturation characteristics even with 5nm-long channel and cut-off frequency about 1THz were theoretically expected. We proposed and analyzed quantum device, which has TFET structure, electron coupling wave guide and gate structure for control of electron conduction. Theoretical analysis shows that this device with 40nm-gate length has multiple negative differential resistance characteristics. For realization of these devices, Si/CdF2/CaF2 heterostructures were grown on Si. Flat epitaxial growth of Si thicker than 0.9nm on CdF2 was obtained by two-temperature step growth technique.

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  • Field-Effect Quantum Devices with Si/CdF2 Quantum-Well Structure on Si Substrate

    Saitoh W, Tsutsui M, Aoki Y, Yamazaki K, Nishiyama J, Watanabe M, Asada M

    Technical report of IEICE. SDM  1997.4 

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    We proposed and analyzed field-effect quantum devices with ultra-fine structure using metal-insulator (CoSi2, CdF2, CaF2) heterostructures, which can be grown on Si. Tunneling field-effect transistor (TFET) as a fundamental structure of field-effect quantum device was analyzed and saturation characteristics even with 5nm-long channel and cut-off frequency about 1THz were theoretically expected. We proposed and analyzed quantum device, which has TFET structure, electron coupling wave guide and gate structure for control of electron conduction. Theoretical analysis shows that this device with 40nm-gate length has multiple negative differential resistance characteristics. For realization of these devices, Si/CdF2/CaF2 heterostructures were grown on Si. Flat epitaxial growth of Si thicker than 0.9nm on CdF2 was obtained by two-temperature step growth technique.

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  • ED2000-56 / SDM2000-56 Room Temperature Negative Differential Resistance of CdF2-CaF2 Resonant Tunneling Diode on Si(111)

    Watanabe Masahiro, Funayama Toshiyuki, Teraji Taishi, Sakamaki Naoto

    IEICE technical report. Electron devices  2000.6 

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    CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity of 2.9eV at the heterointerface. We have demonstrated room temperature negative differential resistance of double barrier resonant tunneling diode(DBRTD) structures and peak to valley current ratio(PVR) of more than 10^5 has been achieved using CaF2 grown by molecular beam epitaxy combined with partially ionized beam technique on Si(111)0.07° misscut substrate.

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  • Resonant Tunneling Diode on Silicon Substrate using Si-CaF2 and CdF2-CaF2 Heterostructures

    Watanabe Masahiro, TsuTsui Masafumi, Asada Masahiro

    IEICE technical report. Electron devices  2000.2 

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    Si-CaF2 and CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity of 2.9eV at the heterointerface. We have demonstrated room temperature negative differential resistance current-voltage characteristics of double barrier resonant tunneling diode(DBRTD)structures and peak to valley current ratio(PVR)of more than 10^5 has been achieved using CaF2 partially ionized beam epitaxy and molecular beam epitaxy technique.

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  • Resonant Tunneling Diode on Silicon Substrate using Si-CaF2 and CdF2-CaF2 Heterostructures

    Watanabe Masahiro, Tsutsui Masafumi, Asada Masahiro

    Technical report of IEICE. SDM  2000.2 

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    Si-CaF2 and CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity of 2.9eV at the heterointerface. We have demonstrated room temperature negative differential resistance current-voltage characteristics of double barrier resonant tunneling diode(DBRTD) structures and peak to vally current ratio(PVR) of more than 10^5 has been achieved using CaF2 partially ionized beam epitaxy and molecular beam epitaxy technique.

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  • Quantum-Effect Electron Devices Using Metal(CoSi2)/Insulator(CaF2)/Si Heterostructures

    Asada M, Watanabe M, Suemasu T, Kohno Y, Saitoh W, Mori K

    IEICE technical report. Electron devices  1996.4 

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    Metal(CoSi2)/inisulator(CaF2) nanometer-thick heterostructures are grown on a Si(111) substrate, and applied to quantum-effect electron devices. An epitaxial CoSi2 layer on CaF2 was obtained by the two-step growth technique, i.e., solid phase epitaxy with the Si layer grown in the first step and Co deposited in the second step. An epitaxial CaF2 layer was formed on CoSi2 at the low temperature of 450℃ with a partially ionized and accelerated CaF2 beam. A resonant tunneling transistor was fabricated and a transistor action including the negative differential resistance with the peak-to-valley ratio of?19 was observed at room temperature. A quantum interference transistor utilizing hot electron interference in the conduction band of an insulator sandwiched by metal layers was fabricated, and multiple negative differential resistance was observed at room temperature, which may be attributed to the interference. Finally, as a fundamental device for field-effect quantum devices which are advantageous for circuit design due to high impedance, a short channel tunneling transistor with CoSi2/CaF2/CdF2/Si heterostructure was proposed and analyzed.

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  • Quantum-Effect Devices Using Metal/Insulator Heterostructures on Silicon Substrate

    Asada Masahiro, Watanabe Masahiro, Saitoh Wataru, Mori Kaoru, Kohno Yosifumi

    Proceedings of the Society Conference of IEICE  1996.9 

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  • Analysis of Metal(CoSi2)/Insulator(CaF2)Resonant Tunneling Hot Electron Transistor Using Eqivalent Circuit

    Saitoh W, Suemasu T, Kohno Y, Watanabe M, Asada M

    1994.9 

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  • Near-infrared Electroluminescence from Multilayered CdF2/CaF2 Quantum Heterostructure Grown on Trench-Patterned Si(111) Substrate

    3rd IEEE International Conference of GroupIV Photonics, P29  2006 

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  • Negative Differential Resistance of CoSi2/CaF2 Triple Barrier Resonant Tunneling Diode Grown by Local Epitaxy

    WATANABE Masahiro, TAMURA Shinpei, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    IEICE technical report. Electron devices  2005.1 

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    (Metal)CoSi2/(Insulator)CaF2 triple barrier resonant tunneling diode structures were grown on Si(111) substrate using Local Epitaxy technique. The heterostructures were grown in holes with diameter of 40nm fabricated by electron beam lithography. In the measurement of I-V characteristics, clear negative differential resistance characteristics were observed at room temperature with peak to valley current ratio (PVR) of 33, which was significantly larger than that of RTDs grown by conventional MEB.

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  • Negative Differential Resistance of CoSi2/CaF2 Triple Barrier Resonant Tunneling Diode Grown by Local Epitaxy

    WATANABE Masahiro, TAMURA Shinpei, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    Technical report of IEICE. SDM  2005.1 

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    (Metal)CoSi2/(Insulator)CaF2 triple barrier resonant tunneling diode structures were grown on Si(111) substrate using Local Epitaxy technique. The heterostructures were grown in holes with diameter of 40nm fabricated by electron beam lithography. In the measurement of I-V characteristics, clear negative differential resistance characteristics were observed at room temperature with peak to valley current ratio (PVR) of 33, which was significantly larger than that of RTDs grown by conventional MEB.

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  • Room temperature electroluminescence of CdF2/CaF2 intersubband transition laser structures grown on Si substrate

    2005 International conference on Solid State Devices and Materials (SSDM2005),G-4-3  2005 

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  • Optically pumped ultraviolet lasing of BeMgZnSe based quantum well laser structures

    12th International Conference on II-VI Compounds  2005 

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode Grown on Si(100) Substrate

    WATANABE Masahiro, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    Technical report of IEICE. SDM  2004.1 

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    Room temperature negative differential resistance of CdF2/CaF2 double barrier resonant tunneling diode grown on Si(100) substrate has been demonstrated. Crystal growth was carried out using Si(100) substrate with miscut angle of 2°toward <-1,-1,2> in order to control atomic steps on the substrate. CdF2 quantum well layer thickness dependence was also discussed.

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  • Optically pumped ultraviolet lasing of BeMgZnSe based quantum well laser structures

    12th International Conference on II-VI Compounds  2005 

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  • High peak-to-valley current ratio of CdF2/CaF2 resonant tunneling diode grown on Si(100) substrates,

    2005 International conference on Solid State Devices and Materials (SSDM2005),G-1-7  2005 

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  • High peak-to-valley current ratio of CdF2/CaF2 resonant tunneling diode grown on Si(100) substrates,

    2005 International conference on Solid State Devices and Materials (SSDM2005),G-1-7  2005 

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  • Room temperature electroluminescence of CdF2/CaF2 intersubband transition laser structures grown on Si substrate

    2005 International conference on Solid State Devices and Materials (SSDM2005),G-4-3  2005 

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  • Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode Grown on Si(100) Substrate,

    2004 Silicon Nanoelectronics Workshop  2004 

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode Grown on Si(100) Substrate

    WATANABE Masahiro, KANAZAWA Tohru, JINEN Keisuke, ASADA Masahiro

    IEICE technical report. Electron devices  2004.1 

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    Room temperature negative differential resistance of CdF2/CaF2 double barrier resonant tunneling diode grown on Si(100) substrate has been demonstrated. Crystal growth was carried out using Si(100) substrate with miscut angle of 2C toward <-l,-l,2> in order to control atomic steps on the substrate. CdF2 quantum well layer thickness dependence was alsc discussed.

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  • Structure Dependence of Negative Differential Resistance Characteristics of CdF2/CaF2 Resonant Tunneling Diode Grown by Nano-area Local Epitaxy

    WATANABE Masahiro, MATSUDA Masaki, FUJIOKA Hirotoshi, KANAZAWA Tohru, ASADA Masahiro

    Technical report of IEICE. SDM  2003.2 

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    Quantum well layer thickness dependence of negative differential characteristics of CdF2/CaF2 double and triple barrier resonant tunneling diode structure has been demonstrated for the first time. Crystal growth was carried out using Local Epitaxy in limited region with sub-micrometer diameter, which is promising strategy for quantum effect devices at silicon substrate.

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  • Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode Grown on Si(100) Substrate,

    2004 Silicon Nanoelectronics Workshop  2004 

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  • Memory Effect of CdF2/CaF2 Resonant Tunneling Diode grown on p-type Silicon Substrate

    The 11th International Conference on Modulated Semiconductor Structures -MSS11-  2003 

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  • Structure Dependence of Negative Differential Resistance Characteristics of CdF2/CaF2 Resonant Tunneling Diode grown by Local Epitaxy on Silicon International conference

    Masahiro Watanabe, Masaki Matsuda Hirotoshi, Fujioka Tohru Kanazawa, Masahiro Asada

    2003 Silicon Nanoelectronics Workshop, 8-07  2003 

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  • Structure Dependence of Negative Differential Resistance Characteristics of CdF2/CaF2 Resonant Tunneling Diode grown by Local Epitaxy on Silicon

    Masahiro Watanabe, Masaki Matsuda Hirotoshi, Fujioka Tohru Kanazawa, Masahiro Asada

    2003 Silicon Nanoelectronics Workshop, 8-07  2003 

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  • Structure Dependence of Negative Differential Resistance Characteristics of CdF2/CaF2 Resonant Tunneling Diode Grown by Nano-area Local Epitaxy

    WATANABE Masahiro, MATSUDA Masaki, FUJIOKA Hirotoshi, KANAZAWA Tohru, ASADA Masahiro

    IEICE technical report. Electron devices  2003.2 

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    Quantum well layer thickness dependence of negative differential characteristics of CdF2/CaF2 double and triple barrier resonant tunneling diode structure has been demonstrated for the first time. Crystal growth was carried out using Local Epitaxy in limited region with sub-micrometer diameter, which is promising strategy for quantum effect devices at silicon substrate.

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  • Memory Effect of CdF2/CaF2 Resonant Tunneling Diode grown on p-type Silicon Substrate

    The 11th International Conference on Modulated Semiconductor Structures -MSS11-  2003 

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  • Crystal Growth of High-Mg-Content BeMgZnSe Lattice Matched to GaP(001) Substrate Using BeZnSe Buffer Layer

    Y. Niiyama, T. Yokoyama, M. Watanabe

    First Asia-Pacific Workshop on Widegap Semiconductors, P118  2003 

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode grown on Si using Nanoarea Local Epitaxy

    Masahiro Watanabe, Tatsuya Ishikawa, Masaki Matsuda Tohru Kanazawa, Masahiro Asada

    26th International Conference on the Physics of Semiconductors, P157  2002 

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  • CdF2/CaF2 Resonant Tunneling Diode Grown on Si(111) and Si(100) Substrate using Nano-area Epitaxy

    WATANABE Masahiro, ISHIKAWA Tatsuya, Matsuda Masaki, Kanazawa Tohru, ASADA Masahiro

    IEICE technical report. Electron devices  2002.1 

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    CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity (?2.9eV) at the heterointerface. We have studied crystal growth technique and current-voltage characteristics of CdF2-CaF2 double barrier resonant tunneling diode (DBRTD) structures grown by using nano-area (?100nm) epitaxy with partially ionized beam and molecular beam epitaxy technique on Si(111) and Si(100) substrate. Room temperature negative differential resistance of submicron-size CdF2/CaF2DBRTD grown on Si(100) substrate has been demonstrated for the first time.

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode grown on Si(100) substrate using Nanoarea Local Epitaxy

    Masahiro Watanabe, Tatsuya Ishikawa, Masaki Matsuda Tohru Kanazawa, Masahiro Asada

    44th 2002 Electronic Materials Conference, Z5  2002 

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  • Systematic variation of negative differential resistance characteristics of CdF2/CaF2 Resonant Tunneling Diode on Si(111) grown by Nanoarea Local Epitaxy

    Masahiro Watanabe, Tatsuya, Ishikawa Masahiro, Matsuda Tohru Kanazawa, Masahiro Asada

    The Second International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '02 (QNN '02), Tu4-3  2002 

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  • CdF2/CaF2 Resonant Tunneling Diode Grown on Si(111) and Si(100) Substrate using Nano-area Epitaxy

    WATANABE Masahiro, ISHIKAWA Tatsuya, Matsuda Masaki, Kanazawa Tohru, ASADA Masahiro

    Technical report of IEICE. SDM  2002.1 

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    CdF2-CaF2 heterostructures are attractive materials for quantum devices on silicon substrate because of large conduction band discontinuity (?2.9eV) at the heterointerface. We have studied crystal growth technique and current-voltage characteristics of CdF2-CaF2 double barrier resonant tunneling diode (DBRTD) structures grown by using nano-area (?100nm) epitaxy with partially ionized beam and molecular beam epitaxy technique on Si(111) and Si(100) substrate. Room temperature negative differential resistance of submicron-siza CdF2/CaF2 DBRTD grown on Si(100) substrate has been demonstrated for the first time.

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  • Epitaxial growth of BeZnSe on CaF2/Si(111) substrate

    Takeo Maruyama, Naoto Nakamura, Masahiro Watanabe

    43rd 2001 Electronic Materials Conference, Y3, Notre Dame, U.S.A.  2001 

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  • Systematic variation of negative differential resistance characteristics of CdF2/CaF2 Resonant Tunneling Diode on Si(111) grown by Nanoarea Local Epitaxy

    Masahiro Watanabe, Tatsuya, Ishikawa Masahiro, Matsuda Tohru Kanazawa, Masahiro Asada

    The Second International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '02 (QNN '02), Tu4-3  2002 

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  • Room Temperature Negative Differential Resistance of CdF2/CaF2 Resonant Tunneling Diode grown on Si using Nanoarea Local Epitaxy

    Masahiro Watanabe, Tatsuya Ishikawa, Masaki Matsuda Tohru Kanazawa, Masahiro Asada

    26th International Conference on the Physics of Semiconductors, P157  2002 

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  • Selective growth of CdF2/CaF2 resonant tunneling diode nanostructure on Si

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa, Daisuke Okamoto

    43rd 2001 Electronic Materials Conference, Y4, Notre Dame, U.S.A.  2001 

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  • Room Temperature Negative Differential Resistance with High Peak-to-Valley Crrent Ratio of CdF2/CaF2 Resonant Tunneling Diode on Silicon

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    Thirteenth International Conference on Indiumu Phosphide and Related Materials (IPRM'01), WP-30, Nara, Japan  2001 

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  • Room Temperature Negative Differential Resistance with High Peak-to-Valley Crrent Ratio of CdF2/CaF2 Resonant Tunneling Diode on Silicon

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    Thirteenth International Conference on Indiumu Phosphide and Related Materials (IPRM'01), WP-30, Nara, Japan  2001 

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  • CaF2/CdF2 Resonant Tunneling Devices with High Peak-to-Valley Ratio on Silicon Substrate (Invited) Invited

    Masahiro Watanabe, Masahiro Asada

    Frontier Science Research Conference, Science and Technology of Silicon Materials, S-II, La Jolla/CA, U.S.A.  2001 

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  • Epitaxial growth of BeZnSe on CaF2/Si(111) substrate

    Takeo Maruyama, Naoto Nakamura, Masahiro Watanabe

    43rd 2001 Electronic Materials Conference, Y3, Notre Dame, U.S.A.  2001 

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  • Selective growth of CdF2/CaF2 resonant tunneling diode nanostructure on Si

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa, Daisuke Okamoto

    43rd 2001 Electronic Materials Conference, Y4, Notre Dame, U.S.A.  2001 

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  • Feasibility study of CdF2/CaF2 intersubband transition lasers

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    The 4th Pacific Rim Conference on Lasers and Electro-Optics, WC1-5, Chiba Japan.  2001 

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  • Fine-Area Epitaxy of CdF2/CaF2 Resonant Tunneling Diode on Si

    Masahiro Watanabe, Naoto, Sakamaki, Tatsuya Ishikawa

    the First International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '01 (QNN '01), TuP-29, Tsukuba, Japan  2001 

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  • I-V characteristics of CdF2/CaF2 resonant tunneling diodes on Si(100) substrate by nano-area local growth method

    Tohru Kanazawa, Ryo Fujii, Takashi Wada, Yusuke Suzuki, Masahiro Watanabe, Masahiro Asada

    The 67th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-RE-14  2006.8  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Theoretical Analysis of Intersubband Transition Time in (CdF2/CaF2) Quantum Well Structure

    Keisuke Jinen, Kaoru Uchida, Shinji Kodaira, Masaya Kumei, Hiroshi Sano, Masahiro Watanabe, Masahiro Asada

    The 67th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-RE-17  2006.8  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Mid-infrared (~4μm) Electroluminescence from CdF2/CaF2 Quantum Heterostructure grown on Si(111) substrate

    Hiroshi Sano, Keisuke Jinen, Kaoru Uchida, Shinji Kodaira, Masaya Kumei, Yuuki Fujihisa, Masahiro Watanabe, Masahiro Asada

    The 54th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29p-T-19  2007.3  The Japan Society of Applied Physics

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    Venue:Sagamihara   Country:Japan  

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  • Reduction of Leakage Current using Nano-area Local Epitaxy for CdF2/CaF2 Intersubband Transition Lasers on Si Substrate

    Yuuki Fujihisa, Masaya Kumei, Shunsuke Kajiura, Yusuke Sasaki, Masahiro Watanabe, Masahiro Asada

    The 68th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 5a-N-5  2007.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • Fabrication of Three-Terminal Integrated Devices using CdF2/CaF2 Resonant Tunneling Gate Structure

    Takashi Wada, Yusuke Suzuki, Ryo Hirasawa, Masahiro Watanabe

    The 55th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30p-E-2  2008.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Characterization of resistance switching devices using silicon / fluoride resonant tunneling structures

    Ryo Hirasawa, Yukou Nakasyouji, Masahiro Watanabe

    The 56th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30a-ZB-5  2009.3  The Japan Society of Applied Physics

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    Venue:Tsukuba   Country:Japan  

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  • Photocurrent measurement of epitaxial CaF2/Si quantum-dot structures

    Hiroshi Oogi, Masahiro Watanabe

    The 57th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 20a-TG-10  2010.3  The Japan Society of Applied Physics

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    Venue:Shonan   Country:Japan  

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  • Switching voltage reduction of resistance switching devices using silicon / fluoride resonant tunneling structures

    Yukou Nakashouji, Kazuya Tsuchiya, Masahiro Watanabe

    The 71st Autumn Meeting of The Jpn. Soc. of Appl. Phys, 16a-NC-1  2010.9  The Japan Society of Applied Physics

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    Venue:Nagasaki   Country:Japan  

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  • EL Characteristics of CdF2/CaF2 quantum heterostructures on Si substrate

    Keisuke Jinen, Takeshi Kikuchi, Masahiro Watanabe, Masahiro Asada

    The 66th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 9a-W-6  2005.9  The Japan Society of Applied Physics

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    Venue:Tokushima   Country:Japan  

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  • Growth temperature dependence of CaF2/CdF2/CaF2 quantum-well structures on Si(100) substrate

    Tohru Kanazawa, Atsushi Morosawa, Ryo Fujii, Takashi Wada, Masahiro Watanabe, Masahiro Asada

    The 66th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 9a-W-5  2005.9  The Japan Society of Applied Physics

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    Venue:Tokushima   Country:Japan  

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  • Atomic Step Control of Si Substrate Surface for Fluoride Based Intersubband Transition Lasers

    Shinji Kodaira, Keisuke Jinen, Kaoru Uchida, Masaya Kumei, Hiroshi Sano, Masahiro Watanabe, Masahiro Asada

    The 67th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-RE-15  2006.8  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Fabrication of Plasmon Waveguide with SOI structure for Fluoride-Based Intersubband Transition Lasers

    Kaoru Uchida, Keisuke Jinen, Shinji Kodaira, Masaya Kumei, Hiroshi Sano, Masahiro Watanabe, Masahiro Asada

    The 67th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-RE-16  2006.8  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Measurement of refractive index of BeMgZnSe using spectroscopic ellipsometry

    Yuuki Niiyama, Takayuki Murata, Masahiro Watanabe

    The 65th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 2a-ZQ-10  2004.9  The Japan Society of Applied Physics

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    Venue:Sendai   Country:Japan  

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  • Room temperature shortest wavelength (λ=329nm) photoluminescence of BeMgZnSe

    Takayuki Murata, Yuuki Niiyama, Masahiro Watanabe

    The 65th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 2a-ZQ-9  2004.9  The Japan Society of Applied Physics

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    Venue:Sendai   Country:Japan  

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  • Theoretical analysis of BeMgZnSe ultraviolet quantum well laser – cladding layer Mg content dependence of threshold current density –

    Yuuki Niiyama, Takeshi Yokoyama, Takayuki Murata, Takeo Maruyama, Masahiro Watanabe

    The 64th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-B-13  2003.8  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Temperature dependence of photoluminescence energy of BeMgZnSe

    Yuuki Niiyama, Takeshi Yokoyama, Takayuki Murata, Masahiro Watanabe

    The 64th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-B-12  2003.8  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Surface morphologies of BeZnSe grown by migration enhanced epitaxy on GaP(001) substrate

    Takeshi Yokoyama, Yuuki Niiyama, Masahiro Watanabe

    The 64th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-B-11  2003.8  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Structure dependence of negative differential resistance characteristics of CdF2/CaF2 resonant tunneling diode on Si(100) substrate

    Tohru Kanazawa, Masami Matsuda, Masahiro Watanabe, Masahiro Asada

    The 64th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 30p-ZF-14  2003.8  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Improvement of luminescence properties of BeZnSe-MBE on MEE buffer layer

    Takeshi Yokoyama, Yuuki Niiyama, Takayuki Murata, Masahiro Watanabe

    The 51st Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29p-P12-13  2004.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Design and production of BeMgZnSe based waveguide structures for optically pumping

    Yuuki Niiyama, Takeshi Yokoyama, Takayuki Murata, Masahiro Watanabe

    The 51st Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29p-P12-12  2004.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Content dependence of interband transition process in BeMgZnSe

    Yuuki Niiyama, Takeshi Yokoyama, Takeo Maruyama, Masahiro Watanabe

    The 50th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 29p-X-2  2003.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Crystal growth of high Mg-content BeMgZnSe on GaP(001) substrate

    Takeshi Yokoyama, Yuuki Niiyama, Masahiro Watanabe

    The 50th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 29p-X-1  2003.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication and characterization of CdF2/CaF2 resonant tunneling diode on double step Si(100) 2°off substrate

    Tohru Kanazawa, Masami Matsuda, Masahiro Watanabe, Masahiro Asada

    The 50th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 29a-ZE-3  2003.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Memory effect due to charge and discharge of CdF2/CaF2 resonant tunneling diode

    Masami Matsuda, Tohru Kanazawa, Masahiro Watanabe, Masahiro Asada

    The 50th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 29a-ZE-5  2003.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Epitaxial growth of BeMgZnSe on GaP(001)

    Naoto Nakamura, Takeo Maruyama, Yuki Niiyama, Masahiro Watanabe

    The 62nd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 11a-P1-3  2001.9  The Japan Society of Applied Physics

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    Venue:Aichi   Country:Japan  

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  • UV photoluminescence from BeZnSe grown on GaP (001) substratre at room temperature

    Takeo Maruyama, Naoto Nakamura, Yuuki Niiyama, Masahiro Watanabe

    The 62nd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 11a-P1-2  2001.9  The Japan Society of Applied Physics

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    Venue:Aichi   Country:Japan  

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  • Fabrication and characterization of CdF2/CaF2 resonant tunneling diode on Si(100) substrate

    Masami Matsuda, Tatsuya Ishikawa, Tohru Kanazawa, Masahiro Watanabe, Masahiro Asada

    The 49th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 27p-YH-3  2002.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication of vertical MOSFET integrated with resonant tunneling diode

    Hirotomo Fujioka, Masafumi Tsutsui, Tatsuya Ishikawa, Masahiro Watanabe, Masahiro Asada

    The 49th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 30a-H-8  2002.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Quantum-well thickness dependence of NDR characteristics of CdF2/CaF2 resonant tunneling diode

    Masami Matsuda, Tohru Kanazawa, Masahiro Watanabe, Masahiro Asada

    The 63rd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 25p-P9-11  2002.9  The Japan Society of Applied Physics

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    Venue:Niigata   Country:Japan  

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  • UV-Photoluminescence of BeMgZnSe-BeZnSe DH structure on GaP(100) substrate

    Yuuki Niiyama, Takeo Maruyama, Masahiro Watanabe

    The 63rd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 26p-YE-7  2002.9  The Japan Society of Applied Physics

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    Venue:Niigata   Country:Japan  

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  • Analysis of CaF2 Based Heterostructure Intersubband Transition Lasers on SOI

    Keisuke Jinen, Masahiro Watanabe, Masahiro Asada

    The 50th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 28p-ZE-4  2003.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication and characterization of CdF2/CaF2 resonant tunneling diode by selective area growth

    Tatsuya Ishikawa, Naoto Sakamaki, Daisike Okamoto, Masahiro Watanabe

    The 48th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 29a-YD-2  2001.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Inpurity control of eptaxial ZnO thin films grown on CaF2/Si(111) by N, Ga codoping

    Shunichi Okano, Mitsunori Suzuki, Masahiro Watanabe

    The 48th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 31a-YL-3  2001.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Oxygen ambient annealing of ZnO thin films on CaF2/Si substrate

    Mitsunori Suzuki, Shunichi Okano, Masahiro Watanabe

    The 48th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 31a-YL-2  2001.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Analysis of Si/CaF2 intersubband transition lasers

    Katsunori Osada, Yuichi Aoki, Mika Tsuganezawa, Masahiro Watanabe

    The 45th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30p-R-4  1998.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Ion beam epitaxial growth of CaF2 on Si(111) 1degree substrate with controlled terrace-width

    Yoshifumi Iketani, Masahiro Watanabe, Masahiro Asada

    The 60th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 1p-T-4  1999.9  The Japan Society of Applied Physics

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    Venue:Kobe   Country:Japan  

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  • Fabrication and characteristics of resonant tunneling diodes with Si/CaF2 heterostructures

    Masafumi Tsutsui, Masahiro Watanabe, Masahiro Asada

    The 60th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 2p-ZL-9  1999.9  The Japan Society of Applied Physics

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    Venue:Kobe   Country:Japan  

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  • EL spectra from nano-crystalline Si embedded in CaF2/Si(111) thin film

    Naoto Nakamura, Takeo Maruyama, Masahiro Watanabe

    The 60th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 3p-ZN-15  1999.9  The Japan Society of Applied Physics

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    Venue:Kobe   Country:Japan  

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  • Fabrication and characterization of Si/CaF2 double barrier resonant tunneling diode on Si(111) 1°off substrate

    Yoshifumi Iketani, Masahiro Watanabe, Masahiro Asada

    The 47th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 30a-YD-8  2000.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Room temperature negative differential resistance of CdF2/CaF2 resonant tunneling diode

    Toshiyuki Funayama, Taishi Teraji, Masahiro Watanabe

    The 47th Spring Meeting of The Jpn. Soc. of Appl. Phys. and Related Societies, 30a-YD-7  2000.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • UV photoluminescence from ZnO/CaF2 heteroepitaxial structure on Si(111) substrate

    Mitsunori Suzuki, Shunichi Okano, Masahiro Watanabe

    The 61st Autumn Meeting of The Jpn. Soc. of Appl. Phys., 3p-ZK-1  2000.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • Crystal growth of BeSe on CaF2/Si(111) substrate

    Takeo Maruyama, Naoto Nakamura, Masahiro Watanabe

    The 61st Autumn Meeting of The Jpn. Soc. of Appl. Phys., 4p-Z-8  2000.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • Room temperature negative differential resistance of CdF2/CaF2 resonant tunneling diode

    Naoto Sakamaki, Masahiro Watanabe

    The 61st Autumn Meeting of The Jpn. Soc. of Appl. Phys., 6a-ZR-9  2000.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • RTA ambient dependence of PL spectra from nano-crystalline Si embedded in CaF2/Si(111) thin film

    Takeo Maruyama, Naoto Nakamura, Masahiro Watanabe

    The 59th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 16a-ZE-8  1998.9  The Japan Society of Applied Physics

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    Venue:Hiroshima   Country:Japan  

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  • UV electroluminescence from CaF2/ZnO/CaF2 heteroepitaxial structure on Si(111) substrate

    Shunichi Okano, Yasuhisa Maeda, Masahiro Watanabe

    The 46th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 28a-ZA-9  1999.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Relation of Resistance of Ultra Thin CoSi2 Films on CaF2 and Crystal Quality of CaF2

    Wataru Saitoh, Kaoru Mori, Hidekazu Sugiura, Takeo Maruyama, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 8p-ZE-17  1996.9  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Electroluminescence spectra from nano-crystalline Si embedded in CaF2

    Takeshi Matsunuma, Takeo Maruyama, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 8p-V-15  1996.9  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Reduction of the Size Fluctuation of Quantum-Wire Structures Fabricated by Proximity Effect Correction

    X. Y. Jia, Takashi Kojima, Yoshinori Hayafune, Shigehisa Tamura, Masahiro Watanabe, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29a-X-4  1997.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Epitaxial Growth of Si/CdF2/CaF2 Heterostructures on Si Substrate

    Wataru Saitoh, Yuichi Aoki, Jun Nishiyama, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30a-A-3  1997.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Fabrication of nano-structure ZnO on CaF2/Si(111) and its photoluminescence spectra

    Atsushi Yamada, Yasuhisa Maeda, Masahiro Watanabe

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 3a-ZH-9  1997.10  The Japan Society of Applied Physics

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    Venue:Akita   Country:Japan  

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  • Epitaxial growth of CaF2 on low-off angle Si(111) substrate using ion assisted epitaxy

    Masahiro Watanabe, Yoshifumi Iketani, Hidekazu Sugiura, Kazuhito Yoshida

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 4p-V-16  1997.10  The Japan Society of Applied Physics

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    Venue:Akita   Country:Japan  

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  • Epitaxial growth of nanometer-thick CaF2/CdF2 superlattice using partially ionized beam epitaxy

    Yuichi Aoki, Wataru Saitoh, Jun Nishiyama, Masahiro Watanabe

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 5a-ZF-2  1997.10  The Japan Society of Applied Physics

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    Venue:Akita   Country:Japan  

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  • Negative Differential Resistance of the Triple-barrier RTD using Epitaxial CaF2/CdF2 Superlattice

    Yuichi Aoki, Mika Tsuganezawa, Wataru Saitoh, Masahiro Watanabe

    The 45th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 28a-R-2  1998.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Growth condition dependence of photoluminescence spectra from nano-cryatalline Si embedded in CaF2/Si(111) thin film

    Takeo Maruyama, Sotaro Ikeda, Masahiro Watanabe

    The 45th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29a-p-8  1998.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Electroluminescence spectra from ZnO nano-structure on CaF2/Si(111)

    Yasuhisa Maeda, Atsushi Yamada, Masahiro Watanabe

    The 45th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29a-S-2  1998.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Analysis of CaF2/CdF2 Intersubband Transition Lasers

    Yuichi Aoki, Jun Nishiyama, Wataru Saitoh, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 28a-ZA-6  1997.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Fabrication of metal(CoSi2)/insulator(CaF2) resonant tunneling hot electron transistor (II)

    Takashi Suemasu, Yoshifumi Kohno, Wataru Saitoh, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 19p-T-9  1994.9  The Japan Society of Applied Physics

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    Venue:Nagoya   Country:Japan  

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  • Analysis of resistance switching characteristics of CaF2/Si/CaF2 quantum-well structures

    Takumi Kaneko, Yoshiro Kumagai, Koudai Hirose, Hiroki Tonegawa, Kizashi Mikami, Kanta Tomizawa, Honami Sato, Masahiro Watanabe

    The 67th The Japan Society of Applied Physics Spring Meeting, 13a-PA5-8  2020.3  The Japan Society of Applied Physics

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    Venue:Sophia University, Tokyo   Country:Japan  

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  • Formation of metal Co fine particles on CaF2/Si(111)

    Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 20p-MF-14  1994.9  The Japan Society of Applied Physics

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    Venue:Nagoya   Country:Japan  

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  • Room Temperature Negative Differential Resistance of Si/CaF2 p-type Triple-barrier Resonant Tunneling Diodes

    Honami Sato, Yoshiro Kumagai, Kizashi Mikami, Hiroki Tonegawa, Koudai Hirose, Kanta Tomizawa, Takumi Kaneko, Masahiro Watanabe

    The 67th The Japan Society of Applied Physics Spring Meeting, 13a-PA5-7  2020.3  The Japan Society of Applied Physics

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    Venue:Sophia University, Tokyo   Country:Japan  

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  • Photoluminescence spectra of CaF2/Si(111) thin film including Si fine particles

    Masahiro Watanabe, Fumitaka Iizuka, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29a-H-10  1995.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication and room temperature operation of Metal(CoSi2)/ Insulator(CaF2) nanometer-thick small-area hot electron transistor

    Wataru Saitoh, Takashi Suemasu, Yoshifumi Kohno, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-ZK-7  1995.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Room Temperature Negative Differential Resistance of Si/CaF2 p-type Triple-barrier Resonant Tunneling Diodes

    Honami Sato, Yoshiro Kumagai, Kanta Tomizawa, Takumi Kaneko, Masahiro Watanabe

    The 68th The Japan Society of Applied Physics Spring Meeting, 18p-Z23-7  2021.3  The Japan Society of Applied Physics

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    Venue:Online   Country:Japan  

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  • Reduction of operating voltage in Metal(CoSi2)/ Insulator(CaF2) RHET

    Takashi Suemasu, Yoshifumi Kohno, Wataru Saitoh, Kaoru Mori, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-ZK-6  1995.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Design and fabrication of distributed feedback waveguide using Si/CaF2 heterostructures

    Kenta Kitamura, Gensai Tei, Long Liu, Yohei Koyanagi, Daiki Sugawara, Masahiro Watanabe

    The 82nd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 23a-P11-16  2021.9  The Japan Society of Applied Physics

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    Venue:Online   Country:Japan  

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  • Nanometer crystalline Si embedded in CaF2/Si(111) thin film

    Masahiro Watanabe, Masahiro Asada, Takeshi Matsunuma

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 26p-ZD-11  1995.9  The Japan Society of Applied Physics

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    Venue:Kanazawa   Country:Japan  

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  • Evaluation of valence band difference (∆EV) at Si/CaF2 interface using p-type single barrier tunneling diodes

    Daiki Sugawara, Long Liu, Gensai Tei, Yohei Koyanagi, Kenta Kitamura, Masahiro Watanabe

    The 82nd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 23a-P11-18  2021.9  The Japan Society of Applied Physics

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    Venue:Online   Country:Japan  

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  • Fabrication and Room Temperature Characterisitics of Small Area Metal (CoSi2)/ Insulator (CaF2) QIT

    Kaoru Mori, Wataru Saitoh, Takashi Suemasu, Yoshifumi Kohno, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 28p-ZM-9  1995.9  The Japan Society of Applied Physics

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    Venue:Kanazawa   Country:Japan  

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  • Evaluation of valence band difference (∆EV) at Si/CaF2 interface usingp-type single barrier tunneling diodes and double barrier resonant tunneling diodes

    Daiki Sugawara, Liu Long, Gensai Tei, Yohei Koyanagi, Kenta Kitamura, Masahiro Watanabe

    The 69th The Japan Society of Applied Physics Spring Meeting, 22p-P02-1  2022.3  The Japan Society of Applied Physics

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    Venue:Aoyama Gakuin University, Sagamihara, Hybrid   Country:Japan  

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  • Seventy nm pitch CaF2 inorganic resist pattern by electron beam exposure

    Tetsuya Hattori, HiroHongo, Yasuyuki Miyamoto, Takeshi Matsunuma, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 26a-SZW-27  1996.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Effect of As irradiation on the surface roughness of Si thin films grown on CaF2

    Masataka Saito, Gensai Tei, Liu Long, Yohei Koyanagi Daiki Sugawara, Masahiro Watanabe

    The 69th The Japan Society of Applied Physics Spring Meeting, 24p-E103-9  2022.3  The Japan Society of Applied Physics

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    Venue:Aoyama Gakuin University, Sagamihara, Hybrid   Country:Japan  

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  • Growth condition dependence of electroluminescence from nanometer crystalline Si embedded in CaF2

    Takeshi Matsunuma, Takeo Maruyama, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 26a-ZF-5  1996.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Room temperature negative differential resistance of Si/CaF2 double-barrier resonant tunneling diodes grown by surfactant epitaxy

    Yusuke Suzuki, Akinori Ito, Masataka Saito, Maiko Hoshino, Ryoya Usami, Kanta Murakami, Masahiro Watanabe

    The 83rd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 22p-P14-2  2022.9  The Japan Society of Applied Physics

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    Venue:Tohoku University, Miyagi, online  

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  • Theoretical Analysis of Metal/Insulator Field Effect Tunneling Transistor

    Wataru Saitoh, Katsuyuki Yamazaki, Masahiro Asada, Masahiro Watanabe

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 26a-W-6  1996.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Leakage current reduction of Si/CaF2 p-type Resonant Tunneling Diode using embedded structure in CaF2

    Akinori Ito, Yusuke Suzuki, Maiko Hoshino, Ryoya Usami, Kanta Murakami, Masahiro Watanabe

    The 83rd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 22p-P14-1  2022.9  The Japan Society of Applied Physics

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    Venue:Tohoku University, Miyagi, online   Country:Japan  

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  • Transfer Efficiency of Hot Electrons from NDR Characteristics of a Quantum Interference Transistor

    Takashi Suemasu, Wataru Saitoh, Kaoru Mori, Yoshifumi Kohno, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 28p-W-11  1996.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Aanalysis of 1.6 µm wavelength quantum cascade lasers using Si/CaF2 heterostructures

    Gensai Tei, Long Liu, Masataka Saito, Koyo Matsuura, Yuta Sugiyama, Masahiro Watanabe

    The 83rd Autumn Meeting of The Jpn. Soc. of Appl. Phys., 22p-P05-1  2022.9  The Japan Society of Applied Physics

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    Venue:Tohoku University, Miyagi, online   Country:Japan  

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  • Analysis of near-infrared wavelength quantum cascade laser using CaF2/Si heterostructures

    Youhei Koyanagi, Gensai Tei, Liu Long, Masahiro Watanabe

    The 81st Autumn Meeting of The Jpn. Soc. of Appl. Phys., 9a-Z04-3  2020.9  The Japan Society of Applied Physics

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    Venue:Online   Country:Japan  

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  • Preparation of Metal (CoSi2)/ Insulator (CaF2) resonant tunneling hot electron transistor

    Nobuhiro Suzuki, Yoshifumi Kohno, Takashi Suemasu, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 1a-D-3  1993.4  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Room Temperature Negative Differential Resistance of Si/CaF2 Double-barrier Resonant Tunneling Diodes

    Koudai Hirose, Satoshi Fukuyama, Yoshiro Kumagai, Hiroki Tonegawa, Masahiro Watanabe

    The 79th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 21p-PB4-3  2018.9  The Japan Society of Applied Physics

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    Venue:Nagoya, Aichi   Country:Japan  

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  • Control of the applied voltage of NDR in Metal (CoSi2)/ Insulator (CaF2) resonant tunneling diode

    Takashi Suemasu, Masahiro Watanabe, Jun Suzuki, Masahiro Asada, Nobuhiro Suzuki

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 1a-D-2  1993.4  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Evaluation of current-voltage characteristics of single barrier tunneling diode using atomically-thin CaF2/Si heterostructure

    Satoshi Fukuyama, Masahiro Watanabe

    The 79th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 21p-PB4-4  2018.9  The Japan Society of Applied Physics

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    Venue:Nagoya, Aichi   Country:Japan  

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  • STM observation of Si/CaF2/Si(111) cross section

    Takashi Suemasu, Daishi Sonoda, Masahiro Watanabe, Masahiro Asada, Kazuhito Furuya

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-ZX-7  1993.9  The Japan Society of Applied Physics

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    Venue:Hokkaido   Country:Japan  

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  • Room temperature negative differential resistance of CaF2/Si/CaF2 resonant-tunneling structures fabricated by dry etching

    Yoshiro Kumagai, Soichiro Ohno, Koudai Hirose, Satoshi Fukuyama, Hiroki Tonegawa, Masahiro Watanabe

    The 79th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 21p-PB4-5  2018.9  The Japan Society of Applied Physics

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    Venue:Nagoya, Aichi   Country:Japan  

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  • Fabrication of Metal (CoSi2)/ Insulator (CaF2) fine structure hot electron transistor

    Nobuhiro Suzuki, Takashi Suemasu, Masahiro Watanabe, Masahiro Asada, Yoshifumi Kohno

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-ZX-6  1993.9  The Japan Society of Applied Physics

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    Venue:Hokkaido   Country:Japan  

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  • Theoretical analysis of multiple-barrier silicon/fluoride heterostructure resonant tunneling diodes with metal emitter

    Kensuke Ichikawa, Hiroki Tonegawa, Koudai Hirose, Kizashi Mikami, Satoshi Fukuyama, Masahiro Watanabe

    The 66th The Japan Society of Applied Physics Spring Meeting, 10p-PA4-6  2019.3  The Japan Society of Applied Physics

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    Venue:Titech, Tokyo   Country:Japan  

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  • Metal (CoSi2)/ Insulator (CaF2) resonant tunneling transistor

    Takashi Suemasu, Yoshifumi Kohno, Nobuhiro Suzuki, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-ZX-5  1993.9  The Japan Society of Applied Physics

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    Venue:Hokkaido   Country:Japan  

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  • Room temperature negative differential resistance of p-type resonant tunneling diodes using atomically thin CaF2/Si heterostructures

    Kizashi Mikami, Satoshi Fukuyama, Masahiro Watanabe

    The 66th The Japan Society of Applied Physics Spring Meeting, 10p-PA4-7  2019.3  The Japan Society of Applied Physics

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    Venue:Titech, Tokyo   Country:Japan  

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  • Quantum effect devices using metal/insulator heterostructures

    Masahiro Asada, Masahiro Watanabe, Takashi Suemasu, Nobuhiro Suzuki, Yoshifumi Kohno

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-MA-6, (Symposium)  1994.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Analysis of near-infrared wavelength quantum cascade laser using CaF2/Si heterostructures

    Gensai Tei, Soichiro Ono, Liu Long, Masahiro Watanabe

    The 66th The Japan Society of Applied Physics Spring Meeting, 12a-PB4-22  2019.3  The Japan Society of Applied Physics

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    Venue:Titech, Tokyo   Country:Japan  

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  • Formation of fine metal Co particles on insulator CaF2

    Masahiro Watanabe, Hiroshi Iwai, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-S-17  1994.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication process of near-infrared wavelength quantum cascade laser using CaF2/Si heterostructures

    Gensai Tei, Long Liu, Yohei Koyanagi, Masahiro Watanabe

    The 80th Autumn Meeting of The Jpn. Soc. Of Appl. Phys., 20p-PB3-7  2019.9  The Japan Society of Applied Physics

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    Venue:Sapporo, Hokkaido   Country:Japan  

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  • Fabrication of metal(CoSi2)/ insulator(CaF2) fine-size hot electron transistor(II)

    Nobuhiro Suzuki, Takashi Suemasu, Masahiro Watanabe, Masahiro Asada, Yoshifumi Kouno

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-S-16  1994.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Room Temperature Negative Differential Resistance of Si/CaF2 Bipolar Double-barrier Resonant Tunneling Diodes

    Koudai Hirose, Yoshiro Kumagai, Hiroki Tonegawa, Kanta Tomizawa, Takumi Kaneko, Honami Sato, Masahiro Watanabe

    The 80th Autumn Meeting of The Jpn. Soc. Of Appl. Phys., 20p-PB3-6  2019.9  The Japan Society of Applied Physics

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    Venue:Sapporo, Hokkaido   Country:Japan  

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  • Fabrication of metal(CoSi2)/insulator(CaF2) tunneling hot electron resonant transistor using new process

    Yoshifumi Kouno, Takashi Suemasu, Nobuhiro Suzuki, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-S-15  1994.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Room temperature negative differential resistance of p-type resonant tunneling diodes using atomically thin CaF2/Si heterostructures

    Kizashi Mikami, Yoshiro Kumagai, Koudai Hirose, Kanta Tomizawa, Hiroki Tonegawa, Takumi Kaneko, Honami Sato, Masahiro Watanabe

    The 80th Autumn Meeting of The Jpn. Soc. Of Appl. Phys., 20p-PB3-5  2019.9  The Japan Society of Applied Physics

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    Venue:Sapporo, Hokkaido   Country:Japan  

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  • Fabrication of metal(CoSi2)/ insulator(CaF2) resonant tunneling hot electron transistor

    Takashi Suemasu, Yoshifumi Kouno, Nobuhiro Suzuki, Wataru Saitoh, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 30p-S-14  1994.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Room temperature negative differential resistance of CaF2/Si/SiO2 double-barrier resonant tunneling diodes

    Kanta Tomizawa, Yoshiro Kumagai, Hiroki Tonegawa, Kizashi Mikami, Koudai Hirose, Takumi Kaneko, Honami Sato, Masahiro Watanabe

    The 80th Autumn Meeting of The Jpn. Soc. Of Appl. Phys., 20p-PB3-4  2019.9  The Japan Society of Applied Physics

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    Venue:Sapporo, Hokkaido   Country:Japan  

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  • Metal(CoSi2)/ Insulator(CaF2) tunneling hot electron resonant transistor

    Yoshifumi Kohno, Takashi Suemasu, Wataru Saitoh, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 19p-T-10  1994.9  The Japan Society of Applied Physics

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    Venue:Nagoya   Country:Japan  

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  • Room temperature negative differential resistance of Si/CaF2 triple-barrier resonant tunneling diodes with high peak current density

    Hiroki Tonegawa, Yoshiro Kumagai, Kizashi Mikami, Koudai Hirose, Kanta Tomizawa, Takumi Kaneko, Honami Sato, Masahiro Watanabe

    The 80th Autumn Meeting of The Jpn. Soc. Of Appl. Phys., 20p-PB3-3  2019.9  The Japan Society of Applied Physics

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    Venue:Sapporo, Hokkaido   Country:Japan  

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  • Epitaxial growth of CaF2/CoSi2/ CaF2/ Si(111) by ICB technique

    Masahiro Watanabe, Hitoshi Muguruma, Shigeki Muratake, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 28a-T-11  1990.9  The Japan Society of Applied Physics

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    Venue:Iwate   Country:Japan  

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  • Electroluminescence from CaF2/Si quantum-well heterostructures

    Masato Mochizuki, Keita Suda, Masahiro Watanabe

    The 76th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 13p-PA6-1  2015.9  The Japan Society of Applied Physics

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    Venue:Nagoya   Country:Japan  

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  • Analysis of quantum-size-effect high-speed electron devices using metal-insulator hetero-structure

    Tomoaki Sakaguchi, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of IEICE of Japan, C-410  1990.10 

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    Venue:Hiroshima   Country:Japan  

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  • Room temperature negative differential resistance of CaF2/Si/CaF2 resonant-tunneling structures

    Naoyuki Tanabe, Masato Mochizuki, Keita Suda, Tomofumi Shimanaka, Masahiro Watanabe

    The 63rd The Japan Society of Applied Physics Spring Meeting, 20a-S223-7  2016.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • The energy band structure of metal (CoSi2)- insulator (CaF2) superlattice

    Hitoshi Muguruma, Masahiro Watanabe, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-M-3  1991.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Room temperature resistance switching characteristics of Si/CaF2 resonant-tunneling quantum-well structures grown on CoSi2

    Fumihiro Sakurai, Masahiro Watanabe

    The 77th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 14p-P20-2  2016.9  The Japan Society of Applied Physics

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    Venue:Niigata   Country:Japan  

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  • Resistivity measurement of CoSi2 epitaxial thin films on CaF2/Si(111)

    Masahiro Watanabe, Shigeki Muratake, Hiromasa Fujimoto, Shigenori Sakamori, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29p-ZF-3  1991.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Design and analysis of Si/CaF2 quantum cascade lasers

    Hiroki Kondo, Yusuke Saito, Naoyuki Tanabe, Masahiro Watanabe

    The 64th The Japan Society of Applied Physics Spring Meeting, 14p-P8-8  2017.3  The Japan Society of Applied Physics

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    Venue:Yokohama   Country:Japan  

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  • Epitaxial growth of CoSi2 on CaF2/Si(111) with electron beam evaporated Si

    Takashi Suemasu, Masahiro Watanabe, Shigeki Muratake, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 9p-Z-12  1991.10  The Japan Society of Applied Physics

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    Venue:Okayama   Country:Japan  

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  • Design of active layers of Si/CaF2 quantum cascade lasers considering material parameter modification of atomically thin films

    Yusuke Saito, Naoyuki Tanabe, Hiroki Kondo, Masahiro Watanabe

    The 64th The Japan Society of Applied Physics Spring Meeting, 16p-P7-36  2017.3  The Japan Society of Applied Physics

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    Venue:Yokohama   Country:Japan  

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  • Epitaxial growth of Metal (CoSi2)/ Insulator (CaF2) superlattice structure

    Masahiro Watanabe, Shigeki Muratake, Hiromasa Fujimoto, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 9p-Z-11  1991.10  The Japan Society of Applied Physics

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    Venue:Okayama   Country:Japan  

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  • Fabrication and evaluation of waveguide structure of Si/CaF2 quantum cascade lasers

    Hiroki Kondo, Yusuke Saito, Masahiro Watanabe

    The 78th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 7p-PA2-11  2017.9  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Fabrication of MIS (CoSi2/CaF2/Si) tunneling diodes

    Shigeki Muratake, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 12a-N-7  1991.10  The Japan Society of Applied Physics

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    Venue:Okayama   Country:Japan  

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  • Reactive ion etching of CaF2/Si heterostructure using CF4/O2 plasma

    Yoshiro Kumagai, Masahiro Watanabe

    The 78th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 8p-PA2-3  2017.9  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Negative Differencial Resistance in Metal (CoSi2)/ Insulator (CaF2) Resonant tunneling diode

    Masahiro Watanabe, Takashi Suemasu, Shigeki Muratake, Masahiro Asada, Nobuhiro Suzuki

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 28a-T-5  1992.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Room Temperature Negative Differential Resistance of Si/CaF2 Triple-barrier Resonant Tunneling Diodes

    Hiroki Tonegawa, Masahiro Watanabe

    The 65th The Japan Society of Applied Physics Spring Meeting, 18a-P8-3  2018.3  The Japan Society of Applied Physics

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    Venue:Waseda, Tokyo   Country:Japan  

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  • RHEED ocsillations during CaF2 epitaxy on Si(111)

    Masahiro Watanabe, Nobuhiro Suzuki, Shigeki Muratake, Takashi Suemasu, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 29a-ZC-5  1992.3  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Evaluation of valence band offset of atomically-thin CaF2/Si heterointerface

    Satoshi Fukuyama, Masahiro Watanabe

    The 65th The Japan Society of Applied Physics Spring Meeting, 18p-P6-14  2018.3  The Japan Society of Applied Physics

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    Venue:Waseda, Tokyo   Country:Japan  

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  • Current amplification of Metal (CoSi2)/ Insulator (CaF2) hot electron transistor

    Masahiro Watanabe, Shigeki Muratake, Takashi Suemasu, Masahiro Asada

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 16a-SZC-17  1992.9  The Japan Society of Applied Physics

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    Venue:Osaka   Country:Japan  

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  • Design and analysis of Si/CaF2 near-infrared intersubband transition lasers

    Soichiro Ono, Liu Long, Yusuke Saito, Hiroki Kondo, Masahiro Watanabe

    The 65th The Japan Society of Applied Physics Spring Meeting, 19p-P9-1  2018.3  The Japan Society of Applied Physics

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    Venue:Waseda, Tokyo   Country:Japan  

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  • Room temperature negative differential resistance of Metal (CoSi2)/ Insulator (CaF2) resonant tunneling diode

    Takashi Suemasu, Masahiro Watanabe, Masahiro Asada, Nobuhiro Suzuki

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 17a-ZB-7  1992.9  The Japan Society of Applied Physics

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    Venue:Osaka   Country:Japan  

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  • Room temperature electroluminescence from CaF2 / Si quantum cascade structures

    Yusuke Saito, Hiroki Kondo, Masahiro Watanabe

    The 65th The Japan Society of Applied Physics Spring Meeting, 19p-P9-2  2018.3  The Japan Society of Applied Physics

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    Venue:Waseda, Tokyo   Country:Japan  

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  • Photovoltaic characteristics of p-i-n cell structures using CaF2/Si quantum-dot superlattice

    Susumu Koike, Masahiro Watanabe

    The 74nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 19p-A2-13  2013.9  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Negative differential resistance of nc-Si/CaF2 resonant tunneling diode structures

    Yuta Koshita, Keita Suda, Yuya Kuwata, Junya Denda, Susumu Koike, Minato Segawa, Masahiro Watanabe

    The 74nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 19p-P9-2  2013.9  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Pulsed operation of resistance switching memory of Si/CaF2/CdF2 resonant-tunneling quantum-well structures

    Junya Denda, Keita Suda, Yuya Kuwata, Masahiro Watanabe

    The 74nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 19p-P9-3  2013.9  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • Near-infrared Electro-Luminescence of CaF2/Si Heterostructures

    Shunsuke Kajiura, Yoshihito Ashikawa, Masahiro Watanabe

    The 56th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30p-ZB-2  2009.3  The Japan Society of Applied Physics

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    Venue:Tsukuba   Country:Japan  

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  • Optical properties of epitaxial CaF2/Si quantum-dot structures

    Hiroshi Oogi, Masahiro Watanabe

    The 56th Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 31p-TF-4  2009.3  The Japan Society of Applied Physics

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    Venue:Tsukuba   Country:Japan  

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  • Analysis of resistance switching devices using Si/CaF2/CdF2 quantum-well structures

    Keita Suda, Junya Denda, Yuya Kuwata, Masahiro Watanabe

    The 74nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 19p-P9-4  2013.9  The Japan Society of Applied Physics

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    Venue:Kyoto   Country:Japan  

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  • High-peak-current-density resistance switching characteristics of Si/CaF2 resonant-tunneling quantum-well structures

    Yuta Koshita, Keita Suda, Yuya Kuwata, Junya Denda, Masahiro Watanabe

    The 61st The Japan Society of Applied Physics Spring Meeting, 18p-PG2-3  2014.3  The Japan Society of Applied Physics

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    Venue:Sagamihara, Kanagawa   Country:Japan  

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  • Tunneling current measurement of Al/CaF2/Si MIS structures

    Keita Suda, Junya Denda, Yuya Kuwata, Yuta Koshita, Masahiro Watanabe

    The 61st The Japan Society of Applied Physics Spring Meeting, 18p-PG2-2  2014.3  The Japan Society of Applied Physics

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    Venue:Sagamihara, Kanagawa   Country:Japan  

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  • Accelaration Voltage Dependence of Breakdown Field of ICB-grown CaF2 Films

    Masahiro Watanabe, Hitoshi Muguruma, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys., 3p-L-1  1989.4  The Japan Society of Applied Physics

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    Venue:Chiba   Country:Japan  

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  • Pulsed operation of resistance switching devices using Si/CaF2 resonant tunneling structures grown on Si(111)

    Yuya Kuwata, Keita Suda, Junya Denda Yuta Koshita, Masahiro Watanabe

    The 61st The Japan Society of Applied Physics Spring Meeting, 18p-PG2-1  2014.3  The Japan Society of Applied Physics

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    Venue:Sagamihara, Kanagawa   Country:Japan  

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  • Possibility of Novel Device for LSI Using Nanometer Insulator Film

    Masahiro Asada, Tomoaki Sakaguchi, Masahiro Watanabe

    Nat. Conv. Rec. of IEICE of Japan, SC-6-4  1989.9 

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    Venue:Kanagawa   Country:Japan  

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  • Increase of electroluminescence from Si/CaF2/CdF2 intersubband transition laser structures using CdF2 extraction layer

    Masato Mochizuki, Hiroshi Kaneko, Keita Suda, Masahiro Watanabe

    The 75th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 19a-A27-2  2014.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • Low Temperature Epitaxial Growth of CaF2 Films by ICB Technique.

    Masahiro Watanabe, Hitoshi Muguruma, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys, 28a-H-5  1989.9  The Japan Society of Applied Physics

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    Venue:Fukuoka   Country:Japan  

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  • Analysis of Current Voltage Characteristics of Si/CaF2/CdF2 RTD

    Keita Suda, Yuya Kuwata Masahiro Watanabe

    The 75th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 19a-A27-1  2014.9  The Japan Society of Applied Physics

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    Venue:Sapporo   Country:Japan  

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  • Analysis of grid barrier mode of space charge limited metal/insulator electric devices

    Tomoaki Sakaguchi, Masahiro Watanabe, Masahiro Asada

    Nat. Conv. Rec. of IEICE of Japan, C-546  1990.3 

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    Venue:Tokyo   Country:Japan  

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  • Pulsed response of resistance switching devices using Si/CaF2 resonant-tunneling structures

    Yuya Kuwata, Keita Suda, Masahiro Watanabe

    The 62nd The Japan Society of Applied Physics Spring Meeting, 12p-P13-2  2015.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Epitaxial growth of CoSi2 on CaF2(111) thin film by ICB technique

    Masahiro Watanabe, Hitoshi Muguruma, Shigeki Muratake, Masahiro Asada, Shigehisa Arai

    Nat. Conv. Rec. of The Japan Soc. of Appl. Phys, 29a-PC-18  1990.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Analysis of resistance switching characteristics of resonant-tunneling quantum-well structures using CaF2/CdF2/CaF2 heterostructure

    Keita Suda, Yuya Kuwata, Masahiro Watanabe

    The 62nd The Japan Society of Applied Physics Spring Meeting, 12p-A24-6  2015.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Fabrication and characterization of resistance switching devices using fluoride based resonant tunneling structures grown on CoSi2/Si(111)

    Yukou Nakashouji, Kazuya Uryu, Masahiro Watanabe

    The 58th Spring Meeting, The Japan Society of Applied Physics and Related Societies, 26a-KV-6  2011.3  The Japan Society of Applied Physics

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    Venue:Kanagawa   Country:Japan  

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  • Retention characteristics of resistance switching devices using CaF2/CdF2/Si quantum-well structures grown on Si(111)

    Kazuya Uryu, Junya Denda, Masahiro Watanabe

    The 72nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 31p-P16-14  2011.8  The Japan Society of Applied Physics

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    Venue:Yamagata   Country:Japan  

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  • Fabrication of p-i-n cell structures using CaF2/Si quantum-dot superlattice

    Chihiro Koseki, Hiroshi Oogi, Masahiro Watanabe

    The 72nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 31a-ZH-5  2011.8  The Japan Society of Applied Physics

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    Venue:Yamagata   Country:Japan  

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  • Fabrication of crosspoint resistance switching devices using CaF2/CdF2/Si quantum-well structures grown on CoSi2/Si(100)

    Kazuya Uryu, Junya Denda, Masahiro Watanabe

    The 59th Spring Meeting, The Japan Society of Applied Physics and Related Societies, 18a-E1-7  2012.3  The Japan Society of Applied Physics

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    Venue:Waseda, Tokyo   Country:Japan  

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  • Resistance switching characteristics of Si/CaF2/CdF2 resonant-tunneling quantum-well structures grown on CoSi2

    Junya Denda, Kazuya Uryu, Masahiro Watanabe

    The 73nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 12p-PA1-13  2012.9  The Japan Society of Applied Physics

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    Venue:Matsuyama, Ehime   Country:Japan  

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  • Spectral sensitivity of ημτ product for CaF2/Si quantum-dot structures

    Yuuki Kurachi, Masahiro Watanabe

    The 73nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 12a-F7-6  2012.9  The Japan Society of Applied Physics

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    Venue:Matsuyama, Ehime   Country:Japan  

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  • Room temperature near-infrared electroluminescence from Si/CaF2 quantum cascade laser structures

    Tatsuya Ochi, Masahiro Watanabe

    The 73nd Autumn Meeting of The Jpn. Soc. of Appl. Phys, 12p-PA1-12  2012.9  The Japan Society of Applied Physics

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    Venue:Matsuyama, Ehime   Country:Japan  

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  • Room temperature near-infrared (λ~1.5μm) electroluminescence from Si/CaF2 quantum cascade laser structures

    Minato Segawa, Tatsuya Ochi, Yuta Koshita, Masahiro Watanabe

    The 60th The Japan Society of Applied Physics Spring Meeting, 28p-G5-15  2013.3  The Japan Society of Applied Physics

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    Venue:Atsugi, Kanagawa   Country:Japan  

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  • Resistance switching characteristics of Si/CaF2/CdF2 resonant-tunneling quantum-well structures

    Junya Denda, Kazuya Uryu, Keita Suda, Masahiro Watanabe

    The 60th The Japan Society of Applied Physics Spring Meeting, 29a-PB6-9  2013.3  The Japan Society of Applied Physics

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    Venue:Atsugi, Kanagawa   Country:Japan  

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  • Retention characteristics of crosspoint resistance switching devices using CaF2/CdF2/Si quantum-well structures grown on CoSi2/Si(100)

    Kazuya Uryu, Junya Denda, Keita Suda, Yuya Kuwata, Masahiro Watanabe

    The 60th The Japan Society of Applied Physics Spring Meeting, 29a-PB6-8  2013.3  The Japan Society of Applied Physics

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    Venue:Atsugi, Kanagawa   Country:Japan  

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  • Fabrication of resistance switching devices using Si/CaF2 resonant tunneling structures grown on Si(111)

    Yuya Kuwata, Kazuya Uryu, Junya Denda, Keita Suda, Masahiro Watanabe

    The 60th The Japan Society of Applied Physics Spring Meeting, 29a-PB6-7  2013.3  The Japan Society of Applied Physics

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    Venue:Atsugi, Kanagawa   Country:Japan  

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  • Room temperature negative differential resistance of CoSi2/CaF2 triple-barrier resonant tunneling diode grown by Nano-area Local Epitaxy

    Shimpei Tamura, Masahiro Watanabe Masahiro Asada

    The 51st Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30a-ZE-8  2004.3  The Japan Society of Applied Physics

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    Venue:Tokyo   Country:Japan  

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  • Growth temperature dependence of CdF2/CaF2 resonant tunneling diode structures on Si(100) substrate

    Tohru Kanazawa, Masahiro Watanabe, Masahiro Asada

    The 65th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 2a-ZK-4  2004.9  The Japan Society of Applied Physics

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    Venue:Sendai   Country:Japan  

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  • Near infrared EL measurement of CdF2/CaF2 quantum heterostructures on Si substrate

    Keisuke Jinen, Hiroshi Murata, Masahiro Watanabe, Masahiro Asada

    The 65th Autumn Meeting of The Jpn. Soc. of Appl. Phys., 4a-ZK-6  2004.9  The Japan Society of Applied Physics

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    Venue:Sendai   Country:Japan  

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  • Optically pumped ultraviolet lasing of BeMgZnSe compounds

    Yuuki Niiyama, Takayuki Murata, Masahiro Watanabe

    The 52nd Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 31p-ZN-7  2005.3  The Japan Society of Applied Physics

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    Venue:Saitama   Country:Japan  

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  • Theoretical analysis of fluoride based intersubband transition lasers with plasmon waveguide

    Takeshi Kikuchi, Keisuke Jinen, Kaoru Uchida, Shinji Kodaira, Masahiro Watanabe, Masahiro Asada

    The 66th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 9a-W-8  2005.9  The Japan Society of Applied Physics

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    Venue:Tokushima   Country:Japan  

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  • Negative differential resistance characteristics of CdF2/CaF2 resonant tunneling diode grown by nanoarea local epitaxy

    Atsushi Morosawa, Tohru Kanazawa, Ryo Fujii, Takashi Wada, Masahiro Watanabe, Masahiro Asada

    The 66th Autumn Meeting of The Jpn. Soc. of Appl. Phys, 9a-W-7  2005.9  The Japan Society of Applied Physics

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Tokushima   Country:Japan  

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  • Crystal growth using Be-Zn co-irradiation and optical properties of BeZnSe strained quantum well structurews

    Takayuki Murata, Yuuki Niiyama, Takeshi Yokoyama, Masahiro Watanabe

    The 51st Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 29p-P12-11  2004.3  The Japan Society of Applied Physics

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    Language:Japanese   Presentation type:Poster presentation  

    Venue:Tokyo   Country:Japan  

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  • Theoretical Analysis of Fluoride Based Intersubband Transition Lasers using CoSi2-Plasmon Waveguide

    Keisuke Jinen, Hiroshi Murata, Masahiro Watanabe, Masahiro Asada

    The 51st Spring Meeting of The Jpn. Soc. of Appl. Phys. And Related Societies, 30p-ZE-1  2004.3  The Japan Society of Applied Physics

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Tokyo   Country:Japan  

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Awards

  • 文部科学大臣表彰 科学技術賞 理解増進部門

    2006.4   文部科学省  

    末松良一, 浅田雅洋, 渡辺正裕, 山内健治, 大井文高

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  • 平成16年度「東工大挑戦的研究賞」

    2004   東京工業大学  

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    Country:Japan

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  • 丸文研究奨励賞

    2002   財団法人丸文研究交流財団  

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    Country:Japan

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  • 丹羽保次郎記念論文賞

    1994   東京電機大学  

    渡辺正裕

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    Country:Japan

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Research Projects

  • シリコン基板上へのヘテロ構造エピタキシャル成長に関する研究

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    Grant type:Competitive

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  • Study on Quantum Photonic and Electron Devices

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    Grant type:Competitive

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  • 量子効果光電子デバイスに関する研究

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    Grant type:Competitive

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  • Study on Epitaxial growth of heterostructures on Silicon substrate

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    Grant type:Competitive

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